Patents by Inventor Kyoung-Seok Yang

Kyoung-Seok Yang has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Multi-chambered substrate processing equipment having sealing structure between chambers thereof, and method of assembling such equipment
    Patent number: 7431813
    Abstract: Sealing structure provided between a transfer chamber and a chamber, such as a process chamber, connected to the transfer chamber includes an insert member, a docking member, and annular seals. The insert member is fixed to the exterior of the transfer chamber and the docking member is fixed to the insert member. The docking member has an extension received in a passageway of the process chamber, a support portion received in the insert member, and a flange received in a passageway of the transfer chamber. The extension, support portion and flange have different outer diameters in cross section such that inclined surfaces extend between the outer peripheral surfaces of the flange, the support portion and the extension. The annular seals are disposed along the inclined surfaces, and the extension prevents the annular seal from being damaged by plasma used to process a substrate in the process chamber.
    Type: Grant
    Filed: March 8, 2006
    Date of Patent: October 7, 2008
    Assignee: Samsung Electronics Co., Ltd.
    Inventor: Kyoung-Seok Yang
  • Multi-chambered substrate processing equipment having sealing structure between chambers thereof, and method of assembling such equipment
    Publication number: 20070114440
    Abstract: Sealing structure provided between a transfer chamber and a chamber, such as a process chamber, connected to the transfer chamber includes an insert member, a docking member, and annular seals. The insert member is fixed to the exterior of the transfer chamber and the docking member is fixed to the insert member. The docking member has an extension received in a passageway of the process chamber, a support portion received in the insert member, and a flange received in a passageway of the transfer chamber. The extension, support portion and flange have different outer diameters in cross section such that inclined surfaces extend between the outer peripheral surfaces of the flange, the support portion and the extension. The annular seals are disposed along the inclined surfaces, and the extension prevents the annular seal from being damaged by plasma used to process a substrate in the process chamber.
    Type: Application
    Filed: March 8, 2006
    Publication date: May 24, 2007
    Inventor: Kyoung-Seok Yang