Patents by Inventor Kyoung-Yoon Bang

Kyoung-Yoon Bang has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Methods of measuring critical dimensions and related devices
    Patent number: 7803506
    Abstract: A method of measuring a critical dimension may include forming an object pattern on a substrate and forming a plurality of reference patterns on the substrate, wherein each of the plurality of reference patterns has a different critical dimension. An optical property of each of the plurality of reference patterns may be measured to provide a respective measured optical property for each of the reference patterns, and an optical property of the object pattern may be measured to provide a measured optical property of the object pattern. The measured optical property of the object pattern may be compared with the measured optical properties of the reference patterns, and a critical dimension of the object pattern may be determined as being the same as the critical dimension of the reference pattern having the measured optical property that is closest to the measured optical property of the object pattern. Related devices are also discussed.
    Type: Grant
    Filed: June 13, 2007
    Date of Patent: September 28, 2010
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Kyoung-Yoon Bang, Hae-Young Jeong, Yong-Hoon Kim, Yo-Han Choi, Hyung-Joo Lee
  • Methods of measuring critical dimensions and related devices
    Publication number: 20070292778
    Abstract: A method of measuring a critical dimension may include forming an object pattern on a substrate and forming a plurality of reference patterns on the substrate, wherein each of the plurality of reference patterns has a different critical dimension. An optical property of each of the plurality of reference patterns may be measured to provide a respective measured optical property for each of the reference patterns, and an optical property of the object pattern may be measured to provide a measured optical property of the object pattern. The measured optical property of the object pattern may be compared with the measured optical properties of the reference patterns, and a critical dimension of the object pattern may be determined as being the same as the critical dimension of the reference pattern having the measured optical property that is closest to the measured optical property of the object pattern. Related devices are also discussed.
    Type: Application
    Filed: June 13, 2007
    Publication date: December 20, 2007
    Inventors: Kyoung-Yoon Bang, Hae-Young Jeong, Yong-Hoon Kim, Yo-Han Choi, Hyung-Joo Lee
  • Polarization measuring devices, ellipsometers and polarization measuring methods
    Publication number: 20070247623
    Abstract: A polarization measuring device includes a diffraction grating and a detector. The diffraction grating is configured to diffract incident light to observe the polarization state of the light. The detector is configured to receive the light diffracted by the diffraction grating and display the polarization state of the light.
    Type: Application
    Filed: March 23, 2007
    Publication date: October 25, 2007
    Inventors: Dong-wan Kim, Dong-gun Lee, Kyoung-yoon Bang