Patents by Inventor Kyoung-Ki Jeon

Kyoung-Ki Jeon has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240133800
    Abstract: Provided is a concentration measuring device which includes: a main pipe through which a fluid whose concentration is to be measured flows; a flow cell having a fluid passage and a light passage formed to pass through the fluid passage; a spectrometer capable of measuring absorbance for each wavelength of the source light transmitted to the flow cell and the received light receiving from the flow cell; and an optical cable connecting the flow cell and the spectrometer with each other, wherein the flow cell is separated from the main pipe to be provided separately, and a fluid pipe is connected to the flow cell, so that the fluid flows from the main pipe to the flow cell through the fluid pipe using a pitot tube.
    Type: Application
    Filed: March 8, 2023
    Publication date: April 25, 2024
    Inventors: Chul Won KIM, Sung Won JEON, Kyoung Ho PARK, Min Ki PARK
  • Patent number: 11108229
    Abstract: An electrostatic discharge (ESD) protection circuit is provided. The ESD protection circuit includes a transient-state detection circuit configured to generate a dynamic triggering signal based on a voltage change rate of a voltage on a first power rail; a voltage detection circuit configured to generate a static triggering signal based on the voltage on the first power rail; a trigger circuit configured to generate a discharge control signal based on the dynamic triggering signal and the static triggering signal; and a main discharge circuit configured to discharge an electric charge from the first power rail to a second power rail based on the discharge control signal.
    Type: Grant
    Filed: July 18, 2018
    Date of Patent: August 31, 2021
    Assignee: SAMSUNG ELECTRONICS CO., LTD.
    Inventors: Sung-Pil Jang, Chang-Su Kim, Han-Gu Kim, Moon-Seok Yang, Kyoung-Ki Jeon
  • Publication number: 20190173278
    Abstract: An electrostatic discharge (ESD) protection circuit is provided. The ESD protection circuit includes a transient-state detection circuit configured to generate a dynamic triggering signal based on a voltage change rate of a voltage on a first power rail; a voltage detection circuit configured to generate a static triggering signal based on the voltage on the first power rail; a trigger circuit configured to generate a discharge control signal based on the dynamic triggering signal and the static triggering signal; and a main discharge circuit configured to discharge an electric charge from the first power rail to a second power rail based on the discharge control signal.
    Type: Application
    Filed: July 18, 2018
    Publication date: June 6, 2019
    Applicant: SAMSUNG ELECTRONICS CO., LTD.
    Inventors: Sung-Pil JANG, Chang-Su KIM, Han-Gu KIM, Moon-Seok YANG, Kyoung-Ki JEON
  • Patent number: 9093287
    Abstract: A method of manufacturing a diode is provided. An N-type well region is formed in a first upper portion of an N-type epitaxial layer. A P-type drift region is formed in a second upper portion of the N-type epitaxial layer. An N-type doping region is formed in the N-type well region. A P-type doping region is formed in the P-type drift region. An isolation structure is formed in the P-type drift region. The isolation structure is disposed between the P-type doping region and the N-type well region. A first electrode is formed on a portion of the N-type epitaxial layer. The portion of the N-type epitaxial layer is disposed between the N-type well region and the P-type drift region. The first electrode overlaps a portion of the isolation structure. A connection structure is formed to electrically couple the N-type doping region and the first electrode.
    Type: Grant
    Filed: November 18, 2013
    Date of Patent: July 28, 2015
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Jae-Hyok Ko, Han-Gu Kim, Min-Chang Ko, Chang-Su Kim, Kyoung-Ki Jeon
  • Publication number: 20140210003
    Abstract: A method of manufacturing a diode is provided. An N-type well region is formed in a first upper portion of an N-type epitaxial layer. A P-type drift region is formed in a second upper portion of the N-type epitaxial layer. An N-type doping region is formed in the N-type well region. A P-type doping region is formed in the P-type drift region. An isolation structure is formed in the P-type drift region. The isolation structure is disposed between the P-type doping region and the N-type well region. A first electrode is formed on a portion of the N-type epitaxial layer. The portion of the N-type epitaxial layer is disposed between the N-type well region and the P-type drift region. The first electrode overlaps a portion of the isolation structure. A connection structure is formed to electrically couple the N-type doping region and the first electrode.
    Type: Application
    Filed: November 18, 2013
    Publication date: July 31, 2014
    Inventors: Jae-Hyok KO, Han-Gu KIM, Min-Chang KO, Chang-Su KIM, Kyoung-Ki JEON
  • Patent number: 8174806
    Abstract: An electrostatic discharge (ESD) protection element includes a first diode, a second diode, and a poly resistor. The first diode is connected between a first voltage and an input/output (I/O) pad. The second diode is connected between the I/O pad and a second voltage. The poly resistor is formed on the second diode.
    Type: Grant
    Filed: February 12, 2010
    Date of Patent: May 8, 2012
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Suk-Jin Kim, Han-Gu Kim, Jae-Hyok Ko, Hyo-Cheol Ban, Min-Chang Ko, Kyoung-Ki Jeon
  • Publication number: 20100214705
    Abstract: An electrostatic discharge (ESD) protection element includes a first diode, a second diode, and a poly resistor. The first diode is connected between a first voltage and an input/output (I/O) pad. The second diode is connected between the I/O pad and a second voltage. The poly resistor is formed on the second diode.
    Type: Application
    Filed: February 12, 2010
    Publication date: August 26, 2010
    Applicant: Samsung Electronics Co., Ltd.
    Inventors: Suk-Jin Kim, Han-Gu Kim, Jae-Hyok Ko, Hyo-Cheol Ban, Min-Chang Ko, Kyoung-Ki Jeon