Abstract: A laundry treating apparatus includes a cabinet with an outlet, a drawer drawn out from the outlet, and a tub inside the drawer, providing a space for storing water and having an inlet on its upper surface. A drum rotatably mounted inside the tub includes an inlet on an upper surface for receiving laundry inside of the drum. A cabinet includes a first frame made at least in part from metal and including a first outlet, a second frame made at least in part from metal, spaced apart from the first frame along a moving direction of the drawer, and including a second outlet, a base panel made of a nonmetal lighter than metal, fixed to the first and second frames, and forming a bottom surface of the cabinet, and a metal cover fixed to the first and second frames and forming an upper surface and both sides of the cabinet.

Abstract: A laundry treating apparatus includes a cabinet with an outlet, a drawer drawn out from the outlet, and a tub inside the drawer, providing a space for storing water and having an inlet on its upper surface. A drum rotatably mounted inside the tub includes an inlet on an upper surface for receiving laundry inside of the drum. A cabinet includes a first frame made at least in part from metal and including a first outlet, a second frame made at least in part from metal, spaced apart from the first frame along a moving direction of the drawer, and including a second outlet, a base panel made of a nonmetal lighter than metal, fixed to the first and second frames, and forming a bottom surface of the cabinet, and a metal cover fixed to the first and second frames and forming an upper surface and both sides of the cabinet.

Abstract: Semiconductor devices are provided. A semiconductor device includes a fin structure having a plurality of first semiconductor patterns and a plurality of second semiconductor patterns alternately stacked on a substrate, and extending in a first direction. The semiconductor device includes a semiconductor cap layer on an upper surface of the fin structure, and extending along opposite side surfaces of the fin structure in a second direction crossing the first direction. The semiconductor device includes a gate electrode on the semiconductor cap layer, and extending in the second direction. The semiconductor device includes a gate insulating film between the semiconductor cap layer and the gate electrode. Moreover, the semiconductor device includes a source/drain region connected to the fin structure. The plurality of first semiconductor patterns include silicon germanium (SiGe) having a germanium (Ge) content in a range of 25% to 35%, and the plurality of second semiconductor patterns include silicon (Si).

Abstract: The present invention relates to a laundry dryer, and the laundry dryer comprises a steam part for supplying steam into a drum, and a water supply part for supplying water to the steam part, wherein the steam part includes: a steam generator; a steam nozzle for supplying steam into the drum; a steam pipe for connecting the steam generator and the steam nozzle; and an accumulator for separating condensate water from the steam flowing in the steam pipe, and thus prevents the condensate water from being generated in the steam pipe or the steam nozzle and falling into the drum.

Abstract: Semiconductor devices are provided. A semiconductor device includes a fin structure having a plurality of first semiconductor patterns and a plurality of second semiconductor patterns alternately stacked on a substrate, and extending in a first direction. The semiconductor device includes a semiconductor cap layer on an upper surface of the fin structure, and extending along opposite side surfaces of the fin structure in a second direction crossing the first direction. The semiconductor device includes a gate electrode on the semiconductor cap layer, and extending in the second direction. The semiconductor device includes a gate insulating film between the semiconductor cap layer and the gate electrode. Moreover, the semiconductor device includes a source/drain region connected to the fin structure. The plurality of first semiconductor patterns include silicon germanium (SiGe) having a germanium (Ge) content in a range of 25% to 35%, and the plurality of second semiconductor patterns include silicon (Si).

Abstract: The present disclosure relates to a laundry treatment apparatus including a cabinet having an entrance, a drawer comprising a drying chamber, a bottom surface, a front surface extending upward from the bottom surface, a rear surface to face the front surface, and first and second side surfaces to connect the front and rear surfaces. The laundry apparatus includes a first rack disposed in the drying chamber, the first rack comprising a first vent portion allowing a space above and below the first rack to communicate with each other, a second rack disposed in the drying chamber and positioned between the first rack and the bottom surface, the second rack comprising a second vent portion, a supply port formed through the rear surface, an air supply unit located outside the drying chamber, and a guide in the supply port to guide air to at least one of the spaces.

Abstract: Semiconductor devices are provided. A semiconductor device includes a fin structure having a plurality of first semiconductor patterns and a plurality of second semiconductor patterns alternately stacked on a substrate, and extending in a first direction. The semiconductor device includes a semiconductor cap layer on an upper surface of the fin structure, and extending along opposite side surfaces of the fin structure in a second direction crossing the first direction. The semiconductor device includes a gate electrode on the semiconductor cap layer, and extending in the second direction. The semiconductor device includes a gate insulating film between the semiconductor cap layer and the gate electrode. Moreover, the semiconductor device includes a source/drain region connected to the fin structure. The plurality of first semiconductor patterns include silicon germanium (SiGe) having a germanium (Ge) content in a range of 25% to 35%, and the plurality of second semiconductor patterns include silicon (Si).

Abstract: A laundry treating apparatus includes a cabinet with an outlet, a drawer drawn out from the outlet, a drum provided inside the drawer, providing a space where laundry is stored, a base fixed to the cabinet, a base slit provided in the base, including a linear portion and a first bent portion, a slider coupled to the base to move along the base, a slider slit, a conveyer, an operation unit fixed to the drawer and detachably coupled to the conveyer, and springs provided to connect the base with the slider and provided to move the slider toward a rear end of the linear portion if the conveyer moves from the first bent portion to the linear portion.

Abstract: A laundry treating apparatus includes a cabinet with an outlet, a drawer drawn out from the outlet, and a tub inside the drawer, providing a space for storing water and having an inlet on its upper surface. A drum rotatably mounted inside the tub includes an inlet on an upper surface for receiving laundry inside of the drum. A cabinet includes a first frame made at least in part from metal and including a first outlet, a second frame made at least in part from metal, spaced apart from the first frame along a moving direction of the drawer, and including a second outlet, a base panel made of a nonmetal lighter than metal, fixed to the first and second frames, and forming a bottom surface of the cabinet, and a metal cover fixed to the first and second frames and forming an upper surface and both sides of the cabinet.

Abstract: The present disclosure relates to a laundry treatment apparatus including a cabinet having an entrance, a drawer comprising a drying chamber, a bottom surface, a front surface extending upward from the bottom surface, a rear surface to face the front surface, and first and second side surfaces to connect the front and rear surfaces. The laundry apparatus includes a first rack disposed in the drying chamber, the first rack comprising a first vent portion allowing a space above and below the first rack to communicate with each other, a second rack disposed in the drying chamber and positioned between the first rack and the bottom surface, the second rack comprising a second vent portion, a supply port formed through the rear surface, an air supply unit located outside the drying chamber, and a guide in the supply port to guide air to at least one of the spaces.

Abstract: The present disclosure relates to a laundry dryer. The laundry treating apparatus includes a water supply connector for connecting an internal water supply pipe, a direct water pipe, and a water supply inlet pipe with each other. The water supply connector may include a connector main body and a connector backflow-preventing valve that is coupled into the connector main body to prevent water from flowing back toward an supply assembly, thereby preventing the water from flowing back to a water source and improving assembleability by mounting a check valve by only assembling a connector with a pipe.

Abstract: Semiconductor devices are provided. A semiconductor device includes a fin structure having a plurality of first semiconductor patterns and a plurality of second semiconductor patterns alternately stacked on a substrate, and extending in a first direction. The semiconductor device includes a semiconductor cap layer on an upper surface of the fin structure, and extending along opposite side surfaces of the fin structure in a second direction crossing the first direction. The semiconductor device includes a gate electrode on the semiconductor cap layer, and extending in the second direction. The semiconductor device includes a gate insulating film between the semiconductor cap layer and the gate electrode. Moreover, the semiconductor device includes a source/drain region connected to the fin structure. The plurality of first semiconductor patterns include silicon germanium (SiGe) having a germanium (Ge) content in a range of 25% to 35%, and the plurality of second semiconductor patterns include silicon (Si).

Abstract: A laundry treating apparatus may include a tub, a drum provided within the tub to accommodate laundry, flow path units provided on the drum to provide moving paths of water, an agitation unit provided within the drum so as to be rotatable and moving at least a part of water within the drum to the flow path units during rotation, and filter units to filter water moving along the flow path units. Each of the filter units includes a body configured to provide a storage space of foreign substances, an inflow part to introduce water in the flow path unit into the body, a filter provided on the body to filter water introduced into the body and then to discharge filtered water to the drum, and discharge parts provided on the body to discharge water containing foreign substances in the tangential direction of a rotating trajectory of the drum.

Abstract: The present disclosure relates to a laundry treatment apparatus including a cabinet having an entrance, a drawer comprising a drying chamber, a bottom surface, a front surface extending upward from the bottom surface, a rear surface to face the front surface, and first and second side surfaces to connect the front and rear surfaces. The laundry apparatus includes a first rack disposed in the drying chamber, the first rack comprising a first vent portion allowing a space above and below the first rack to communicate with each other, a second rack disposed in the drying chamber and positioned between the first rack and the bottom surface, the second rack comprising a second vent portion, a supply port formed through the rear surface, an air supply unit located outside the drying chamber, and a guide in the supply port to guide air to at least one of the spaces.

Abstract: A laundry treating apparatus may include a tub, a drum provided within the tub to accommodate laundry, flow path units provided on the drum to provide moving paths of water, an agitation unit provided within the drum so as to be rotatable and moving at least a part of water within the drum to the flow path units during rotation, and filter units to filter water moving along the flow path units. Each of the filter units includes a body configured to provide a storage space of foreign substances, an inflow part to introduce water in the flow path unit into the body, a filter provided on the body to filter water introduced into the body and then to discharge filtered water to the drum, and discharge parts provided on the body to discharge water containing foreign substances in the tangential direction of a rotating trajectory of the drum.

Abstract: A laundry treating apparatus may include a tub, a drum provided within the tub to accommodate laundry, flow path units provided on the drum to provide moving paths of water, an agitation unit provided within the drum so as to be rotatable and moving at least a part of water within the drum to the flow path units during rotation, and filter units to filter water moving along the flow path units. Each of the filter units includes a body configured to provide a storage space of foreign substances, an inflow part to introduce water in the flow path unit into the body, a filter provided on the body to filter water introduced into the body and then to discharge filtered water to the drum, and discharge parts provided on the body to discharge water containing foreign substances in the tangential direction of a rotating trajectory of the drum.

Abstract: A laundry treating apparatus may include a tub, a drum provided within the tub to accommodate laundry, flow path units provided on the drum to provide moving paths of water, an agitation unit provided within the drum so as to be rotatable and moving at least a part of water within the drum to the flow path units during rotation, and filter units to filter water moving along the flow path units. Each of the filter units includes a body configured to provide a storage space of foreign substances, an inflow part to introduce water in the flow path unit into the body, a filter provided on the body to filter water introduced into the body and then to discharge filtered water to the drum, and discharge parts provided on the body to discharge water containing foreign substances in the tangential direction of a rotating trajectory of the drum.