Abstract: A power supply controller is capable of regulating the amount of electrical power supplied to semiconductor fabrication facilities to amounts in accordance with processing conditions of each facility. The apparatus includes a plurality of process status detectors corresponding to the facilities, each status detector detecting an operation mode of each of the facilities and generating a mode detection signal. A plurality of unit controllers are provided, corresponding to the process status detectors, each unit controller generating a power control signal in response to the mode detection signal. A plurality of power supply units are provided, corresponding to the unit controllers, each power supply unit controlling and providing an amount of electrical power from the main power supply to the facilities in response to the power control signal corresponding the operation mode of each facility.

Abstract: A construction capable of easily coupling or disassembling two tubes. The construction has a first annular flange of an enclosing tube protruding radially outward, a telescoped tube inserted in the enclosing tube, a first seal member inserted between an outer surface of the telescoped tube and an outside cylindrical inner surface of the enclosing tube, a second seal member inserted between the outer surface of the telescoped tube and the outside cylindrical inner surface of the enclosing tube after the first seal member is inserted, and a coupler for coupling the enclosing tube and the second seal member.

Abstract: The present invention relates to a tube apparatus for manufacturing a semiconductor device, comprising a one-piece cylindrical tube having a door for loading a semiconductor wafer. One end of the tube is closed and two openings are formed adjacent thereto. The other end is conical and has an opening formed in the apex thereof. A saddle having two openings is mounted on the tube so that the two openings of the saddle correspond to the two openings of the tube which are adjacent to the closed end. Using the tube apparatus enhances the efficiency of a diffusion process. Contaminant residue does not remain in the process tube because the temperature therein is more uniform over the length of the tube, compared to a conventional apparatus. The tube can therefore be used semi-permanently.