Patents by Inventor Kyu-Chul Chung

Kyu-Chul Chung has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 9028294
    Abstract: Disclosed are an apparatus and a method for monitoring a glass plate polishing state. The apparatus may include a location measuring unit for measuring a location on a glass plate being polished by a polishing machine, a current measuring unit for measuring an electric current flowing into the polishing machine, a memory unit for storing a reference value of the electric current flowing into the polishing machine for each polishing location of the glass plate, and a control unit for determining whether a polishing state is faulty, by comparing a value of the electric current measured by the current measuring unit for each polishing location measured by the location measuring unit with a corresponding reference value of the electric current stored in the memory unit for each polishing location.
    Type: Grant
    Filed: March 10, 2011
    Date of Patent: May 12, 2015
    Assignee: LG Chem, Ltd.
    Inventors: Won-Jae Moon, Hyung-Young Oh, Dae-Yeon Lee, Jae-Ik Song, Young-Kuk Kim, Kyu-Chul Chung, Hyun-Chul Chung
  • Patent number: 8449351
    Abstract: A lower unit for a glass polishing system includes a support installed to a rotatable turntable, and a carrier having a supporting part for supporting a glass to be polished, and a placing part formed in a surface opposite to the supporting part and fixed and placed to the support.
    Type: Grant
    Filed: March 5, 2010
    Date of Patent: May 28, 2013
    Assignee: LG Chem, Ltd.
    Inventors: Won-Jae Moon, Sang-Oeb Na, Hyung-Young Oh, Yang-Han Kim, Young-Sik Kim, Kil-Ho Kim, Heui-Joon Park, Chang-Hee Lee, Dae-Yeon Lee, Jae-Ik Song, Wook Jeong, Young-Kuk Kim, Kyu-Chul Chung, Hyun-Chul Chung
  • Publication number: 20110223834
    Abstract: Disclosed are an apparatus and a method for monitoring a glass plate polishing state. The apparatus may include a location measuring unit for measuring a location on a glass plate being polished by a polishing machine, a current measuring unit for measuring an electric current flowing into the polishing machine, a memory unit for storing a reference value of the electric current flowing into the polishing machine for each polishing location of the glass plate, and a control unit for determining whether a polishing state is faulty, by comparing a value of the electric current measured by the current measuring unit for each polishing location measured by the location measuring unit with a corresponding reference value of the electric current stored in the memory unit for each polishing location.
    Type: Application
    Filed: March 10, 2011
    Publication date: September 15, 2011
    Inventors: Won-Jae MOON, Hyung-Young Oh, Dae-Yeon Lee, Jae-Ik Song, Young-Kuk Kim, Kyu-Chul Chung, Hyun-Chul Chung
  • Publication number: 20100227534
    Abstract: A lower unit for a glass polishing system includes a support installed to a rotatable turntable, and a carrier having a supporting part for supporting a glass to be polished, and a placing part formed in a surface opposite to the supporting part and fixed and placed to the support.
    Type: Application
    Filed: March 5, 2010
    Publication date: September 9, 2010
    Inventors: Won-Jae Moon, Sang-Oeb Na, Hyung-Young Oh, Yang-Han Kim, Young-Sik Kim, Kil-Ho Kim, Heui-Joon Park, Chang-Hee Lee, Dae-Yeon Lee, Jae-Ik Song, Wook Jeong, Young-Kuk Kim, Kyu-Chul Chung, Hyun-Chul Chung