Patents by Inventor Kyu Hee Kang

Kyu Hee Kang has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20250070108
    Abstract: The present technology relates to a reference point marking apparatus for marking reference points on a pattern electrode in which coated portions and uncoated portions are repeatedly arranged in a longitudinal direction, in which the pattern electrode includes a plurality of reserved electrode lane parts to be slit into a plurality of electrode lanes in the longitudinal direction in a subsequent process, and the reference point marking apparatus includes a moving marking machine configured to mark reference points on uncoated portions of the reserved electrode lane parts arranged in a width direction of the pattern electrode while moving in the width direction, and a controller configured to control an operation of the moving 10 marking machine. The present technology also provides a roll map generation apparatus using the reference point marking apparatus.
    Type: Application
    Filed: August 28, 2023
    Publication date: February 27, 2025
    Inventors: Jee Yeon Koh, Kyu Taek Kang, June Hee Kim, Min Kyu Sim, Jong Seok Park, Min Su Kim
  • Patent number: 12233257
    Abstract: An implantable lead having adjustable electrode locations and a system for controlling the same. The implantable lead may include a plurality of first electrodes exposed and formed at an upper part of a main body at given intervals, a plurality of second electrodes coupled to a stepped lower part of the main body and configured to deliver a stimulus signal to a core area into which the lead is inserted, and a plurality of signal lines embedded in the main body and configured to connect the first electrodes and the second electrodes in a one-to-one manner. In this case, a slot for coupling and up and down movement of the second electrodes may be formed in the lower part. As the second electrodes are individually moved along the slot by an external force acting on the signal lines, locations of the second electrodes in the lower part may be adjusted.
    Type: Grant
    Filed: January 6, 2021
    Date of Patent: February 25, 2025
    Assignee: SAMSUNG LIFE PUBLIC WELFARE FOUNDATION
    Inventors: Eun Kyoung Park, Tae Kyung Kim, Tae Woo Kim, Min Hee Kang, Dong Il Choi, Kyu Sung Lee
  • Publication number: 20250055013
    Abstract: Systems and methods for manufacturing a battery are disclosed. One system may include: a first cutter configured to cut a first electrode sheet into a first electrode portion; a second cutter configured to cut a second electrode sheet into a second electrode portion having a second length; a winder configured to form an electrode assembly by winding the first electrode portion, the second electrode portion, a separator between the first electrode portion and the second electrode portion; and an identification information assigning device configured to assign identification information to the electrode assembly based on: a cut count value of the first electrode sheet and/or a cut count value of the second electrode sheet; and/or a position coordinate value of the first electrode sheet and/or a position coordinate value of the second electrode sheet.
    Type: Application
    Filed: March 15, 2024
    Publication date: February 13, 2025
    Inventors: Kyu Taek KANG, Min Su KIM, Jong Seok PARK, June Hee KIM, Min Kyu SIM, Jee Yeon KOH
  • Patent number: 12218002
    Abstract: A semiconductor device including a first interlayer insulating film; a conductive pattern in the first interlayer insulating film; a resistance pattern on the conductive pattern; an upper etching stopper film spaced apart from the resistance pattern, extending in parallel with a top surface of the resistance pattern, and including a first metal; a lower etching stopper film on the conductive pattern, extending in parallel with a top surface of the first interlayer insulating film, and including a second metal; and a second interlayer insulating film on the upper etching stopper film and the lower etching stopper film, wherein a distance from a top surface of the second interlayer insulating film to a top surface of the upper etching stopper film is smaller than a distance from the top surface of the second interlayer insulating film to a top surface of the lower etching stopper film.
    Type: Grant
    Filed: December 13, 2023
    Date of Patent: February 4, 2025
    Assignee: SAMSUNG ELECTRONICS CO., LTD.
    Inventors: Sung Jin Kang, Jong Min Baek, Woo Kyung You, Kyu-Hee Han, Han Seong Kim, Jang Ho Lee, Sang Shin Jang