Abstract: A cooking device according to an exemplary embodiment of the present disclosure includes: a main body in which an inner pot is accommodated; a top plate provided in a lid cover coupled to the main body; a locking slide coupled on the top plate so as to be linearly movable in a first direction; and a locking structure including an engagement protrusion which is configured to be engaged with a flange portion of the inner pot. The locking structure is configured to be linearly moved, depending on a position of the locking slide performing a linear movement in the first direction, between a locking position where the engagement protrusion is positioned so as to overlap with the flange portion of the inner pot in a vertical direction and an unlocking position spaced apart from the locking position toward an outside of the top plate.

Abstract: The present invention relates to precursor compounds, and more particularly to nonpyrophoric precursor compounds suitable for use in thin film deposition through atomic layer deposition (ALD) or chemical vapor deposition (CVD), and to an ALD/CVD process using the same.

Abstract: The present disclosure relates to a compound capable of implementing thin film deposition through vapor deposition, and more particularly, to a rare earth compound which is applicable to atomic layer deposition (ALD) or chemical vapor deposition (CVD) and has excellent thermal stability and reactivity, a rare earth precursor containing the same, a method of preparing the same, and a method of forming a thin film using the same.

Abstract: The present invention relates to precursor compounds, and more particularly to nonpyrophoric precursor compounds suitable for use in thin film deposition through atomic layer deposition (ALD) or chemical vapor deposition (CVD), and to an ALD/CVD process using the same.