Abstract: The present disclosure relates to a compound capable of implementing thin film deposition through vapor deposition, and more particularly, to a rare earth compound which is applicable to atomic layer deposition (ALD) or chemical vapor deposition (CVD) and has excellent thermal stability and reactivity, a rare earth precursor containing the same, a method of preparing the same, and a method of forming a thin film using the same.

Abstract: A cooking device according to an embodiment of the present disclosure includes: a first pressure control device including: a first lower cylinder including a first lower flow path communicating with an accommodation space in the inner pot; a first upper cylinder disposed on the first lower cylinder and comprising a first upper flow path; and a first weight disposed on the first upper cylinder and configured to open/close the first upper flow path, and a shutter structure configured to switch between an opening position for opening the first lower flow path and a closing position for closing the first lower flow path; and a second pressure control device including a second cylinder which includes a second flow path communicating with the accommodation space, and a second weight which is disposed on the second cylinder and configured to open/close the second flow path.

Abstract: The technical idea of the present disclosure provides a cooking device including: a main body; an inner pot accommodated in the main body; and a main body lid connected to the main body and configured to cover the inner pot. The main body lid includes: a top plate; a rotation cover; a locking structure, wherein the locking structure is configured to linearly move between a locking position and an unlocking position in conjunction with the rotation of the rotation cover, wherein the locking position is a position where the engagement protrusion overlaps the flange of the inner pot in a vertical direction and the unlocking position is a position that is spaced apart outward from the locking position in a radial direction; and a pressing slider configured to elastically support the locking structure in a direction from the locking position toward the unlocking position.

Abstract: Proposed is a vapor deposition precursor composition that enables thin film deposition through vapor deposition. Specifically, proposed is a novel composition applicable to atomic layer deposition (ALD) or chemical vapor deposition (CVD), in which the novel composition having excellent reactivity, volatility, and thermal stability, a precursor composition containing the novel composition. Additionally, a method of manufacturing a thin film using the precursor composition is proposed.

Abstract: The present invention provides a cover assembly for a cooking apparatus configured to seal a gap between an inner pot accommodated in a main body of the cooking apparatus and a top plate of a main body lid of the cooking apparatus, wherein the cover assembly includes: a cover plate; and a packing coupled to and extending along a circumference of the cover plate, wherein the packing includes: a central body; an upper close contact protrusion extending inward from the central body to be inclined upward and configured to make close contact with the top plate; a lower close contact protrusion extending inward from the central body to be inclined downward and configured to make close contact with the inner pot; an upper air groove provided in an upper surface of the central body; and a lower air groove provided in a lower surface of the central body.

Abstract: The technical idea of the present disclosure provides a cooking device including: a main body; an inner pot accommodated in the main body; and a main body lid connected to the main body and configured to cover the inner pot. The main body lid includes: a top plate; a rotation cover; a locking structure, wherein the locking structure is configured to linearly move between a locking position and an unlocking position in conjunction with the rotation of the rotation cover, wherein the locking position is a position where the engagement protrusion overlaps the flange of the inner pot in a vertical direction and the unlocking position is a position that is spaced apart outward from the locking position in a radial direction; and a pressing slider configured to elastically support the locking structure in a direction from the locking position toward the unlocking position.

Abstract: A cooking device according to an exemplary embodiment of the present disclosure includes: a main body in which an inner pot is accommodated; a top plate provided in a lid cover coupled to the main body; a locking slide coupled on the top plate so as to be linearly movable in a first direction; and a locking structure including an engagement protrusion which is configured to be engaged with a flange portion of the inner pot. The locking structure is configured to be linearly moved, depending on a position of the locking slide performing a linear movement in the first direction, between a locking position where the engagement protrusion is positioned so as to overlap with the flange portion of the inner pot in a vertical direction and an unlocking position spaced apart from the locking position toward an outside of the top plate.

Abstract: A cooking device according to an exemplary embodiment of the present disclosure includes: a main body in which an inner pot is accommodated; a top plate provided in a lid cover coupled to the main body; a rotation cover coupled to the top plate to be rotatable along an edge of the top plate; a locking structure comprising a locking structure comprising an engagement protrusion configured to be engaged with a flange of the inner pot, wherein the locking structure is configured to linearly move, depending on a rotation angle of the rotation cover, between a locking position at which the engagement protrusion is located to overlap the flange of the inner pot in a vertical direction and an unlocking position spaced apart outward from the locking position in a radial direction.

Abstract: A cooking device according to an exemplary embodiment of the present disclosure includes: a top plate covering an inner pot; and a steam discharge structure including a post including a steam discharge passage connected to interior of the inner pot, a moving member disposed on the post to surround at least a portion of a side surface of the post, and configured to move in a first direction which is perpendicular to a direction in which a top surface of the top plate extends, a steam blocking member disposed within the steam discharge passage through a portion of the moving member, and configured to open/close the steam discharge passage based on a movement of the steam blocking member in the first direction, and an elastic member configured to provide an elastic force to the steam blocking member based on a movement of the moving member in the first direction.

Abstract: A cooking device according to an embodiment of the present disclosure includes: a first pressure control device including: a first lower cylinder including a first lower flow path communicating with an accommodation space in the inner pot; a first upper cylinder disposed on the first lower cylinder and comprising a first upper flow path; and a first weight disposed on the first upper cylinder and configured to open/close the first upper flow path, and a shutter structure configured to switch between an opening position for opening the first lower flow path and a closing position for closing the first lower flow path; and a second pressure control device including a second cylinder which includes a second flow path communicating with the accommodation space, and a second weight which is disposed on the second cylinder and configured to open/close the second flow path.

Abstract: A cooking device according to an exemplary embodiment of the present disclosure includes: a main body in which an inner pot is accommodated; a top plate provided in a lid cover coupled to the main body; a locking slide coupled on the top plate so as to be linearly movable in a first direction; and a locking structure including an engagement protrusion which is configured to be engaged with a flange portion of the inner pot. The locking structure is configured to be linearly moved, depending on a position of the locking slide performing a linear movement in the first direction, between a locking position where the engagement protrusion is positioned so as to overlap with the flange portion of the inner pot in a vertical direction and an unlocking position spaced apart from the locking position toward an outside of the top plate.

Abstract: The present invention relates to precursor compounds, and more particularly to nonpyrophoric precursor compounds suitable for use in thin film deposition through atomic layer deposition (ALD) or chemical vapor deposition (CVD), and to an ALD/CVD process using the same.

Abstract: The present disclosure relates to a compound capable of implementing thin film deposition through vapor deposition, and more particularly, to a rare earth compound which is applicable to atomic layer deposition (ALD) or chemical vapor deposition (CVD) and has excellent thermal stability and reactivity, a rare earth precursor containing the same, a method of preparing the same, and a method of forming a thin film using the same.

Abstract: The present invention relates to precursor compounds, and more particularly to nonpyrophoric precursor compounds suitable for use in thin film deposition through atomic layer deposition (ALD) or chemical vapor deposition (CVD), and to an ALD/CVD process using the same.