Abstract: A method of manufacturing a semiconductor device is disclosed. The method includes forming a first insulting layer on a substrate, forming a first conductor pattern in the first insulating layer, forming a second insulating layer on the first insulating layer, and forming a second wiring pattern and a contact via in the second insulating layer, wherein a top surface of the first insulating layer is higher than a top surface of the first conductor pattern.

Abstract: A method of manufacturing a semiconductor device is disclosed. The method includes forming a first insulting layer on a substrate, forming a first conductor pattern in the first insulating layer, forming a second insulating layer on the first insulating layer, and forming a second wiring pattern and a contact via in the second insulating layer, wherein a top surface of the first insulating layer is higher than a top surface of the first conductor pattern.

Abstract: A cooking apparatus is disclosed. The cooking apparatus includes an apparatus body, a cooking chamber defined in the apparatus body for cooking food, and a door for opening and closing the cooking chamber. The cooking chamber has an inner wall surface-treated by plasma.

Abstract: A cooking apparatus for assuring easier cleaning of contaminants, such as food residue, attached to the wall surface of a cavity in the cooking apparatus is disclosed. The cooking apparatus includes a body defining the outer appearance of the cooking apparatus, and a cavity defining a space for heating and cooking an object and having an inner surface to form an oil-repellent surface by being heated. In a cleaning method for the cooking apparatus, the inner surface of the cavity is heated prior to cooking food, to have an oil-repellency. The inner surface makes it difficult for the contaminants to be attached thereto. Even if the contaminants are attached, the contaminants have a very low adhesive power and thus are easy to clean.

Abstract: A cooking apparatus is disclosed. The cooking apparatus includes an apparatus body, a cooking chamber defined in the apparatus body for cooking food, and a door for opening and closing the cooking chamber. The cooking chamber has an inner wall surface-treated by plasma.

Abstract: A cooking apparatus for assuring easier cleaning of contaminants, such as food residue, attached to the wall surface of a cavity in the cooking apparatus is disclosed. The cooking apparatus includes a body defining the outer appearance of the cooking apparatus, and a cavity defining a space for heating and cooking an object and having an inner surface to form an oil-repellent surface by being heated. In a cleaning method for the cooking apparatus, the inner surface of the cavity is heated prior to cooking food, to have an oil-repellency. The inner surface makes it difficult for the contaminants to be attached thereto. Even if the contaminants are attached, the contaminants have a very low adhesive power and thus are easy to clean.

Abstract: A cooking device includes a cabinet, a cavity installed in the cabinet and having a cooking chamber therein, a door installed at the cabinet to open and close the cooking chamber, a ventilation passage formed to allow external air of the cabinet to pass through between the cavity and the cabinet so as to be discharged, a blower installed in the ventilation passage, and a cooking chamber air discharge unit for discharging air from the interior of the cooking chamber through the ventilation passage. Because the heated air inside the cooking chamber can be cooled by air which passes through the ventilation passage and then discharged, when the door is opened, heated air cannot be directly discharged to a user from the cooking chamber.

Abstract: A cooking device includes a cabinet, a cavity installed in the cabinet and having a cooking chamber therein, a door installed at the cabinet to open and close the cooking chamber, a ventilation passage formed to allow external air of the cabinet to pass through between the cavity and the cabinet so as to be discharged, a blower installed in the ventilation passage, and a cooking chamber air discharge unit for discharging air from the interior of the cooking chamber through the ventilation passage. Because the heated air inside the cooking chamber can be cooled by air which passes through the ventilation passage and then discharged, when the door is opened, heated air cannot be directly discharged to a user from the cooking chamber.