Abstract: A mounting apparatus is disclosed and includes a base that is supported by a ground surface, and a holder supported by the base and having a holder recess configured such that a portion of a mobility vehicle is inserted thereinto. The holder supports the portion of the mobility vehicle such that the mobility vehicle is prevented from deviating from an upright state when the portion of the mobility vehicle is inserted into the holder recess.

Abstract: A mobility charging device comprises a measurement unit configured to measure a voltage of a battery of a mobility device when the mobility device is electrically connected to an input/output interface, a determination unit configured to receive the voltage of the battery from the measurement unit, and determine a charging mode among a plurality of charging modes according to the voltage of the battery, and a charging unit configured to differently set cut-off voltages correspondingly to the plurality of charging modes, and provide charging voltage corresponding to a cut-off voltage set correspondingly to the charging mode to the mobility device through the input/output interface.

Abstract: Provided is an apparatus for parking a mobility device to minimize road occupancy and safely park a mobility device. The apparatus includes: a clamp formed to be fastened to an installation object, while surrounding the installation object; a connection portion having one end connected to the clamp; and a holder rotatably connected to the other end of the connection portion through a first hinge and coupled to a portion of the mobility device.

Abstract: The present disclosure relates to a method for carrying out dose delivery quality assurance for high-precision radiation treatment, in which parameters affecting a pass rate of dose delivery quality assurance can be derived through regression analysis, which is a known statistical analysis method, and a pass rate prediction model capable of predicting each parameter and the pass rate of dose delivery quality assurance can be derived, and accordingly, it can be predicted in advance whether dose delivery quality assurance will be passed according to the parameters through the above prediction model, without repeatedly carrying out dose delivery quality assurance according to a patient's treatment plan, and as a result, the efficiency of dose delivery quality assurance can be enhanced, and the time or capacity required for such quality assurance is reduced, such that radiation treatment for an actual patient can be quickly and precisely carried out.

Abstract: Disclosed are a system and method for managing a shared personal mobility device (SPM) capable of acquiring accurate location information of the SPM. The system for managing the SPM may include a dock configured to store SPMs, and an SPM management server configured to receive, from the dock and using an LPWA protocol, state information associated with the doc. The state information may include coordinates of the dock. The SPM management server may be further configured to receive location information associated with a returned SPM, and update, based on the coordinates of the dock, the location information associated with the returned SPM.

Abstract: A method for charging a micromobility and a charging stand therefor are provided. The charging stand includes a power device that supplies power, a mounting part including a charging part and a holding part configured to dock with at least one micromobility, a power conversion device including at least one converter or an inverter, and a control device that executes an operation for charging the at least one micromobility based on that the mounting part is mounted on the at least one micromobility. The control device receives power supplied from outside by means of the power device, converts the supplied power into a specified DC voltage, outputs at least a portion of the specified DC voltage to the charging part, converts the specified DC voltage into a specified AC voltage, and outputs at least a portion of the specified AC voltage to the charging part.

Abstract: A connection structure of a stator of a drive motor is configured to allow coils to be wound in a plurality of slots provided in a stator core and to connect the coils withdrawn from the slots. The coils are wound in the slots to form first-type structures and second-type structures configured such that withdrawal directions of three-phase (U-, W- and V-phase) withdrawal lines and N-phase withdrawal lines withdrawn from the slots of the first-type structures are opposite to withdrawal directions of three-phase (U-, W- and V-phase) withdrawal lines and N-phase withdrawal lines withdrawn from the slots of the second-type structures. The first-type structures and the second-type structures are disposed symmetrically to each other with respect to a reference line formed to divide the slots in half.

Abstract: A method of forming a hydrocarbon-containing polymer film on a semiconductor substrate by a capacitively-coupled plasma CVD apparatus. The method includes the steps of: vaporizing a hydrocarbon-containing liquid monomer (C?H?X?, wherein ? and ? are natural numbers of 5 or more; ? is an integer including zero; X is O, N or F) having a boiling point of about 20° C. to about 350° C. which is not substituted by a vinyl group or an acetylene group; introducing the vaporized gas and CO2 gas or H2 gas into a CVD reaction chamber inside which a substrate is placed; and forming a hydrocarbon-containing polymer film on the substrate by plasma polymerization of the gas, thereby reducing extinction coefficient (k) at 193 nm and increasing mechanical hardness.

Abstract: A plasma CVD apparatus for forming a thin film on a wafer having diameter Dw and thickness Tw, includes: a vacuum chamber; a shower plate; a top plate; a top mask portion for covering a top surface peripheral portion of the wafer; and a side mask portion for covering a side surface portion of the wafer. The side mask portion has an inner diameter of Dw+?, and the top mask portion is disposed at a clearance of Tw+? between a bottom surface of the top mask portion and a wafer-supporting surface of the top plate, wherein ? is more than zero, and ? is more than zero.