Patents by Inventor Kyuchul Seo

Kyuchul Seo has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Rapid heat treatment apparatus
    Patent number: 10600661
    Abstract: A rapid heat treatment apparatus comprises: a chamber for rapid heat treatment; a support stage radiating light to rapidly heat a substrate for rapid heat treatment; a substrate for temperature measurement which is made of a same material as the substrate for rapid heat treatment; a thermocouple for temperature measurement measuring a temperature of the substrate for temperature measurement; a support part formed of a light-transmitting material that supports the substrate for temperature measurement; and a light-transmitting plate disposed between the support part and the heat source device to isolate the opposite internals spaces of the chamber from each other, wherein the temperature of the substrate for temperature measurement, which is measured by the thermocouple, is considered to be the temperature of the substrate subjected to rapid heat treatment.
    Type: Grant
    Filed: March 11, 2016
    Date of Patent: March 24, 2020
    Assignee: ULTECH CO., LTD.
    Inventors: Changgil Seog, Daeyoung Kong, Mungyu Song, Kyuchul Seo
  • RAPID HEAT TREATMENT APPARATUS
    Publication number: 20180144955
    Abstract: A rapid heat treatment apparatus comprises: a chamber for rapid heat treatment; a support stage radiating light to rapidly heat a substrate for rapid heat treatment; a substrate for temperature measurement which is made of a same material as the substrate for rapid heat treatment; a thermocouple for temperature measurement measuring a temperature of the substrate for temperature measurement; a support part formed of a light-transmitting material that supports the substrate for temperature measurement; and a light-transmitting plate disposed between the support part and the heat source device to isolate the opposite internals spaces of the chamber from each other, wherein the temperature of the substrate for temperature measurement, which is measured by the thermocouple, is considered to be the temperature of the substrate subjected to rapid heat treatment.
    Type: Application
    Filed: March 11, 2016
    Publication date: May 24, 2018
    Inventors: Changgil Seog, Daeyoung Kong, Mungyu Song, Kyuchul Seo