Abstract: The present disclosure relates to a heat source device and a substrate processing apparatus including same. The substrate processing apparatus includes: a chamber having an inner space in which a substrate is processed; a substrate support provided inside the chamber and supporting the substrate; and a heat source device including a supporting body provided in at least one side of the chamber, and a heat source unit provided parallel to the substrate support so as to heat the substrate. The heat source unit is provided with a first light transmission conduit connected to the supporting body, a heat source provided inside the first light transmission conduit, and a first cooling conduit provided inside the first light transmission conduit while being spaced apart from the heat source, and having a first spraying hole to spray a cooling gas. The temperature of the substrate may be efficiently controlled.

Abstract: The present disclosure relates to a heat source device and a substrate processing apparatus including same. The substrate processing apparatus includes: a chamber having an inner space in which a substrate is processed; a substrate support provided inside the chamber and supporting the substrate; and a heat source device including a supporting body provided in at least one side of the chamber, and a heat source unit provided parallel to the substrate support so as to heat the substrate. The heat source unit is provided with a first light transmission conduit connected to the supporting body, a heat source provided inside the first light transmission conduit, and a first cooling conduit provided inside the first light transmission conduit while being spaced apart from the heat source, and having a first spraying hole to spray a cooling gas. The temperature of the substrate may be efficiently controlled.