Abstract: In one example, a semiconductor device can comprise a substrate, a device stack, first and second internal interconnects, and an encapsulant. The substrate can comprise a first and second substrate sides opposite each other, a substrate outer sidewall between the first substrate side and the second substrate side, and a substrate inner sidewall defining a cavity between the first substrate side and the second substrate side. The device stack can be in the cavity and can comprise a first electronic device, and a second electronic device stacked on the first electronic device. The first internal interconnect can be coupled to the substrate and the device stack. The encapsulant can cover the substrate inner sidewall and the device stack and can fill the cavity. Other examples and related methods are disclosed herein.

Abstract: An apparatus for fabricating a display panel, the apparatus including: a loading module configured to accommodate a large-area fabricating substrate, the loading module being configured to adjust an inclination of the large-area fabricating substrate from a rear surface of the large-area fabricating substrate and to press the large-area fabricating substrate; and an element transfer module configured to transfer a plurality of light emitting elements or an integrated circuit onto the large-area fabricating substrate and configured to bond and press a wafer on which the plurality of light emitting elements or the at least one integrated circuit is located onto the large-area fabricating substrate.

Abstract: An apparatus for fabricating a display panel, including a film fixing module configured to fix a stretched film on which a plurality of light emitting elements are arranged, a film pressurizing module configured to pressurize the stretched film, a first thickness detection module configured to detect, at each pressurization step, a modulus of elasticity and a change in thickness of the stretched film that is pressurized and stretched by the film pressurizing module, a second thickness detection module configured to detect, at each pressurization step, a change in thickness of an adhesive applied in a front direction of the stretched film, an image detection module configured to photograph the plurality of light emitting elements arranged on the stretched film for each pressurization step and to detect a change in arrangement information of the light emitting elements, and a main processor configured to database feature change information.

Abstract: A substrate processing apparatus includes: a conveyor belt configured to have an outer surface on which a bottom surface of a substrate is seated; and a polishing head unit configured to face an upper surface of the substrate, wherein the polishing head unit includes: a polishing head connected to a driver; a polishing pad configured to face the polishing head; a polishing pad fixing ring disposed between the polishing head and the polishing pad; and a temperature sensor configured to overlap the polishing pad fixing ring and to be spaced apart from the polishing pad fixing ring.

Abstract: Disclosed is a method for quantifying algal for management of water quality, performed by a computing device. The method may include: receiving a remote sensing image of an object of interest; and predicting a water quality variable based on the remote sensing image using a pre-trained algal estimation model.

Abstract: Disclosed is a method for quantifying algal for management of water quality, performed by a computing device. The method may include: receiving a remote sensing image of an object of interest; and predicting a water quality variable based on the remote sensing image using a pre-trained algal estimation model.

Abstract: The present invention relates to a method for measuring degree of biological contamination in a sea water desalination facility, and is characterized by comprising the following steps of: a) collecting any one selected from a group consisting of raw sea water flowing into the sea water desalination facility, pre-treated water prepared by pre-treating the raw sea water, product water (permeate) produced after the pre-treated water goes through a desalination process and brine; and b) measuring wavelength and strength of a natural phosphor, which is contained in the raw sea water, pre-treated water, product water (permeate) or brine, using a fluorescence spectrophotometer.

Abstract: The present invention relates to a method for measuring degree of biological contamination in a sea water desalination facility, and is characterized by comprising the following steps of: a) collecting any one selected from a group consisting of raw sea water flowing into the sea water desalination facility, pre-treated water prepared by pre-treating the raw sea water, product water (permeate) produced after the pre-treated water goes through a desalination process and brine; and b) measuring wavelength and strength of a natural phosphor, which is contained in the raw sea water, pre-treated water, product water (permeate) or brine, using a fluorescence spectrophotometer.