Patents by Inventor KyungHyun Sung

KyungHyun Sung has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240071737
    Abstract: A plasma sensor module may include an upper substrate, a lower substrate, at least one probe and a printed circuit board (PCB). The upper substrate may be configured to be exposed to plasma. The lower substrate may contact a lower surface of the upper substrate. The lower substrate may have a thickness that is thicker than a thickness of the upper substrate. The probe may be in the lower substrate. The PCB may be in the lower substrate. The PCB may be configured to apply an alternating current to the probe to detect a density of the plasma. Thus, the structural strength of the plasma sensor module may have improved structural strength.
    Type: Application
    Filed: March 23, 2023
    Publication date: February 29, 2024
    Inventors: Sungwon Cho, Dohoon Kwon, Kyunghyun Kim, Dougyong Sung, Jungmo Yang, Younseon Wang, Younsok Choi
  • Patent number: 8324898
    Abstract: Embodiments of the present disclosure are directed to systems and methods for providing tailored RF pulse trains, based on estimated B0 and B1 profiles, for uniform saturation for MRI techniques. The tailored pulse trains are optimized to minimize residual longitudinal magnetization in target tissue. The B0 and B1 profiles can be measured a priori over a desired region of a patient, e.g., the heart, and can overcome or mitigate SAR and B1 inhomogeneity constraints. In exemplary embodiments, the tailored pulse trains can include hard pulses with unequal weighting. In other embodiments, the tailored pulse trains can include BIR-4 pulse trains that are optimized to minimize residual longitudinal magnetization in target tissue. The tailored pulse train designs can improve the immunity to B1 variation while maintaining low RF power. MRI systems, methods, and controllers for providing tailored pulse trains are described.
    Type: Grant
    Filed: November 16, 2009
    Date of Patent: December 4, 2012
    Assignee: University of Southern California
    Inventors: Kyunghyun Sung, Krishna S. Nayak
  • Publication number: 20100127703
    Abstract: Embodiments of the present disclosure are directed to systems and methods for providing tailored RF pulse trains, based on estimated B0 and B1 profiles, for uniform saturation for MRI techniques. The tailored pulse trains are optimized to minimize residual longitudinal magnetization in target tissue. The B0 and B1 profiles can be measured a priori over a desired region of a patient, e.g., the heart, and can overcome or mitigate SAR and B1 inhomogeneity constraints. In exemplary embodiments, the tailored pulse trains can include hard pulses with unequal weighting. In other embodiments, the tailored pulse trains can include BIR-4 pulse trains that are optimized to minimize residual longitudinal magnetization in target tissue. The tailored pulse train designs can improve the immunity to B1 variation while maintaining low RF power. MRI systems, methods, and controllers for providing tailored pulse trains are described.
    Type: Application
    Filed: November 16, 2009
    Publication date: May 27, 2010
    Applicant: UNIVERSITY OF SOUTHERN CALIFORNIA
    Inventors: Kyunghyun Sung, Krishna S. Nayak
  • Patent number: 7372270
    Abstract: A method and system are described for compensating for non-uniformity of excitation field B1+ in magnetic resonance imaging (MRI) of an object. The variation in the RF excitation field B1+ is measured over a region of interest (ROI) in the object, the B1+ field causing nuclear spins in the object to flip at a flip angle when B1+ is applied to the object. The flip angle profile is designed to be proportional to a reciprocal of the measured variation in the excitation field B1+. One or more control parameters of the estimated flip angle profile is adjusted, in accordance with the measured variation in B1+, so as to cancel out variation in actual flip angle until a profile of the actual flip angle is achieved that is substantially uniform throughout the ROI.
    Type: Grant
    Filed: September 12, 2006
    Date of Patent: May 13, 2008
    Assignee: University of Southern California
    Inventors: KyungHyun Sung, Krishna Nayak