Abstract: The colored photosensitive resin composition of the present invention maintains excellent resolution, visibility, and the like while it has excellent reflectance RSCI measured by the SCI (specular component included) method, reflectance RSCE measured by the SCE (specular component excluded) method, and the ratio between them (RSCE/RSCI), and has a uniform film thickness in an appropriate range. Thus, it can be formed into a multilayer cured film that simultaneously satisfies such physical properties as a high reflectance and a high light-shielding property. In addition, when a cured film is formed from the composition, it is possible to form a pattern on a multilayer film in a single development process. Thus, it can be advantageously used for a quantum dot display device.

Abstract: Disclosed are a semiconductor device and an electronic system including the same. The semiconductor device may include a stack on a substrate and extending in a first direction, the stack including electrodes vertically stacked on the substrate, string selection lines that are on the stack, extend parallel to the first direction, and are spaced apart from each other in a second direction crossing the first direction, an upper separation pattern that is on the stack, extends in the first direction, and is between the string selection lines, lower vertical structures in the stack, and upper vertical structures in the string selection lines and electrically connected to the lower vertical structures, respectively.

Abstract: An optical proximity correction method includes extracting first patterns from a pattern mask, performing lithography on at least a part of the first patterns to form first-first patterns, forming the first-first patterns at positions where the first patterns are formed, and performing correction on the pattern mask on which the first-first patterns are formed.

Abstract: The present invention relates to a structure for a quantum dot barrier rib and a process for preparing the same. The structure for a quantum dot barrier rib of the present invention comprises a cured film having a uniform film thickness and an appropriate range of film thickness. Here, the reflectance RSCI measured by the SCI (specular component included) method and the reflectance RSCE measured by the SCE (specular component excluded) method are reduced, and the ratio between them (RSCE/RSCI) is appropriately adjusted, so that it is possible to satisfy such characteristics as high light-shielding property and low reflectance at the same time while the resolution and pattern characteristics are maintained to be excellent. In addition, when the structure for a quantum dot barrier rib is prepared, it is possible to form a multilayer pattern having a uniform film thickness suitable for the quantum dot barrier ribs in a single development process. Thus, it can be advantageously used for a quantum dot display.

Abstract: The present invention relates to a fluorinated acrylate-based copolymer and to a photosensitive resin composition comprising the same. The copolymer can have excellent water repellency even with a relatively low content of fluorine by introducing a non-polar ring-containing unit, so that it can prevent coating imbalance and decreases in the pattern strength that may occur when the fluorine content is high.

Abstract: The colored photosensitive resin composition of the present invention maintains excellent resolution, visibility, and the like while it has excellent reflectance RSCI measured by the SCI (specular component included) method, reflectance RSCE measured by the SCE (specular component excluded) method, and the ratio between them (RSCE/RSCI), and has a uniform film thickness in an appropriate range. Thus, it can be formed into a multilayer cured film that simultaneously satisfies such physical properties as a high reflectance and a high light-shielding property. In addition, when a cured film is formed from the composition, it is possible to form a pattern on a multilayer film in a single development process. Thus, it can be advantageously used for a quantum dot display device.

Abstract: An optical proximity correction method includes extracting first patterns from a pattern mask, performing lithography on at least a part of the first patterns to form first-first patterns, forming the first-first patterns at positions where the first patterns are formed, and performing correction on the pattern mask on which the first-first patterns are formed.

Abstract: In a method for minimizing optical proximity correction errors in a semiconductor pattern. The method includes modifying a mask in a quantized unit to reduce an edge placement error between a simulation layout shape and a target layout shape; adjusting a critical dimension (CD) error between a CD of the simulation layout shape and a CD of the target layout shape to generate an adjusted CD error by further modifying at least one side of the mask in a predetermined unit; and reforming the simulation layout shape by modifying each side of the mask with arbitrary correction values.

Abstract: The present invention relates to a structure for a quantum dot barrier rib and a process for preparing the same. The structure for a quantum dot barrier rib of the present invention comprises a cured film having a uniform film thickness and an appropriate range of film thickness. Here, the reflectance RSCI measured by the SCI (specular component included) method and the reflectance RSCE measured by the SCE (specular component excluded) method are reduced, and the ratio between them (RSCE/RSCI) is appropriately adjusted, so that it is possible to satisfy such characteristics as high light-shielding property and low reflectance at the same time while the resolution and pattern characteristics are maintained to be excellent. In addition, when the structure for a quantum dot barrier rib is prepared, it is possible to form a multilayer pattern having a uniform film thickness suitable for the quantum dot barrier ribs in a single development process. Thus, it can be advantageously used for a quantum dot display.

Abstract: A display device is disclosed. The display device includes a plurality of support units disposed side by side on the rear surface of a flexible display panel, a resin unit, which is made of a resin, for elastically interconnecting the support units, and a restoration unit protruding from each support unit for interfering with the resin unit, which stretches when the display panel is bent, in order to restore the display panel to the original state thereof. The support units may be integrally formed with the resin unit in order to maintain the flatness of the display panel. In addition, when impact is applied to the display panel, the support units may distribute the impact to the periphery of the display panel, thereby preventing damage to the display panel.

Abstract: The present invention relates to a colored photosensitive resin composition that prevents the generation of uneven wrinkles when a cured film is formed, to thereby prevent spots that may be generated on the edges of a display upon the formation thereof, and has a short development time. Accordingly, the colored photosensitive resin composition can be advantageously used as a material for forming a protective film, an interlayer insulating film, a light shielding spacer such as a black column spacer, and the like to be employed in various electronic parts inclusive of a liquid crystal display (LCD) panel and an organic light emitting diode (OLED) display panel.

Abstract: The present invention relates to a colored photosensitive resin composition capable of forming a cured film that does not generate uneven wrinkles on its surface, to thereby minimize spots on the display screen that may be generated by a defect in the gap between the upper and lower plates during their assembly, with the formation of an excellent step difference and a pattern in a high resolution; and to a light shielding spacer produced therefrom and used for a liquid crystal display, an organic EL display, or the like.

Abstract: In a method for minimizing optical proximity correction errors in a semiconductor pattern. The method includes modifying a mask in a quantized unit to reduce an edge placement error between a simulation layout shape and a target layout shape; adjusting a critical dimension (CD) error between a CD of the simulation layout shape and a CD of the target layout shape to generate an adjusted CD error by further modifying at least one side of the mask in a predetermined unit; and reforming the simulation layout shape by modifying each side of the mask with arbitrary correction values.

Abstract: The present invention relates to a colored photosensitive resin composition capable of forming a cured film that does not generate uneven wrinkles on its surface at the time of its formation, and a light shielding spacer produced therefrom and used for a liquid crystal display, an organic EL display, or the like.

Abstract: The present invention relates to a colored photosensitive resin composition and to a light shielding spacer prepared therefrom. The colored photosensitive resin composition comprises an oxime ester fluorene-based compound as a photopolymerization initiator in a small amount, which is capable of forming a cured film that is excellent in terms of such properties as sensitivity, elastic recovery rate, resolution, chemical resistance, exudation resistance, voltage holding ratio, and the like. Accordingly, a light shielding spacer prepared therefrom can be advantageously used for a liquid crystal display, an organic EL display, and the like.

Abstract: A display device is disclosed. The display device includes a plurality of support units disposed side by side on the rear surface of a flexible display panel, a resin unit, which is made of a resin, for elastically interconnecting the support units, and a restoration unit protruding from each support unit for interfering with the resin unit, which stretches when the display panel is bent, in order to restore the display panel to the original state thereof. The support units may be integrally formed with the resin unit in order to maintain the flatness of the display panel. In addition, when impact is applied to the display panel, the support units may distribute the impact to the periphery of the display panel, thereby preventing damage to the display panel.

Abstract: The present invention relates to a colored photosensitive resin composition that prevents the generation of uneven wrinkles when a cured film is formed, to thereby prevent spots that may be generated on the edges of a display upon the formation thereof, and has a short development time. Accordingly, the colored photosensitive resin composition can be advantageously used as a material for forming a protective film, an interlayer insulating film, a light shielding spacer such as a black column spacer, and the like to be employed in various electronic parts inclusive of a liquid crystal display (LCD) panel and an organic light emitting diode (OLED) display panel.

Abstract: The present invention relates to a colored photosensitive resin composition capable of forming a cured film that does not generate uneven wrinkles on its surface, to thereby minimize spots on the display screen that may be generated by a defect in the gap between the upper and lower plates during their assembly, with the formation of an excellent step difference and a pattern in a high resolution; and to a light shielding spacer produced therefrom and used for a liquid crystal display, an organic EL display, or the like.

Abstract: The present invention relates to a colored photosensitive resin composition and to a light shielding spacer produced therefrom. The colored photosensitive resin composition comprises epoxy groups and double bonds in a specific molar ratio and an oxime ester fluorene-based photopolymerization initiator in a smaller amount than a conventional oxime ester-based photopolymerization initiator, so that it has excellent photo-curing characteristics. As a result, it is possible to improve the high sensitivity characteristics such as resolution and step difference even with a small amount of light. Specifically, since the curing characteristics of the film surface is improved, it is to possible to reduce the generation of outgassing, which is a contamination source that may be generated when the film is dried. In addition, the colored photosensitive resin composition is capable of forming a cured film that minimizes the generation of uneven wrinkles on its surface.

Abstract: The present invention relates to a colored photosensitive resin composition and to a light shielding spacer prepared therefrom. The colored photosensitive resin composition comprises an oxime ester fluorene-based compound as a photopolymerization initiator in a small amount, which is capable of forming a cured film that is excellent in terms of such properties as sensitivity, elastic recovery rate, resolution, chemical resistance, exudation resistance, voltage holding ratio, and the like. Accordingly, a light shielding spacer prepared therefrom can be advantageously used for a liquid crystal display, an organic EL display, and the like.