Patents by Inventor Kyung-moon Byun

Kyung-moon Byun has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 8026147
    Abstract: Provided is a method of fabricating a semiconductor microstructure, the method including forming a lower material layer on a semiconductor substrate, the lower material layer including a nitride of a Group III-element; forming a mold material layer on the lower material layer; forming an etching mask on the mold material layer, the etching mask being for forming a structure in the mold material layer; anisotropic-etching the mold material layer and the lower material layer by using the etching mask; and isotropic-etching the mold material layer and the lower material layer.
    Type: Grant
    Filed: August 13, 2010
    Date of Patent: September 27, 2011
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Yongsoon Choi, Kyung-moon Byun, Eunkee Hong, Eun-kyung Baek
  • Publication number: 20110039393
    Abstract: Provided is a method of fabricating a semiconductor microstructure, the method including forming a lower material layer on a semiconductor substrate, the lower material layer including a nitride of a Group III-element; forming a mold material layer on the lower material layer; forming an etching mask on the mold material layer, the etching mask being for forming a structure in the mold material layer; anisotropic-etching the mold material layer and the lower material layer by using the etching mask; and isotropic-etching the mold material layer and the lower material layer.
    Type: Application
    Filed: August 13, 2010
    Publication date: February 17, 2011
    Inventors: Yongsoon Choi, Kyung-moon Byun, Eunkee Hong, Eun-kyung Baek