Abstract: The present invention relates to a phosphine precursor for the preparation of a quantum dot, and a quantum dot prepared therefrom. Using the phosphine precursor for the preparation of a quantum dot of the present invention, a quantum dot with improved luminous efficiency and higher luminous color purity can be provided.

Abstract: An extreme ultraviolet (EUV) generating device is provided. The EUV generating device includes a gas cell housing extending in a first direction, a light guide passage extending through the gas cell housing in the first direction, and a gas supply passage to supply a plasma reaction gas. The light guide passage includes an incident portion to receive incident light, a plasma reaction portion, extending from the incident portion in the first direction to generate EUV light due to a reaction between the incident light and the plasma reaction gas, and an emission portion, extending from the plasma reaction portion in the first direction, to emit the EUV light in the first direction. The gas supply passage may be connected to the plasma reaction portion at a side of the gas cell housing and may be inclined at an acute angle with respect to the first direction.

Abstract: Manufacturing a device may include inspecting a surface of an inspection target device. The inspecting may include forming a metal layer on a surface of the inspection target device on which a minute pattern is formed, directing a beam of light to be incident and normal to the surface of the inspection target device, determining a spectrum of light reflected from the surface of the inspection target device, and generating, via the spectrum, information associated with a structural characteristic of the minute pattern formed on the inspection target device. The inspection target device may be selectively incorporated into the manufactured device based on the generated information.

Abstract: An extreme ultraviolet (EUV) generating device is provided. The EUV generating device includes a gas cell housing extending in a first direction, a light guide passage extending through the gas cell housing in the first direction, and a gas supply passage to supply a plasma reaction gas. The light guide passage includes an incident portion to receive incident light, a plasma reaction portion, extending from the incident portion in the first direction to generate EUV light due to a reaction between the incident light and the plasma reaction gas, and an emission portion, extending from the plasma reaction portion in the first direction, to emit the EUV light in the first direction. The gas supply passage may be connected to the plasma reaction portion at a side of the gas cell housing and may be inclined at an acute angle with respect to the first direction.

Abstract: A clock signal generator includes an optic mirror rotatable to scan an incident light beam in a first direction, a grid plate including a plurality of grid arrays arranged in a second direction different from the first direction, wherein light reflected from the optic mirror is selectively passed through when the light beam is scanned on the grid plate in the first direction, the grid array being offset in the first direction by a particular distance with respect to an adjacent grid array, a light detector configured to detect a light passing through the grid arrays, and a pixel clock generator configured to generate a clock signal based on detection signals received from the light detector.

Abstract: An optical inspection apparatus includes a broadband light source, a monochromator, an image obtaining apparatus, and an analysis device. The monochromator is configured to convert light from the broadband light source into a plurality of monochromatic beams of different wavelengths and sequentially output the monochromatic beams, where each beam has a preset wavelength width and corresponds to one of a plurality of different wavelength regions. The image obtaining apparatus is configured to allow each monochromatic beam output from the monochromator to be incident to a top surface of an inspection target without using a beam splitter, allow light reflected by the inspection target to travel in a form of light of an infinite light source, and generate 2D images of the inspection target. The analysis device is configured to analyze the 2D images of the inspection target in the plurality of wavelength regions.

Abstract: Manufacturing a device may include inspecting a surface of an inspection target device. The inspecting may include forming a metal layer on a surface of the inspection target device on which a minute pattern is formed, directing a beam of light to be incident and normal to the surface of the inspection target device, determining a spectrum of light reflected from the surface of the inspection target device, and generating, via the spectrum, information associated with a structural characteristic of the minute pattern formed on the inspection target device. The inspection target device may be selectively incorporated into the manufactured device based on the generated information.

Abstract: A clock signal generator includes an optic mirror rotatable to scan an incident light beam in a first direction, a grid plate including a plurality of grid arrays arranged in a second direction different from the first direction, wherein light reflected from the optic mirror is selectively passed through when the light beam is scanned on the grid plate in the first direction, the grid array being offset in the first direction by a particular distance with respect to an adjacent grid array, a light detector configured to detect a light passing through the grid arrays, and a pixel clock generator configured to generate a clock signal based on detection signals received from the light detector.