Patents by Inventor Kyungjoo MIN

Kyungjoo MIN has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Chemical vapor deposition apparatus and method of manufacturing display apparatus using the same
    Patent number: 11842883
    Abstract: A chemical vapor deposition apparatus includes a chamber, a susceptor supporting a substrate, a backing plate to which power is applied, a diffuser providing a deposition gas, and a first insulator. The first insulator may include a first portion covering a top surface of the backing plate, and a second portion assembled with the first portion and covering a sidewall of the backing plate.
    Type: Grant
    Filed: April 11, 2022
    Date of Patent: December 12, 2023
    Assignee: Samsung Display Co., Ltd.
    Inventors: Jong-hoon Park, Sukwon Jung, Hyunwoo Joo, Jaihyuk Choi, Kyungjoo Min, Wonwoong Park
  • IMPRINT APPARATUS
    Publication number: 20230311404
    Abstract: An imprint device according to an embodiment includes: a stage, which supports a substrate; a press roller, which presses a film with respect to the substrate; a first load cell and a second load cell, which are disposed corresponding to opposite ends of the press roller, respectively; and a controller, which monitors a release state of the film based on an output of the first load cell and an output of the second load cell.
    Type: Application
    Filed: November 18, 2022
    Publication date: October 5, 2023
    Inventors: Kangwon LEE, Soo Beom JO, Dong Kyun KO, Kyungjoo MIN, Eun Chan LIM, Myung Soo HUH
  • CHEMICAL VAPOR DEPOSITION APPARATUS AND METHOD OF MANUFACTURING DISPLAY APPARATUS USING THE SAME
    Publication number: 20220238306
    Abstract: A chemical vapor deposition apparatus includes a chamber, a susceptor supporting a substrate, a backing plate to which power is applied, a diffuser providing a deposition gas, and a first insulator. The first insulator may include a first portion covering a top surface of the backing plate, and a second portion assembled with the first portion and covering a sidewall of the backing plate.
    Type: Application
    Filed: April 11, 2022
    Publication date: July 28, 2022
    Inventors: Jong-hoon Park, Sukwon Jung, Hyunwoo Joo, Jaihyuk Choi, Kyungjoo Min, Wonwoong Park
  • Chemical vapor deposition apparatus and method of manufacturing display apparatus using the same
    Patent number: 11302517
    Abstract: A chemical vapor deposition apparatus includes a chamber, a susceptor supporting a substrate, a backing plate to which power is applied, a diffuser providing a deposition gas, and a first insulator. The first insulator may include a first portion covering a top surface of the backing plate, and a second portion assembled with the first portion and covering a sidewall of the backing plate.
    Type: Grant
    Filed: May 31, 2018
    Date of Patent: April 12, 2022
    Inventors: Jong-hoon Park, Sukwon Jung, Hyunwoo Joo, Jaihyuk Choi, Kyungjoo Min, Wonwoong Park
  • Chemical vapor deposition system including ground strap bar
    Patent number: 11214870
    Abstract: A chemical vapor deposition (CVD) system may include a chamber, a susceptor provided in the chamber to support a substrate, a gas distribution part provided over the susceptor, a first ground strap bar provided on a bottom inner surface of the chamber and electrically connected to the chamber, a second ground strap bar provided on a bottom surface of the susceptor and electrically connected to the susceptor, and a plurality of ground straps electrically connected to the first and second ground strap bars, each of the plurality of ground straps including two opposite portions that are fastened to the first and second ground strap bars, respectively.
    Type: Grant
    Filed: May 25, 2018
    Date of Patent: January 4, 2022
    Inventors: Jaihyuk Choi, Jong-hoon Park, Kyungjoo Min, Wonwoong Park, Sukwon Jung, Hyunwoo Joo, Myungsoo Huh
  • CHEMICAL VAPOR DEPOSITION APPARATUS AND METHOD OF MANUFACTURING DISPLAY APPARATUS USING THE SAME
    Publication number: 20190019652
    Abstract: A chemical vapor deposition apparatus includes a chamber, a susceptor supporting a substrate, a backing plate to which power is applied, a diffuser providing a deposition gas, and a first insulator. The first insulator may include a first portion covering a top surface of the backing plate, and a second portion assembled with the first portion and covering a sidewall of the backing plate.
    Type: Application
    Filed: May 31, 2018
    Publication date: January 17, 2019
    Inventors: Jong-hoon Park, Sukwon Jung, Hyunwoo Joo, Jaihyuk Choi, Kyungjoo Min, Wonwoong Park
  • CHEMICAL VAPOR DEPOSITION SYSTEM
    Publication number: 20180340258
    Abstract: A chemical vapor deposition (CVD) system may include a chamber, a susceptor provided in the chamber to support a substrate, a gas distribution part provided over the susceptor, a first ground strap bar provided on a down-side surface of the chamber and electrically connected to the chamber, a second ground strap bar provided on a bottom surface of the susceptor and electrically connected to the susceptor, and a plurality of ground straps electrically connected to the first and second ground strap bars, each of the plurality of ground straps including two opposite portions that are fastened to the first and second ground strap bars, respectively.
    Type: Application
    Filed: May 25, 2018
    Publication date: November 29, 2018
    Inventors: Jaihyuk CHOI, Jong-hoon PARK, Kyungjoo MIN, Wonwoong PARK, Sukwon JUNG, Hyunwoo JOO, Myungsoo HUH