Patents by Inventor Kyun Phyo Lee

Kyun Phyo Lee has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Polymer for preparing resist underlayer film, resist underlayer film composition containing the polymer and method for manufacturing semiconductor device using the composition
    Patent number: 10227450
    Abstract: Provided are a polymer used for a manufacturing process of a semiconductor and a display, a resist underlayer film composition containing the polymer for a manufacturing process of a semiconductor and a display, and a method for manufacturing semiconductor device using the composition, and more specifically, the polymer of the present disclosure simultaneously has optimized etching selectivity and planarization characteristics, such that the resist underlayer film composition containing the polymer is usable as a hard mask for a multilayer semiconductor lithography process.
    Type: Grant
    Filed: July 12, 2016
    Date of Patent: March 12, 2019
    Assignees: SK Innovation Co., Ltd., SK Global Chemical Co., Ltd.
    Inventors: Min Ho Jung, Yu Na Shim, Kyun Phyo Lee, Jin Su Ham, Soo Young Hwang
  • Polymer for preparing resist underlayer film, resist underlayer film composition containing the polymer and method for manufacturing semiconductor device using the composition
    Patent number: 9996007
    Abstract: Provided are a polymer used for a manufacturing process of a semiconductor and a display, a resist underlayer film composition containing the polymer for a manufacturing process of a semiconductor and a display, and a method for manufacturing semiconductor device using the composition, and more specifically, the polymer of the present disclosure simultaneously has optimized etching selectivity, planarization characteristic, and excellent thermal resistance, such that the resist underlayer film composition containing the polymer is usable as a hard mask for a multilayer semiconductor lithography process.
    Type: Grant
    Filed: July 12, 2016
    Date of Patent: June 12, 2018
    Assignees: SK Innovation Co., Ltd., SK Global Chemical Co., Ltd.
    Inventors: Min Ho Jung, Yu Na Shim, Kyun Phyo Lee, Jin Su Ham, Soo Young Hwang
  • Polymer for Preparing Resist Underlayer Film, Resist Underlayer Film Composition Containing the Polymer and Method for Manufacturing Semiconductor Device Using the Composition
    Publication number: 20170015785
    Abstract: Provided are a polymer used for a manufacturing process of a semiconductor and a display, a resist underlayer film composition containing the polymer for a manufacturing process of a semiconductor and a display, and a method for manufacturing semiconductor device using the composition, and more specifically, the polymer of the present disclosure simultaneously has optimized etching selectivity and planarization characteristics, such that the resist underlayer film composition containing the polymer is usable as a hard mask for a multilayer semiconductor lithography process.
    Type: Application
    Filed: July 12, 2016
    Publication date: January 19, 2017
    Inventors: Min Ho Jung, Yu Na Shim, Kyun Phyo Lee, Jin Su Ham, Soo Young Hwang
  • Polymer for Preparing Resist Underlayer Film, Resist Underlayer Film Composition Containing the Polymer and Method for Manufacturing Semiconductor Device Using the Composition
    Publication number: 20170015779
    Abstract: Provided are a polymer used for a manufacturing process of a semiconductor and a display, a resist underlayer film composition containing the polymer for a manufacturing process of a semiconductor and a display, and a method for manufacturing semiconductor device using the composition, and more specifically, the polymer of the present disclosure simultaneously has optimized etching selectivity, planarization characteristic, and excellent thermal resistance, such that the resist underlayer film composition containing the polymer is usable as a hard mask for a multilayer semiconductor lithography process.
    Type: Application
    Filed: July 12, 2016
    Publication date: January 19, 2017
    Inventors: Min Ho Jung, Yu Na Shim, Kyun Phyo Lee, Jin Su Ham, Soo Young Hwang