Patents by Inventor Kyu Sik Shin
Kyu Sik Shin has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 12158600Abstract: A polarizing plate and an optical display apparatus including the same are provided. The polarizing plate includes: a polarizer; and a first retardation layer and a second retardation layer sequentially stacked on a lower surface of the polarizer. The first retardation layer has an in-plane retardation (Re) of 200 nm to 250 nm at a wavelength of 550 nm; the second retardation layer has an in-plane retardation (Re) of 80 nm to 140 nm at a wavelength of 550 nm; and the polarizing plate has a total transmittance difference of 2% or more between total transmittance at a wavelength of 450 nm and total transmittance at a wavelength of 420 nm.Type: GrantFiled: June 6, 2023Date of Patent: December 3, 2024Assignee: Samsung SDI Co., Ltd.Inventors: Jun Mo Koo, Jung Hun You, Sang Hum Lee, Bong Choon Kim, Yoon Jung Kim, Ri Ra Jung, Kyu Sik Kim, Kwang Ho Shin, Han Mam Jeong, Eun Su Park
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Publication number: 20240337575Abstract: Proposed is a microplastic detection sensor for detecting information about microplastic contained in a sample. The sensor may include a fluidic channel substrate including an inlet and an outlet, and a plurality of RF resonance structures. The inlet may be formed on one end of the fluidic channel substrate, and the outlet may be formed on the other end. The fluidic channel substrate may have a microfluidic channel formed therein to connect the inlet and the outlet. The microfluidic channel may move the sample toward the outlet by capillary action. In the fluidic channel substrate, a plurality of capture parts, respectively corresponding to the RF resonance structures, may be formed along the microfluidic channel and may selectively capture the microplastic by particle size. The RF resonance structures may output information about the microplastic captured in the corresponding capture part through RF resonance for the applied RF signal.Type: ApplicationFiled: January 5, 2024Publication date: October 10, 2024Inventors: Jin Hyoung KIM, Kyu Sik SHIN, Cheol Ung CHA, Kwon Hong LEE
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Publication number: 20240288380Abstract: Proposed are a microplastic concentration measurement sensor and a microplastic concentration measurement system using the sensor. The sensor may include a fluidic channel layer having a microfluidic channel formed on an upper surface thereof, and a molding layer formed on the fluidic channel layer and having first through-holes located respectively above one end and other end of the microfluidic channel. The sensor may also include a first substrate layer formed on the molding layer and having second through-holes located respectively above the first through-holes. The sensor may further include a single line formed on an upper surface of the first substrate layer, a second substrate layer formed below the fluidic channel layer, and a resonant layer formed on a lower surface of the second substrate layer.Type: ApplicationFiled: January 5, 2024Publication date: August 29, 2024Inventors: Jin Hyoung KIM, Kyu Sik SHIN, Cheol Ung CHA, Kwon Hong LEE
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Publication number: 20240212891Abstract: A thermal resistance device having a vanadium oxide layer and a method of manufacturing the thermal resistance device are proposed. The device may include a stress control pattern that can improve temperature coefficient of resistance (TCR) characteristics. The thermal resistance device may include a support comprising silicon and having an opening formed in a center thereof, and a silicon oxynitride layer formed on the support to cover the opening. The thermal resistance device may also include the stress control pattern formed of a patterned metal material on the silicon oxynitride layer over the opening. The thermal resistance device may further include the vanadium oxide layer formed to cover the stress control pattern and receiving tensile stress from the stress control pattern.Type: ApplicationFiled: October 30, 2023Publication date: June 27, 2024Inventors: Kyu Sik SHIN, Sung Min HONG
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Publication number: 20230157603Abstract: This application relates to a pressure sensor array for urodynamic testing capable of simultaneously measuring bladder pressure, prostate pressure, and urethral pressure, and to a test apparatus including the pressure sensor array. In one aspect, the pressure sensor array for urodynamic testing is installed in a catheter and includes a base substrate having flexibility. The pressure sensor array may also include a bladder pressure sensor formed on a portion of the base substrate to be positioned in bladder and measuring bladder pressure. The pressure sensor array may further include a prostate pressure sensor formed on a portion of the base substrate to be positioned in prostate and measuring prostate pressure. The pressure sensor array may further include a urethral pressure sensor formed on a portion of the base substrate to be positioned in urethra and measuring urethral pressure.Type: ApplicationFiled: January 5, 2022Publication date: May 25, 2023Inventors: Kyu Sik SHIN, Yeon Hwa KWAK, Cheol Ung CHA
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Patent number: 8754453Abstract: The capacitive pressure sensor comprises: a substrate functioning as a lower electrode; a first insulating film formed on the substrate; a cavity formed on the first insulating film; a second insulating film formed on the first insulating film to have openings communicated with the cavity and to cover the cavity; a sealing film formed of a conductive material to seal the openings and to extend partially into the cavity through the openings; and an upper electrode formed on the second insulating film to be electrically separated from the sealing film and to overlap the cavity.Type: GrantFiled: July 21, 2011Date of Patent: June 17, 2014Assignee: Korea Electronics Technology InstituteInventors: Hak-In Hwang, Dae-Sung Lee, Kyu-Sik Shin
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Publication number: 20130126994Abstract: The capacitive pressure sensor comprises: a substrate functioning as a lower electrode; a first insulating film formed on the substrate; a cavity formed on the first insulating film; a second insulating film formed on the first insulating film to have openings communicated with the cavity and to cover the cavity; a sealing film formed of a conductive material to seal the openings and to extend partially into the cavity through the openings; and an upper electrode formed on the second insulating film to be electrically separated from the sealing film and to overlap the cavity.Type: ApplicationFiled: July 21, 2011Publication date: May 23, 2013Applicant: KOREA ELECTRONICS TECHNOLOGY INSTITUTEInventors: Hak-In Hwang, Dae-Sung Lee, Kyu-Sik Shin
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Publication number: 20130040448Abstract: In a method of forming a metal or metal nitride pattern, a metal or metal nitride layer is formed on a substrate, and a photoresist pattern is formed on the metal or metal nitride layer. An over-coating composition is coated on the metal or metal nitride layer and on the photoresist pattern to form a capping layer on the photoresist pattern. The over-coating composition includes a polymer having amine groups as a side chain or a branch and a solvent. A remaining portion of the over-coating composition is removed by washing with a hydrophilic solution. The metal or metal nitride layer is partially removed using the capping layer and the photoresist pattern as an etching mask.Type: ApplicationFiled: August 9, 2012Publication date: February 14, 2013Applicant: SAMSUNG ELECTRONICS CO., LTD.Inventors: Joo-Hyung Yang, Yool Kang, Hyung-Rae Lee, Kyu-Sik Shin, Jae-ho Kim, Dong-Jun Lee
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Patent number: 7770951Abstract: A micro gripper and a method for manufacturing the same are disclosed. The manufacturing method of the micro gripper supplies a fluid to a penetration hole of a gripper jaw, and discharges the fluid from opposite surfaces of the first and second structures of the micro gripper, thereby completely detaching the object attached on the opposite surfaces of the first and second structures by electrostatic force and removing the stiction. Furthermore, the present invention can grip the object more strongly by sucking the fluid from the penetration hole of the gripper jaw, when the first and second structures of the gripper jaw grip the object.Type: GrantFiled: March 30, 2006Date of Patent: August 10, 2010Assignee: Korea Electronics Technology InstituteInventors: Kyu Sik Shin, Joon Shik Park, Kwang Bum Park, Chan Woo Moon
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Publication number: 20080154092Abstract: The present invention relates to a capsule type endoscope with embedded memory. More specifically, the present invention relates to a capsule type endoscope with embedded memory, which is equipped with flash memory and does not need a transmitter for wireless communication or a receiver, to reduce power consumption of the capsule type endoscope and improve convenience in use.Type: ApplicationFiled: December 26, 2007Publication date: June 26, 2008Applicant: KOREA ELECTRONICS TECHNOLOGY INSTITUTEInventors: Dae Sung Lee, Nam Kyu Cho, Kyu Sik Shin, Hak In Hwang
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Publication number: 20080154093Abstract: Disclosed is a capsule type endoscope with an insertion tube, which is capable of improving diagnosis and treatment of a patient's disease by attaching manipulation wires, an electric power line, and a signal line to a conventional capsule type endoscope. A specific embodiment of the present invention comprises and is characterized by a capsule containing a photographic system for acquiring images from the internal cavities of the human body; at least one manipulation wire connected to the capsule; an electric power line and a signal line connected to the capsule; an insertion tube for protecting the manipulation wire, the electric power line and the signal line; and a connection section for connecting the capsule with the insertion tube.Type: ApplicationFiled: November 16, 2007Publication date: June 26, 2008Applicant: KOREA ELECTRONICS TECHNOLOGY INSTITUTEInventors: Nam Kyu Cho, Dae Sung Lee, Kyu Sik Shin, Don Haeng Lee
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Patent number: 7050163Abstract: The present invention provides an apparatus for solution component analysis and fabricating method thereof, by which a mixing channel, reaction channel, and measurement channel are formed as continuous micro-grooves on one substrate to implement the miniature apparatus for analyzing solution components, by which the apparatus is provided with portability facilitating access to a spot outside a laboratory to perform an instant sample analysis, and by which an optical system configuration for sample analysis can be simplified in a manner of facilitating an optical transfer by forming a transparent silicon oxide (SiO2) layer between a micro channel of the apparatus and an optical fiber to insert the optical fiber therein.Type: GrantFiled: October 28, 2004Date of Patent: May 23, 2006Assignee: Korea Electronics Technology InstituteInventors: Kwang Bum Park, Joon Shik Park, Kyu Sik Shin, Hyo Derk Park
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Publication number: 20050140972Abstract: The present invention provides an apparatus for solution component analysis and fabricating method thereof, by which a mixing channel, reaction channel, and measurement channel are formed as continuous micro-grooves on one substrate to implement the miniature apparatus for analyzing solution components, by which the apparatus is provided with portability facilitating access to a spot outside a laboratory to perform an instant sample analysis, and by which an optical system configuration for sample analysis can be simplified in a manner of facilitating an optical transfer by forming a transparent silicon oxide (SiO2) layer between a micro channel of the apparatus and an optical fiber to insert the optical fiber therein.Type: ApplicationFiled: October 28, 2004Publication date: June 30, 2005Inventors: Kwang Bum Park, Joon Shik Park, Kyu Sik Shin, Hyo Derk Park