Patents by Inventor L. K. Sun

L. K. Sun has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Apparatus for removing impurities from effluent waste gas streams
    Publication number: 20010051123
    Abstract: An apparatus for removing fluorinated and chlorinated compounds contained in waste gas streams from semiconductor etch and deposition processes. The apparatus has a treatment chamber in which a plurality of liquid films are formed to absorb the fluorinated and chlorinated compounds contained in the waste gas streams that pass through the liquid films. The apparatus includes a tank for receiving the mixture of the absorbed fluorinated and chlorinated compounds and the liquid, and a dehumidifying device for stabilizing and dehumidifying the humidified waste gas streams.
    Type: Application
    Filed: August 16, 2001
    Publication date: December 13, 2001
    Applicant: Winbond Electonics Corp.
    Inventors: C.C. Wang, L.K. Sun, Jeffrey Wen
  • Apparatus for removing impurities from effluent waste gas streams
    Publication number: 20010021357
    Abstract: An apparatus for removing fluorinated and chlorinated compounds contained in waste gas streams from semiconductor etch and deposition processes. The apparatus has a treatment chamber in which a plurality of liquid films are formed to absorb the fluorinated and chlorinated compounds contained in the waste gas streams that pass through the liquid films. The apparatus includes a tank for receiving the mixture of the absorbed fluorinated and chlorinated compounds and the liquid, and a dehumidifying device for stabilizing and dehumidifying the humidified waste gas streams.
    Type: Application
    Filed: May 16, 2001
    Publication date: September 13, 2001
    Applicant: Winbond Electronics Corp.
    Inventors: C. C. Wang, L. K. Sun, Jeffrey Wen