Abstract: A magnetron plasma apparatus boosted by hollow cathode plasma includes at least one electrically connected pair of a first hollow cathode plate and a second hollow cathode plate placed opposite to each other at a separation distance of at least 0.1 mm and having an opening following an outer edge of a sputter erosion zone on a magnetron target so that a magnetron magnetic field forms a perpendicular magnetic component inside a hollow cathode slit between plates and, wherein the plates and are connected to a first electric power generator together with the magnetron target to generate a magnetically enhanced hollow cathode plasma in at least one of a first working gas distributed in the hollow cathode slit and a second working gas admitted outside the slit in contact with a magnetron plasma generated in at least one of the first working gas and the second working gas.

Abstract: A magnetron plasma apparatus boosted by hollow cathode plasma includes at least one electrically connected pair of a first hollow cathode plate and a second hollow cathode plate placed opposite to each other at a separation distance of at least 0.1 mm and having an opening following an outer edge of a sputter erosion zone on a magnetron target so that a magnetron magnetic field forms a perpendicular magnetic component inside a hollow cathode slit between plates and, wherein the plates and are connected to a first electric power generator together with the magnetron target to generate a magnetically enhanced hollow cathode plasma in at least one of a first working gas distributed in the hollow cathode slit and a second working gas admitted outside the slit in contact with a magnetron plasma generated in at least one of the first working gas and the second working gas.

Abstract: A magnetron plasma apparatus boosted by hollow cathode plasma includes at least one electrically connected pair of a first hollow cathode plate and a second hollow cathode plate placed opposite to each other at a separation distance of at least 0.1 mm and having an opening following an outer edge of a sputter erosion zone on a magnetron target so that a magnetron magnetic field forms a perpendicular magnetic component inside a hollow cathode slit between plates and, wherein the plates and are connected to a first electric power generator together with the magnetron target to generate a magnetically enhanced hollow cathode plasma in at least one of a first working gas distributed in the hollow cathode slit and a second working gas admitted outside the slit in contact with a magnetron plasma generated in at least one of the first working gas and the second working gas.

Abstract: A magnetron plasma apparatus boosted by hollow cathode plasma includes at least one electrically connected pair of a first hollow cathode plate and a second hollow cathode plate placed opposite to each other at a separation distance of at least 0.1 mm and having an opening following an outer edge of a sputter erosion zone on a magnetron target so that a magnetron magnetic field forms a perpendicular magnetic component inside a hollow cathode slit between plates and, wherein the plates and are connected to a first electric power generator together with the magnetron target to generate a magnetically enhanced hollow cathode plasma in at least one of a first working gas distributed in the hollow cathode slit and a second working gas admitted outside the slit in contact with a magnetron plasma generated in at least one of the first working gas and the second working gas.

Abstract: A magnetron plasma apparatus boosted by hollow cathode plasma includes at least one electrically connected pair of a first hollow cathode plate and a second hollow cathode plate placed opposite to each other at a separation distance of at least 0.1 mm and having an opening following an outer edge of a sputter erosion zone on a magnetron target so that a magnetron magnetic field forms a perpendicular magnetic component inside a hollow cathode slit between plates and, wherein the plates and are connected to a first electric power generator together with the magnetron target to generate a magnetically enhanced hollow cathode plasma in at least one of a first working gas distributed in the hollow cathode slit and a second working gas admitted outside the slit in contact with a magnetron plasma generated in at least one of the first working gas and the second working gas.

Abstract: A device for hybrid plasma processing, particularly for deposition of thin films and for plasma treatment of samples, in a plasma reactor with pumping system characterized in that at least one feeder of microwave power (2) is installed in the plasma reactor (1) and connected to a microwave generator (3) for generation of a microwave plasma (4) in contact with at least one hollow cathode (5) in the plasma reactor, where the hollow cathode is powered from a cathode power generator (6). At least one inlet for a processing gas (7) is installed behind the hollow cathode and the gas is admitted into the plasma reactor through the hollow cathode where a hollow cathode plasma (9) is generated. A magnetic element (10) is used for generation of a perpendicular magnetic field (11) and/or a longitudinal magnetic field (12) at an outlet (13) from the hollow cathode.

Abstract: A method and an apparatus for plasma treatment of gas, particularly for transformation, passivation and stabilization of polluting and toxic admixtures is disclosed. A flowing gas (1) to be treated is passed through a hollow cathode (2) provided with a counter electrode (5) and a hollow cathode discharge plasma (3) is generated by a generator (4) connected to the hollow cathode (2). The flowing gas (1) undergoes interactions with oscillating electrons (6) in the hollow cathode discharge plasma being generated in the gas. The interaction of the hollow cathode discharge plasma with inner walls (8) of the hollow cathode is controlled and the inner walls should have a temperature below its melting point, whereby the inner walls can provide a catalytic effect. The inner walls may also release wall species (9) promoting plasma-chemical reactions in the hollow cathode discharge plasma. The flowing gas is then exhausted as a transformed gas (10) after being treated in the hollow cathode discharge plasma.

Abstract: A plasma processing apparatus includes at least one pair of a first rotary permanent magnet system (1) and a second rotary permanent magnet system (2) The rotary permanent magnet systems further include individual permanent magnets (3) and are positioned opposite to each other. The individual permanent magnets (3) have a maximum magnetic induction of more than 10−1 Tesla. Additionally a driver system (4) for driving a motion of the rotary magnet systems (1, 2) is used in combination with a basic plasma processing device (5). By means of the rotary permanent magnet systems time variable magnetic flux lines (6) will be formed for affecting the plasma (7) produced by the plasma processing device (5).

Abstract: A method and an apparatus for plasma treatment of gas, particularly for transformation, passivation and stabilization of polluting and toxic admixtures is disclosed. A flowing gas (1) to be treated is passed through a hollow cathode (2) provided with a counter electrode (5) and a hollow cathode discharge plasma (3) is generated by a generator (4) connected to the hollow cathode (2). The flowing gas (1) undergoes interactions with oscillating electrons (6) in the hollow cathode discharge plasma being generated in the gas. The interaction of the hollow cathode discharge plasma with inner walls (8) of the hollow cathode is controlled and the inner walls should have a temperature below its melting point, whereby the inner walls can provide a catalytic effect. The inner walls may also release wall species (9) promoting plasma-chemical reactions in the hollow cathode discharge plasma. The flowing gas is then exhausted as a transformed gas (10) after being treated in the hollow cathode discharge plasma.

Abstract: An apparatus for plasma treatment of gas, particularly for transformation, passivation and stabilization of polluting and toxic admixtures is disclosed. A flowing gas to be treated is passed through a hollow cathode provided with a counter electrode and a hollow cathode discharge plasma is generated by a generator connected to the hollow cathode. The flowing gas undergoes interactions with oscillating electrons in the hollow cathode discharge plasma being generated in the gas. The interaction of the hollow cathode discharge plasma with inner walls of the hollow cathode is controlled and the inner walls should have a temperature below its melting point, whereby the inner walls can provide a catalytic effect. The inner walls may also release wall species promoting plasma-chemical reactions in the hollow cathode discharge plasma. The flowing gas is then exhausted as a transformed gas after being treated in the hollow cathode discharge plasma.

Abstract: An apparatus for generation of a linear arc discharge for plasma processing, particularly for processing on surfaces of solid substrates, installed in a reactor held at gas pressures below 5.times.10.sup.4 Pa and powered by a generator of alternating current (10), includes: at least one pair of a first electrode plate (1) and a second electrode plate (2) placed opposite to each other at a distance exceeding 0.4 mm and connected to the same pole of the generator which has counter pole connected to a counter electrode (3), a magnetic field produced by magnets (4) for development of a linear hot zone (5) on the first electrode plate and a linear hot zone (6) on the second electrode plate, which have a component of at least 10.sup.-3 Tesla across the slit between these electrode plates, an ionized environment (7) containing a working gas (8) involved between the electrode plates and having an electrical contact with the electrode plates where an arc discharge (9) is generated and with the counter electrode.

Abstract: A method and apparatus for generation of a discharge in own vapors of a radio frequency electrode for sustained self-sputtering and evaporation comprising the steps of: (a) generation of a radio frequency discharge by a radio frequency electrode of a hollow geometry in an auxiliary gas introduced into the discharge area at a pressure necessary for an initiation of a hollow cathode discharge inside the hollow electrode causing sputtering and/or evaporation of the electrode surface; (b) increasing the radio frequency power to said hollow electrode to enhance density of vapors containing particles released from the electrode by the sputtering and/or evaporation in the radio frequency generated hollow cathode discharge up to a density at which a self-sustained discharge remains after the inflow of said auxiliary gas is closed and the pumping of gas is adjusted to a value necessary for the maintenance of the discharge. The hollow radio frequency electrode may serve as an inlet of said auxiliary gas.