Patents by Inventor LaiJiao Liu

LaiJiao Liu has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20250062132
    Abstract: The invention provides an etching method of a semiconductor structure, which comprises providing a substrate with a gate structure, an oxide layer and a first nitride layer beside the gate structure, and performing an etching step to remove the first nitride layer and keep the oxide layer, wherein in the etching step, the etching selectivity ratio of the etched nitride material to the etched oxide material is greater than 300.
    Type: Application
    Filed: September 14, 2023
    Publication date: February 20, 2025
    Applicant: United Semiconductor (Xiamen) Co., Ltd.
    Inventors: Yanjie Liu, Bing Du, LaiJiao Liu, Hailong Gu, Chin-Chun Huang, Wen Yi Tan