Patents by Inventor Lakshmanan Senthil Kumar

Lakshmanan Senthil Kumar has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11003090
    Abstract: The disclosure relates to a lithography apparatus for writing to substrate wafers. The apparatus includes: a light generating device including one or a plurality of light sources for generating light; a writing device; a light transferring device including a number of optical waveguides for transferring the light from the light generating device to a writing device, the writing device including a plurality of individually controllable write heads for projecting the light from the one or the plurality of light sources in different regions of a substrate wafer; a transport device for moving the substrate wafer relative to the writing device in a predefined transport direction; and a control device for controlling the writing process on the substrate wafer.
    Type: Grant
    Filed: January 31, 2020
    Date of Patent: May 11, 2021
    Assignee: Carl Zeiss SMT GmbH
    Inventors: Stefan Richter, Enrico Geissler, Dirk Doering, Lakshmanan Senthil Kumar, Guenter Rudolph, Martin Voelcker, Markus Deguenther
  • Publication number: 20200166852
    Abstract: The disclosure relates to a lithography apparatus for writing to substrate wafers. The apparatus includes: a light generating device including one or a plurality of light sources for generating light; a writing device; a light transferring device including a number of optical waveguides for transferring the light from the light generating device to a writing device, the writing device including a plurality of individually controllable write heads for projecting the light from the one or the plurality of light sources in different regions of a substrate wafer; a transport device for moving the substrate wafer relative to the writing device in a predefined transport direction; and a control device for controlling the writing process on the substrate wafer.
    Type: Application
    Filed: January 31, 2020
    Publication date: May 28, 2020
    Inventors: Stefan Richter, Enrico Geissler, Dirk Doering, Lakshmanan Senthil Kumar, Guenter Rudolph, Martin Voelcker, Markus Deguenther
  • Publication number: 20170255110
    Abstract: The disclosure relates to a lithography apparatus for writing to substrate wafers. The apparatus includes: a light generating device including one or a plurality of light sources for generating light; a writing device; a light transferring device including a number of optical waveguides for transferring the light from the light generating device to a writing device, the writing device including a plurality of individually controllable write heads for projecting the light from the one or the plurality of light sources in different regions of a substrate wafer; a transport device for moving the substrate wafer relative to the writing device in a predefined transport direction; and a control device for controlling the writing process on the substrate wafer.
    Type: Application
    Filed: May 22, 2017
    Publication date: September 7, 2017
    Inventors: Stefan Richter, Enrico Geissler, Dirk Doering, Lakshmanan Senthil Kumar, Guenter Rudolph, Martin Voelcker, Markus Deguenther