Patents by Inventor Lambert Danner

Lambert Danner has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20040070821
    Abstract: A critical dimension measuring instrument includes a light source, a beam-shaping optical system, a condenser having a condenser pupil, a first microlens array arrangement, a first auxiliary optical element having positive refractive power, a second auxiliary optical element having positive refractive power, and a second microlens array arrangement. The first microlens array arrangement, the first auxiliary optical element, the second auxiliary optical element and the second microlens array arrangement are arranged in successive fashion between the beam-shaping optical system and the condenser.
    Type: Application
    Filed: September 26, 2003
    Publication date: April 15, 2004
    Applicant: Leica Microsystems Semiconductor GmbH
    Inventors: Franz Cemic, Lambert Danner
  • Patent number: 6624930
    Abstract: An illumination device for a DUV microscope has an illumination beam path, proceeding from a DUV light source in which are arranged a condenser and a reflection filter system which generates a DUV wavelength band and comprises four reflection filters. At these, the illumination beam is reflected in each case at the same reflection angle &agr;, the illumination beam path extending coaxially in front of and behind the reflection filter system. According to the present invention, the reflection angle &agr;=30° and the DUV wavelength band &lgr;DUV+&Dgr;&lgr; has a half-value width of max. 20 nm and a peak with a maximum value S of more than 90% of the incoming light intensity. The resulting very narrow half-value width of the DUV wavelength band makes it possible for the DUV objectives of the DUV microscope to be very well-corrected.
    Type: Grant
    Filed: June 8, 2000
    Date of Patent: September 23, 2003
    Assignee: Leica Microsystems Wetzlar GmbH
    Inventors: Lambert Danner, Frank Eisenkrämer, Michael Veith, Wolfgang Vollrath, Martin Osterfeld
  • Patent number: 6618154
    Abstract: The invention refers to an optical measurement arrangement, in particular for layer thickness measurement and for ascertaining optical material properties such as refractive index, extinction factor, etc. of a specimen (P), having an illumination device (1) for emitting a measurement light beam (6), a beam splitter (8) for dividing the measurement light beam (6) into a specimen light beam (10) and a reference light beam (9), a measurement objective for directing the specimen light beam (10) onto a measurement location (M) on the surface of the specimen (P) and for acquiring the light reflected from the measurement location (M), and an analysis device (11) into which the reference light beam (9) and the specimen light beam (10) reflected from the specimen (P) are coupled in order to obtain information about the specimen (P), in particular about layer thicknesses present thereon.
    Type: Grant
    Filed: May 2, 2001
    Date of Patent: September 9, 2003
    Assignee: Leica Microsystems Jena GmbH
    Inventors: Horst Engel, Hakon Mikkelsen, Lambert Danner, Matthias Slodowski, Kuno Backhaus, Joachim Wienecke
  • Publication number: 20030147134
    Abstract: An autofocus module for a microscope-based system includes at least two light sources, each of which generates a light beam for focusing. An optical directing device is provided that directs a respective portion of each light beam onto an incoupling means, which couples each of the light beams into the illuminating light beam of the microscope-based system and directs the light beams onto a specimen. A first and a second detector receive the light beams of the first and second light source reflected from the surface of the specimen, and ascertain the intensities on the first and second detector in time-multiplexed fashion.
    Type: Application
    Filed: January 31, 2003
    Publication date: August 7, 2003
    Applicant: Leica Microsystems Semiconductor GmbH
    Inventors: Franz Cemic, Lambert Danner, Robert Mainberger, Michael Veith, Martin Osterfeld, Uwe Graf
  • Patent number: 6600560
    Abstract: The invention concerns an optical measurement arrangement having an ellipsometer, in which an incident beam (16) of polarized light is directed at an angle of incidence &agr;≠0° onto a measurement location (M) on the surface of a specimen (P). Information concerning properties of the specimen (P), preferably concerning layer thicknesses and optical material properties such as refractive index n, extinction coefficient k, and the like, is obtained from an analysis of a return beam (17) reflected from the specimen (P). The incident beam (16) is directed by a mirror objective (15) onto the surface of the specimen (P). The return beam (17) is also captured by the mirror objective (15). The result is to create an optical measurement arrangement, operating on the ellipsometric principle, which has a simple, compact configuration and permits a high measurement accuracy down to the sub-nanometer range.
    Type: Grant
    Filed: May 2, 2001
    Date of Patent: July 29, 2003
    Assignee: Leica Microsystems Jena GmbH
    Inventors: Hakon Mikkelsen, Horst Engel, Lambert Danner, Christof Stey
  • Publication number: 20020027657
    Abstract: The invention concerns an optical measurement arrangement having an ellipsometer, in which an incident beam (16) of polarized light is directed at an angle of incidence &agr;≠0° onto a measurement location (M) on the surface of a specimen (P). Information concerning properties of the specimen (P), preferably concerning layer thicknesses and optical material properties such as refractive index n, extinction coefficient k, and the like, is obtained from an analysis of a return beam (17) reflected from the specimen (P). The incident beam (16) is directed by a mirror objective (15) onto the surface of the specimen (P). The return beam (17) is also captured by the mirror objective (15). The result is to create an optical measurement arrangement, operating on the ellipsometric principle, which has a simple, compact configuration and permits a high measurement accuracy down to the sub-nanometer range.
    Type: Application
    Filed: May 2, 2001
    Publication date: March 7, 2002
    Inventors: Hakon Mikkelsen, Horst Engel, Lambert Danner, Christof Stey
  • Publication number: 20020024669
    Abstract: The invention concerns a spectral ellipsometer having a refractive illuminating optical system (3) that is equipped with a small illuminating aperture and is designed for a wide wavelength region. By color correction of the illuminating optical system (3), a very small measurement spot (6) is generated on a specimen surface (4).
    Type: Application
    Filed: June 29, 2001
    Publication date: February 28, 2002
    Inventors: Lambert Danner, Joachim Wienecke
  • Publication number: 20020003217
    Abstract: The invention refers to an optical measurement arrangement, in particular for layer thickness measurement and for ascertaining optical material properties such as refractive index, extinction factor, etc. of a specimen (P), having an illumination device (1) for emitting a measurement light beam (6), a beam splitter (8) for dividing the measurement light beam (6) into a specimen light beam (10) and a reference light beam (9), a measurement objective for directing the specimen light beam (10) onto a measurement location (M) on the surface of the specimen (P) and for acquiring the light reflected from the measurement location (M), and an analysis device (11) into which the reference light beam (9) and the specimen light beam (10) reflected from the specimen (P) are coupled in order to obtain information about the specimen (P), in particular about layer thicknesses present thereon.
    Type: Application
    Filed: May 2, 2001
    Publication date: January 10, 2002
    Inventors: Horst Engel, Hakon Mikkelsen, Lambert Danner, Matthias Slodowski, Kuno Backhaus, Joachim Wienecke
  • Publication number: 20020001090
    Abstract: An illumination device according to the present invention comprises a light source (1), an optical fiber bundle (4), a coupling-in optical system (3) before and a coupling-out optical system (5) after the fiber bundle (4), and an illuminating optical system (17; 20). A homogenizing optical system (6) between the coupling-out optical system (5) and illuminating optical system (17; 20) brings about a homogenization of the intensity distribution in the image field. The homogenizing optical system (6) advantageously comprises a micro-honeycomb condenser (7) and a lens member (8) which superimpose the exit opening of the fiber bundle (4) in an intermediate image plane (10) to form a homogeneous intermediate image.
    Type: Application
    Filed: June 29, 2001
    Publication date: January 3, 2002
    Applicant: Leica Microsystems Wetzlar GmbH.
    Inventors: Franz Cemic, Lambert Danner, Gerhard Hoppen