Patents by Inventor Lambertus Adrianus Van Den Wildenberg
Lambertus Adrianus Van Den Wildenberg has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 8598550Abstract: A collector assembly with a radiation collector, a cover plate and a support member connecting the radiation collector to the cover plate are provided. The cover plate is designed to cover an opening in a collector chamber. The collector chamber opening may be large enough to pass the radiation collector and the support member. The removed radiation collector can be cleaned with different cleaning procedures, which may be performed in a cleaning device. Such cleaning device may for example consist of the following: a circumferential hull designed to provide an enclosure volume for circumferentially enclosing at least the radiation collector; an inlet configured to provide at least one of a cleaning gas and a cleaning liquid to the enclosure volume to clean at least said radiation collector; and an outlet configured to remove said at least one of said cleaning gas and said cleaning liquid from the enclosure volume.Type: GrantFiled: February 3, 2012Date of Patent: December 3, 2013Assignee: ASML Netherlands B.V.Inventors: Vadim Yevgenyevich Banine, Vladimir Vitalevitch Ivanov, Josephus Jacobus Smits, Lambertus Adrianus Van Den Wildenberg, Vladimir Mihailovitch Krivtsun, Alexander Matthijs Struycken, Johannes Bernardus Ridder, Harm-Jan Voorma, Carolus Ida Maria Antonius Spee, Klaas Timmer
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Publication number: 20120140196Abstract: A collector assembly with a radiation collector, a cover plate and a support member connecting the radiation collector to the cover plate are provided. The cover plate is designed to cover an opening in a collector chamber. The collector chamber opening may be large enough to pass the radiation collector and the support member. The removed radiation collector can be cleaned with different cleaning procedures, which may be performed in a cleaning device. Such cleaning device may for example consist of the following: a circumferential hull designed to provide an enclosure volume for circumferentially enclosing at least the radiation collector; an inlet configured to provide at least one of a cleaning gas and a cleaning liquid to the enclosure volume to clean at least said radiation collector; and an outlet configured to remove said at least one of said cleaning gas and said cleaning liquid from the enclosure volume.Type: ApplicationFiled: February 3, 2012Publication date: June 7, 2012Applicant: ASML NETHERLANDS B.V.Inventors: Vadim Yevgenyevich Banine, Vladimir Vitalevitch Ivanov, Josephus Jacobus Smits, Harm-Jan Voorma, Lambertus Adrianus Van Den Wildenberg, Vladimir Mihailovitch Krivtsun, Alexander Matthijs Struycken, Carolus Ida Maria Antonius Spee, Klaas Timmer, Johannes Bernardus Ridder
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Patent number: 8134136Abstract: A collector assembly with a radiation collector, a cover plate and a support member connecting the radiation collector to the cover plate are provided. The cover plate is designed to cover an opening in a collector chamber. The collector chamber opening may be large enough to pass the radiation collector and the support member. The removed radiation collector can be cleaned with different cleaning procedures, which may be performed in a cleaning device. Such cleaning device may for example consist of the following: a circumferential hull designed to provide an enclosure volume for circumferentially enclosing at least the radiation collector; an inlet configured to provide at least one of a cleaning gas and a cleaning liquid to the enclosure volume to clean at least said radiation collector; and an outlet configured to remove said at least one of said cleaning gas and said cleaning liquid from the enclosure volume.Type: GrantFiled: June 22, 2010Date of Patent: March 13, 2012Assignee: ASML Netherlands B.V.Inventors: Vadim Yevgenyevich Banine, Vladimir Vitalevitch Ivanov, Josephus Jacobus Smits, Lambertus Adrianus Van Den Wildenberg, Vladimir Mihailovitch Krivtsun, Alexander Matthijs Struycken, Johannes Bernardus Ridder, Harm-Jan Voorma, Carolus Ida Maria Antonius Spee, Klaas Timmer
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Publication number: 20100290015Abstract: A collector assembly with a radiation collector, a cover plate and a support member connecting the radiation collector to the cover plate are provided. The cover plate is designed to cover an opening in a collector chamber. The collector chamber opening may be large enough to pass the radiation collector and the support member. The removed radiation collector can be cleaned with different cleaning procedures, which may be performed in a cleaning device. Such cleaning device may for example consist of the following: a circumferential hull designed to provide an enclosure volume for circumferentially enclosing at least the radiation collector; an inlet configured to provide at least one of a cleaning gas and a cleaning liquid to the enclosure volume to clean at least said radiation collector; and an outlet configured to remove said at least one of said cleaning gas and said cleaning liquid from the enclosure volume.Type: ApplicationFiled: June 22, 2010Publication date: November 18, 2010Applicant: ASML NETHERLANDS B.V.Inventors: Vadim Yevgenyevich BANINE, Vladimir Vitalevitch Ivanov, Josephus Jacobus Smits, Harm-Jan Voorma, Lambertus Adrianus Van Den Wildenberg, Vladimir Mihailovitch Krivtsun, Alexander Matthijs Struycken, Carolus Ida Maria Antonius Spee, Klaas Timmer, Johannes Bernardus Ridder
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Patent number: 7767989Abstract: A collector assembly with a radiation collector, a cover plate and a support member connecting the radiation collector to the cover plate are provided. The cover plate is designed to cover an opening in a collector chamber. The collector chamber opening may be large enough to pass the radiation collector and the support member. The removed radiation collector can be cleaned with different cleaning procedures, which may be performed in a cleaning device. Such cleaning device may for example consist of the following: a circumferential hull designed to provide an enclosure volume for circumferentially enclosing at least the radiation collector; an inlet configured to provide at least one of a cleaning gas and a cleaning liquid to the enclosure volume to clean at least said radiation collector; and an outlet configured to remove said at least one of said cleaning gas and said cleaning liquid from the enclosure volume.Type: GrantFiled: September 27, 2006Date of Patent: August 3, 2010Assignee: ASML Netherlands B.V.Inventors: Vadim Yevgenyevich Banine, Vladimir Vitalevitch Ivanov, Josephus Jacobus Smits, Harm-Jan Voorma, Lambertus Adrianus Van Den Wildenberg, Vladimir Mihailovitch Krivtsun, Alexander Matthijs Struycken, Carolus Ida Maria Antonius Spee, Klaas Timmer, Johannes Bernardus Ridder
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Patent number: 7612353Abstract: A lithographic apparatus includes a radiation system including a radiation source for the production of a radiation beam, and a contaminant trap arranged in a path of the radiation beam. The contaminant trap includes a plurality of foils or plates defining channels that are arranged substantially parallel to the direction of propagation of said radiation beam. The foils or plates can be oriented substantially radially with respect to an optical axis of the radiation beam. The contaminant trap can be provided with a gas injector which is configured to inject gas at least at two different positions directly into at least one of the channels of the contaminant trap.Type: GrantFiled: July 6, 2006Date of Patent: November 3, 2009Assignee: ASML Netherlands B.V.Inventors: Leonid Aizikovitch Sjmaenok, Vadim Yevgenyevich Banine, Josephus Jacobus Smits, Lambertus Adrianus Van Den Wildenberg, Alexander Alexandrovitch Schmidt, Arnoud Cornelis Wassink, Eric Louis Willem Verpalen, Antonius Johannes Van De Pas, Paul Peter Anna Antonius Brom
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Patent number: 7525635Abstract: A rotatable contamination barrier for use with an extreme ultraviolet radiation system includes a blade structure configured to trap contaminant material coming from a radiation source, and an eccentric mass element displaced relative to a central axis of rotation to balance the blade structure when the blade structure is rotated about the central axis.Type: GrantFiled: March 19, 2008Date of Patent: April 28, 2009Assignee: ASML Netherlands B.V.Inventor: Lambertus Adrianus Van Den Wildenberg
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Publication number: 20080174751Abstract: A rotatable contamination barrier for use with an extreme ultraviolet radiation system includes a blade structure configured to trap contaminant material coming from a radiation source, and an eccentric mass element displaced relative to a central axis of rotation to balance the blade structure when the blade structure is rotated about the central axis.Type: ApplicationFiled: March 19, 2008Publication date: July 24, 2008Applicant: ASML NETHERLANDSInventor: Lambertus Adrianus Van Den Wildenberg
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Patent number: 7368733Abstract: A rotatable contamination barrier for use with an EUV radiation system is disclosed. The contamination barrier has a blade structure configured to trap contaminant material coming from a radiation source, a bearing structure, coupled to a static frame, configured to rotatably bear the blade structure, and an eccentric mass element displaced relative to a central axis of rotation to balance the blade structure in the bearing structure.Type: GrantFiled: March 30, 2006Date of Patent: May 6, 2008Assignee: ASML Netherlands B.V.Inventor: Lambertus Adrianus Van den Wildenberg
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Patent number: 7173685Abstract: A lithographic apparatus is disclosed. The apparatus includes an illumination system for conditioning a beam of radiation, and a support structure for supporting a patterning device. The patterning device serves to impart the beam of radiation with a pattern in its cross-section. The apparatus also includes a substrate table for holding a substrate, a projection system for projecting the patterned beam onto a target portion of the substrate, and a fastener for fastening a first part of the apparatus to a second part of the apparatus. The fastener includes at least one integrated spring.Type: GrantFiled: June 29, 2004Date of Patent: February 6, 2007Assignee: ASML Netherlands B.V.Inventor: Lambertus Adrianus Van Den Wildenberg
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Patent number: 7126671Abstract: In a projection system for EUV, the positions of mirrors are measured and controlled relative to each other, rather than to a reference frame. Relative position measurements may be made by interferometers or capacitive sensors mounted on rigid extensions of the mirrors.Type: GrantFiled: March 23, 2004Date of Patent: October 24, 2006Assignee: ASML Netherlands B.V.Inventors: Henrikus Herman Marie Cox, Dominicus Jacobus Petrus Adrianus Franken, Nicolaas Rudolf Kemper, Engelbertus Antonius Fransiscus Van Der Pasch, Martijn Johannes Verbunt, Lambertus Adrianus Van Den Wildenberg
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Publication number: 20040227107Abstract: In a projection system for EUV, the positions of mirrors are measured and controlled relative to each other, rather than to a reference frame. Relative position measurements may be made by interferometers or capacitive sensors mounted on rigid extensions of the mirrors.Type: ApplicationFiled: March 23, 2004Publication date: November 18, 2004Applicant: ASML Netherlands B.V.Inventors: Henrikus Herman Marie Cox, Dominicus Jacobus Petrus Adrianus Franken, Nicolaas Rudolf Kemper, Engelbertus Antonius Fransiscus Van Der Pasch, Martijn Johannes Verbunt, Lambertus Adrianus Van Den Wildenberg