Patents by Inventor Lambertus Gerardus Maria Kessels
Lambertus Gerardus Maria Kessels has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 11703771Abstract: A calibration system includes a plate, a fixed alignment mark, and a variable diffraction grating. The plate is adjacent to a wafer alignment mark disposed on a wafer. The fixed alignment mark is disposed on the plate and is configured to act as a reference mark for an initial calibration of the calibration system. The variable diffraction grating is disposed on the plate and includes a plurality of unit cells configured to form a plurality of variable alignment marks. The variable diffraction grating is configured to calibrate a shift-between-orders of one of the variable alignment marks and the fixed alignment mark.Type: GrantFiled: October 12, 2020Date of Patent: July 18, 2023Assignees: ASML Holding N.V., ASML Netherlands B.V.Inventors: Ali Alsaqqa, Fadi El-Ghussein, Lambertus Gerardus Maria Kessels, Roxana Rezvani Naraghi, Krishanu Shome, Timothy Allan Brunner, Sergei Sokolov
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Publication number: 20220390861Abstract: A calibration system includes a plate, a fixed alignment mark, and a variable diffraction grating. The plate is adjacent to a wafer alignment mark disposed on a wafer. The fixed alignment mark is disposed on the plate and is configured to act as a reference mark for an initial calibration of the calibration system. The variable diffraction grating is disposed on the plate and includes a plurality of unit cells configured to form a plurality of variable alignment marks. The variable diffraction grating is configured to calibrate a shift-between-orders of one of the variable alignment marks and the fixed alignment mark.Type: ApplicationFiled: October 12, 2020Publication date: December 8, 2022Applicants: ASML Holding N.V., ASML Netherlands B.V.Inventors: Ali ALSAQQA, Fadi EL-GHUSSEIN, Lambertus Gerardus Maria KESSELS, Roxana REZVANI NARAGHI, Krishanu SHOME, Timothy Allan BRUNNER, Sergei SOKOLOV
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Patent number: 10394137Abstract: A method and apparatus for obtaining focus information relating to a lithographic process. The method includes illuminating a target, the target having alternating first and second structures, wherein the form of the second structures is focus dependent, while the form of the first structures does not have the same focus dependence as that of the second structures, and detecting radiation redirected by the target to obtain for that target an asymmetry measurement representing an overall asymmetry of the target, wherein the asymmetry measurement is indicative of focus of the beam forming the target. An associated mask for forming such a target, and a substrate having such a target.Type: GrantFiled: May 1, 2018Date of Patent: August 27, 2019Assignee: ASML Netherlands B.V.Inventors: Youri Johannes Laurentius Maria Van Dommelen, Peter David Engblom, Lambertus Gerardus Maria Kessels, Arie Jeffrey Den Boef, Kaustuve Bhattacharyya, Paul Christiaan Hinnen, Marco Johannes Annemarie Pieters
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Publication number: 20180253018Abstract: A method and apparatus for obtaining focus information relating to a lithographic process. The method includes illuminating a target, the target having alternating first and second structures, wherein the form of the second structures is focus dependent, while the form of the first structures does not have the same focus dependence as that of the second structures, and detecting radiation redirected by the target to obtain for that target an asymmetry measurement representing an overall asymmetry of the target, wherein the asymmetry measurement is indicative of focus of the beam forming the target. An associated mask for forming such a target, and a substrate having such a target.Type: ApplicationFiled: May 1, 2018Publication date: September 6, 2018Applicant: ASML Netherlands B.V.Inventors: Youri Johannes Laurentius Maria VAN DOMMELEN, Peter David Engblom, Lambertus Gerardus Maria Kessels, Arie Jeffrey Den Boef, Kaustuve Bhattacharyya, Paul Christiaan Hinnen, Marco Johannes Annemarie Pieters
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Patent number: 10001711Abstract: A method and apparatus for obtaining focus information relating to a lithographic process. The method includes illuminating a target, the target having alternating first and second structures, wherein the form of the second structures is focus dependent, while the form of the first structures does not have the same focus dependence as that of the second structures, and detecting radiation redirected by the target to obtain for that target an asymmetry measurement representing an overall asymmetry of the target, wherein the asymmetry measurement is indicative of focus of the beam forming the target. An associated mask for forming such a target, and a substrate having such a target.Type: GrantFiled: November 20, 2014Date of Patent: June 19, 2018Assignee: ASML NETHERLANDS B.V.Inventors: Youri Johannes Laurentius Maria Van Dommelen, Peter David Engblom, Lambertus Gerardus Maria Kessels, Arie Jeffrey Den Boef, Kaustuve Bhattacharyya, Paul Christiaan Hinnen, Marco Johannes Annemarie Pieters
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Publication number: 20160313656Abstract: A method and apparatus for obtaining focus information relating to a lithographic process. The method includes illuminating a target, the target having alternating first and second structures, wherein the form of the second structures is focus dependent, while the form of the first structures does not have the same focus dependence as that of the second structures, and detecting radiation redirected by the target to obtain for that target an asymmetry measurement representing an overall asymmetry of the target, wherein the asymmetry measurement is indicative of focus of the beam forming the target. An associated mask for forming such a target, and a substrate having such a target.Type: ApplicationFiled: November 20, 2014Publication date: October 27, 2016Applicant: ASML NETHERLANDS B.V.Inventors: Youri Johannes Laurentius Maria VAN DOMMELEN, Peter David ENGBLOM, Lambertus Gerardus Maria KESSELS, Arie Jeffrey DEN BOEF, Kaustuve BHATTACHARYYA, Paul Christiaan HINNEN, Marco Johannes Annemarie PIETERS
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Patent number: 7826672Abstract: A system is provided that includes a device having an emissive portion, a memory, and a dictionary decompressor. The device having an emissive portion is configured to produce a patterned beam. The memory is configured to store a compressed representation of a requested dose pattern, comprising two groups of repeating pattern features, to be formed on a surface by the patterned beam. The dictionary decompressor at least partially decompresses the compressed representation. The dictionary decompressor comprises a first dictionary memory configured to store pattern data corresponding to a first group of the two groups of repeating pattern features and a second dictionary memory configured to store pattern data corresponding to a second group of the two groups of repeating pattern features. The repeating pattern features in the first group have one or more differing characteristics than the repeating pattern features in the second group. Related methods are also provided.Type: GrantFiled: September 4, 2009Date of Patent: November 2, 2010Assignee: ASML Netherlands B.V.Inventors: Lambertus Gerardus Maria Kessels, Patricius Aloysius Jacobus Tinnemans, Remco Johannes Van Engelen
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Patent number: 7812930Abstract: A method and device for programming an array of individually controllable elements configured to impart a beam with a pattern. For example, the method can be suitable for use in a lithographic apparatus. The method includes generating first data representing a first pattern, generating second data representing a second pattern, writing the first data to a first buffer, and reading the first data from the first buffer to program the array of individually controllable elements to display the first pattern, while writing the second data to a second buffer in parallel.Type: GrantFiled: March 21, 2005Date of Patent: October 12, 2010Assignee: ASML Netherlands B.V.Inventors: Theodorus Leonardus Van Den Akker, Martinus Hendricus Hendricus Hoeks, Pieter Willem Herman De Jager, Lambertus Gerardus Maria Kessels, Marco Cornelis Jacobus Martinus Van Hassel, Frank Anton Morselt
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Publication number: 20090324111Abstract: A system is provided that includes a device having an emissive portion, a memory, and a dictionary decompressor. The device having an emissive portion is configured to produce a patterned beam. The memory is configured to store a compressed representation of a requested dose pattern, comprising two groups of repeating pattern features, to be formed on a surface by the patterned beam. The dictionary decompressor at least partially decompresses the compressed representation. The dictionary decompressor comprises a first dictionary memory configured to store pattern data corresponding to a first group of the two groups of repeating pattern features and a second dictionary memory configured to store pattern data corresponding to a second group of the two groups of repeating pattern features. The repeating pattern features in the first group have one or more differing characteristics than the repeating pattern features in the second group. Related methods are also provided.Type: ApplicationFiled: September 4, 2009Publication date: December 31, 2009Applicant: ASML Netherlands B.V.Inventors: Lambertus Gerardus Maria KESSELS, Patricius Aloysius Jacobus Tinnemans, Remco Johannes Van Engelen
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Patent number: 7606430Abstract: A lithographic apparatus comprises an array of individually controllable elements that modulate a beam of radiation, a compressed-pattern memory that stores a compressed representation of a requested dose pattern to be formed on a substrate by the modulated beam, and a dictionary decompressor that at least partially decompresses the compressed representation.Type: GrantFiled: August 30, 2005Date of Patent: October 20, 2009Assignee: ASML Netherlands B.V.Inventors: Lambertus Gerardus Maria Kessels, Patricius Aloysius Jacobus Tinnemans, Remco Johannes Van Engelen
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Patent number: 7477772Abstract: A lithographic apparatus comprises an array of individually controllable elements and a data processing pipeline. The array of individually controllable elements modulates a beam of radiation. The data processing pipeline converts a first representation of a requested dose pattern to a sequence of control data suitable for controlling the array of individually controllable elements in order substantially to form the requested dose pattern on a substrate. The data processing pipeline comprises an offline pre-processing device and an online rasterizer. The offline pre-processing device converts the first representation of the requested dose pattern to an intermediate representation, which can be rasterized in a fewer number of operations than the first representation. The storage device stores the intermediate representation.Type: GrantFiled: May 31, 2005Date of Patent: January 13, 2009Assignee: ASML Netherlands B.V.Inventors: Andrej Makarovic, Willem Jurrianus Venema, Lambertus Gerardus Maria Kessels, Marcel Bontekoe
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Patent number: 7460208Abstract: A lithographic apparatus provided with an array of individually controllable elements that is detachably mounted to mounting points on a support frame of the lithographic apparatus.Type: GrantFiled: February 18, 2005Date of Patent: December 2, 2008Assignee: ASML Netherlands B.V.Inventors: Arno Jan Bleeker, Dominicus Jacobus Petrus Adrianus Franken, Martinus Hendricus Hendricus Hoeks, Lambertus Gerardus Maria Kessels, Tobrjörn Sandström
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Patent number: 7362415Abstract: A system and method are used to allow for compensation of a thermal output of an array of individually controllable elements. This can be done by inputting control signals to the array when it is not being used to pattern a projection beam in order to maintain the temperature of the array. A heating element can be provided to maintain the temperature of the array. A thermal reservoir can be provided to maintain the temperature of the array or a cooling element can be provided to reduce the temperature of the array during use.Type: GrantFiled: December 7, 2004Date of Patent: April 22, 2008Assignee: ASML Netherlands B.V.Inventors: Dominicus Jacobus Petrus Adrianus Franken, Arno Jano Bleeker, Wilhelmus Josephus Box, Martinus Hendricus Hendricus Hoeks, Henricus Gerardus Tegenbosch, Kars Zeger Troost, Lambertus Gerardus Maria Kessels
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Patent number: 7321416Abstract: The present invention comprises a lithographic apparatus and device manufacturing method method that uses a patterning device that increase a number of individually controllable elements that are programmed simultaneously to increase an update rate of an array of individually controllable elements. A number of required high speed analog inputs to the array is reduced. The complexity of the array is reduced and the maximum update speed of the array is increased. Furthermore, the number of elements within an array can be readily expanded. The patterning device can be divided into a plurality of groups of cells and the lithographic apparatus can comprise a plurality of supply channels. Each supply channel can be arranged to provide a voltage signal to each cell in a respective group of cells. This can reduce the number of required inputs to the patterning device for individually addressing each cell.Type: GrantFiled: June 15, 2005Date of Patent: January 22, 2008Assignee: ASML Netherlands B.V.Inventors: Martinus Cornelis Reijnen, Andrej Makarovic, Lambertus Gerardus Maria Kessels, Stoyan Nihtianov, Petrus Wilhelmus Josephus Maria Kemper, Kamen Hristov Chilov
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Patent number: 7317510Abstract: A lithography apparatus including a projection system configured to project a beam of radiation as an array of sub-beams of radiation and an array of individually controllable elements configured to modulate the sub-beams of radiation to form a requested dose pattern on a substrate. The requested dose pattern is built up over time from an array of localized exposures in which at least neighboring localized exposures are imaged at substantially different times and in which each localized exposure is produced by one of the sub-beams of radiation. The lithography apparatus also includes a rasterizer device arranged to convert data defining the requested dose pattern to a sequence of data representing the requested dose at a corresponding sequence of points within the pattern, and also a data manipulation device arranged to receive the sequence of data and constitute a control signal suitable for controlling the array of individually controllable elements.Type: GrantFiled: December 27, 2004Date of Patent: January 8, 2008Assignee: ASML Netherlands B.V.Inventors: Marcel Bontekoe, Patricius Aloysius Jacobus Tinnemans, Lambertus Gerardus Maria Kessels, Marco Cornelis Jacobus Martinus Van Hassel, Wouter Frans Willem Mulckhuyse
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Patent number: 7209216Abstract: A lithographic apparatus in which a size and/or a position of features formed on a substrate are adjusted by adjusting an intensity of radiation at boundaries of pattern features.Type: GrantFiled: March 25, 2005Date of Patent: April 24, 2007Assignee: ASML Netherlands B.V.Inventors: Pieter Willem Herman De Jager, Theodorus Leonardus Van Den Akker, Willem Jurrianus Venema, Wouter Frans Willem Mulckhuyse, Lambertus Gerardus Maria Kessels