Abstract: A process for forming a pixel circuit is disclosed comprising: (a) providing a transparent support; (b) forming a multicolor mask having at least four different color patterns; (c) forming integrated electronic components of the pixel circuit having at least four layers of patterned functional material comprising a first conductor, a dielectric, a semiconductor, and a second conductor each layer of patterned functional material corresponding to the four different color patterns of the multicolor mask. The functional material is patterned using a photopattern corresponding to each color pattern.

Abstract: A process for forming a pixel circuit is disclosed comprising: (a) providing a transparent support; (b) forming a multicolor mask having at least four different color patterns; (c) forming integrated electronic components of the pixel circuit having at least four layers of patterned functional material comprising a first conductor, a dielectric, a semiconductor, and a second conductor each layer of patterned functional material corresponding to the four different color patterns of the multicolor mask. The functional material is patterned using a photopattern corresponding to each color pattern.

Abstract: The invention relates to a process for forming a structure comprising: (a) providing a transparent support; (b) forming a color mask having a selected absorption spectral range wherein the color mask has an effectively transparent portion and a partially absorptive portion, wherein the partially absorptive portion includes at least two portions having different optical densities within the absorption spectral range; (c) coating a layer of a photopatternable material sensitive to visible light in the absorption spectral range; (d) exposing and developing the photopatternable material to form a photopattern corresponding to at least one of said two portions of the partially absorptive portion; and (e) depositing and patterning a layer of functional material such that a pattern of functional material results corresponding to the at least one of said two portions of the partially absorptive portion.

Abstract: A process for forming a pixel circuit is disclosed comprising: (a) providing a transparent support; (b) forming a multicolor mask having at least four different color patterns; (c) forming integrated electronic components of the pixel circuit having at least four layers of patterned functional material comprising a first conductor, a dielectric, a semiconductor, and a second conductor each layer of patterned functional material corresponding to the four different color patterns of the multicolor mask. The functional material is patterned using a photopattern corresponding to each color pattern.

Abstract: The invention relates to a process for forming a structure comprising: (a) providing a transparent support; (b) forming a color mask having a selected absorption spectral range wherein the color mask has an effectively transparent portion and a partially absorptive portion, wherein the partially absorptive portion includes at least two portions having different optical densities within the absorption spectral range; (c) coating a layer of a photopatternable material sensitive to visible light in the absorption spectral range; (d) exposing and developing the photopatternable material to form a photopattern corresponding to at least one of said two portions of the partially absorptive portion; and (e) depositing and patterning a layer of functional material such that a pattern of functional material results corresponding to the at least one of said two portions of the partially absorptive portion.

Abstract: A process for forming a pixel circuit is disclosed comprising: (a) providing a transparent support; (b) forming a multicolor mask having at least four different color patterns; (c) forming integrated electronic components of the pixel circuit having at least four layers of patterned functional material comprising a first conductor, a dielectric, a semiconductor, and a second conductor each layer of patterned functional material corresponding to the four different color patterns of the multicolor mask. The functional material is patterned using a photopattern corresponding to each color pattern.

Abstract: An overcoat composition for imaging products containing: 30-95 weight %, based on the dry laydown of the overcoat, of a hydrophobic polymer, said hydrophobic polymer being homopolymers or copolymers containing at least 30% by weight, based on the total weight of monomers, of the monomer described in structurel; and 5 to 70 weight %, based on the dry laydown of the overcoat, of gelatin: wherein: R is H, CH3, C2H5, and C3H7; and X1, X2, X3, X4 and X5 are H, F, Cl, Br, I, CN, CH3O, C2H5O, C3H7O, C4H9O, CH3, C2H5, C3H7, n-C4H9, sec-C4H9, tert-C4H9, CF3, C2F5, C3F7, iso-C3F7, n-C4F9, sec-C4F9, tert-C4F9, CH3NH, (CH3)2N, n-C5H11, C4H9, n-C6H13, n-C7H15, n-C8H17, n-C9H19, n-C10H21, or n-C12H25.

Abstract: An overcoat composition for imaging products containing: 30-95 weight %, based on the dry laydown of the overcoat, of a hydrophobic polymer, said hydrophobic polymer being homopolymers or copolymers containing at least 30% by weight, based on the total weight of monomers, of the monomer described in structurel; and 5 to 70 weight %, based on the dry laydown of the overcoat, of gelatin: 1

Abstract: The present invention relates to imaging elements, including photographic elements and recording media, having a protective overcoat that resists fingerprints, common stains, and spills. More particularly, the present invention provides a water permeable overcoat during image formation but that is water resistant in the final processed product. The overcoat, before formation of the image, comprises polyurethane particles in a gelatin-containing matrix. Subsequent to formation of the image, the overcoat is heat fused, resulting in the formation of a water-resistant continuous protective overcoat that provides excellent scratch and spill resistance.

Abstract: This invention comprises a composition containing a hydrophilic colloid and a water soluble polymer of boric acid, and optionally a hardening agent for the hydrophilic colloid. The hydrophilic colloid is preferably gelatin. This invention also comprises a photographic element in which at least one layer thereof contains a hydrophilic colloid and a water-soluble polymer of boric acid and a method of making the photographic element.

Abstract: Reducing agents for oxidized developing agents and light sensitive elements containing the reducing agents wherein the reducing agents comprise a polymer having gallic acid or gallic acid derivative moieties.

Abstract: Reducing agents for oxidized developing agents and light sensitive elements containing the reducing agents wherein the reducing agents comprise a polymer having gallic acid or gallic acid derivative moieties.