Abstract: This disclosure provides embodiments for context based vehicular traffic prediction. A trained neural network modeling a relationship between historical traffic data and associated historical contextual data for a roadway link is obtained. Expected contextual data for a future time period for the roadway link is acquired. Predicted traffic data for the future time period for the roadway link is generated with the trained neural network based on the expected contextual data.

Abstract: The disclosure discloses a method and apparatus for updating a deep learning model. An embodiment of the method comprises: executing following updating: acquiring a training dataset under a preset path, training a preset deep learning model based on the training dataset to obtain a new deep learning model; updating the preset deep learning model to the new deep learning model; increasing training iterations; determining whether a number of training iterations reaches a threshold of training iterations; stopping executing the updating if the number of training iterations reaches the threshold of training iterations; and continuing to execute the updating after an interval of a preset time length if the number of training iterations fails to reach the threshold of training iterations. This embodiment has improved the model updating efficiency.

Abstract: Disclosed are adhesives comprising a first compound comprising three or more 1,2-dihydroxybenzene groups; and a second compound that is a functionalized polymer; wherein the first compound and second compound are in the form of a mixture, and wherein the adhesive has adhesive properties when wet. Additional embodiments to methods of preparing an adhesive, adhesives prepared by the method, and articles prepared from the adhesive are disclosed.

Abstract: Provided herein are an isaridin cyclodepsipeptide derivative, and a preparation and an application thereof. The isaridin cyclodepsipeptide derivative is shown in formula (I), and is isolated from ascidian-associated fungi.

Abstract: A diffraction measurement target that has at least a first sub-target and at least a second sub-target, and wherein (1) the first and second sub-targets each include a pair of periodic structures and the first sub-target has a different design than the second sub-target, the different design including the first sub-target periodic structures having a different pitch, feature width, space width, and/or segmentation than the second sub-target periodic structure or (2) the first and second sub-targets respectively include a first and second periodic structure in a first layer, and a third periodic structure is located at least partly underneath the first periodic structure in a second layer under the first layer and there being no periodic structure underneath the second periodic structure in the second layer, and a fourth periodic structure is located at least partly underneath the second periodic structure in a third layer under the second layer.

Abstract: A method includes exposing number of fields on a substrate, obtaining data about a field and correcting exposure of the field in subsequent exposures. The method includes defining one or more sub-fields of the field based on the obtained data. Data relating to each sub-field is processed to produce sub-field correction information. A subsequent exposure of the one or more sub-fields is corrected using the sub-field correction information. By controlling a lithographic apparatus by reference to data of a particular sub-field within a field, overlay error can be reduced or minimized for a critical feature, rather than being averaged over the whole field. By controlling a lithographic apparatus with reference to a sub-field rather than only the whole field, a residual error can be reduced in each sub-field.

Abstract: A method, apparatus and communication system for registering address information of a network anchor point to a network server, the method including receiving, by a packet data network gateway, a request message from a mobility management entity, determining, by the packet data network gateway in response to the request message, to register identity information of the packet data network gateway to a home subscriber server, and registering, to the home subscriber server, by the packet data network gateway in response to the determining to register the identity information, the identity information of the packet data network gateway and an access point name corresponding to the packet data network gateway.

Abstract: A diffraction measurement target that has at least a first sub-target and at least a second sub-target, and wherein (1) the first and second sub-targets each include a pair of periodic structures and the first sub-target has a different design than the second sub-target, the different design including the first sub-target periodic structures having a different pitch, feature width, space width, and/or segmentation than the second sub-target periodic structure or (2) the first and second sub-targets respectively include a first and second periodic structure in a first layer, and a third periodic structure is located at least partly underneath the first periodic structure in a second layer under the first layer and there being no periodic structure underneath the second periodic structure in the second layer, and a fourth periodic structure is located at least partly underneath the second periodic structure in a third layer under the second layer.

Abstract: A method, involving determining a first distribution of a first parameter associated with an error or residual in performing a device manufacturing process; determining a second distribution of a second parameter associated with an error or residual in performing the device manufacturing process; and determining a distribution of a parameter of interest associated with the device manufacturing process using a function operating on the first and second distributions. The function may include a correlation.

Abstract: A method, involving determining a first distribution of a first parameter associated with an error or residual in performing a device manufacturing process; determining a second distribution of a second parameter associated with an error or residual in performing the device manufacturing process; and determining a distribution of a parameter of interest associated with the device manufacturing process using a function operating on the first and second distributions. The function may include a correlation.

Abstract: A method of determining an optimal operational parameter setting of a metrology system is described. Free-form substrate shape measurements are performed. A model is applied, transforming the measured warp to modeled warp scaling values. Substrates are clamped to a chuck, causing substrate deformation. Alignment marks of the substrates are measured using an alignment system with four alignment measurement colors. Scaling values thus obtained are corrected with the modeled warp scaling values to determine corrected scaling values. An optimal alignment measurement color is determined, based on the corrected scaling values. Optionally, scaling values are selected that were measured using the optimal alignment measurement color and a substrate grid is determined using the selected scaling values. A substrate may be exposed using the determined substrate grid to correct exposure of the substrate.

Abstract: A system comprises: a data warehouse, a storage device and a cluster including a plurality of computing nodes; the data warehouse is configured to store task data obtained from the user; at least one computing node in the cluster includes a resource scheduling component, and is configured to perform resource scheduling for the task and determine a computing node executing the task; the computing node executing the task comprises a model training component and/or a prediction component; the model training component is configured to, according to task data, invoke a corresponding type of learning model from the storage device; use sample data and training target included in the task data to train the learning model, to obtain the prediction model corresponding to the task and store the prediction model in the storage device; the prediction component is configured to obtain a prediction result output by the prediction model.

Abstract: A diffraction measurement target that has at least a first sub-target and at least a second sub-target, and wherein (1) the first and second sub-targets each include a pair of periodic structures and the first sub-target has a different design than the second sub-target, the different design including the first sub-target periodic structures having a different pitch, feature width, space width, and/or segmentation than the second sub-target periodic structure or (2) the first and second sub-targets respectively include a first and second periodic structure in a first layer, and a third periodic structure is located at least partly underneath the first periodic structure in a second layer under the first layer and there being no periodic structure underneath the second periodic structure in the second layer, and a fourth periodic structure is located at least partly underneath the second periodic structure in a third layer under the second layer.

Abstract: A method includes exposing number of fields on a substrate, obtaining data about a field and correcting exposure of the field in subsequent exposures. The method includes defining one or more sub-fields of the field based on the obtained data. Data relating to each sub-field is processed to produce sub-field correction information. A subsequent exposure of the one or more sub-fields is corrected using the sub-field correction information. By controlling a lithographic apparatus by reference to data of a particular sub-field within a field, overlay error can be reduced or minimized for a critical feature, rather than being averaged over the whole field. By controlling a lithographic apparatus with reference to a sub-field rather than only the whole field, a residual error can be reduced in each sub-field.

Abstract: A diffraction measurement target that has at least a first sub-target and at least a second sub-target, and wherein (1) the first and second sub-targets each include a pair of periodic structures and the first sub-target has a different design than the second sub-target, the different design including the first sub-target periodic structures having a different pitch, feature width, space width, and/or segmentation than the second sub-target periodic structure or (2) the first and second sub-targets respectively include a first and second periodic structure in a first layer, and a third periodic structure is located at least partly underneath the first periodic structure in a second layer under the first layer and there being no periodic structure underneath the second periodic structure in the second layer, and a fourth periodic structure is located at least partly underneath the second periodic structure in a third layer under the second layer.

Abstract: An integrated facial recognition method and system. The method includes: receiving a request for acquiring an integrated facial recognition service sent by a user terminal, which includes: an identifier of a user-selected model associated with facial recognition of the user, and an identifier of an operation selected by the user from candidate operations; and executing distributedly an operation selected by the user from the candidate operations on the user-selected model associated with the facial recognition of the user to obtain an operation result, and storing the operation result. The embodiment has realized completing the operations such as training a model or developing a facial recognition application, without the need of buying hardware and establishing a software environment by the user, thereby saving the development cost and improving the convenience of using the facial recognition service.

Abstract: A method of measuring a parameter of a patterning process, the method including obtaining a measurement of a substrate processed by a patterning process, with a first metrology target measurement recipe; obtaining a measurement of the substrate with a second, different metrology target measurement recipe, wherein measurements using the first and second metrology target measurement recipes have their own distinct sensitivity to a metrology target structural asymmetry of the patterning process; and determining a value of the parameter by a weighted combination of the measurements of the substrate using the first and second metrology target measurement recipes, wherein the weighting reduces or eliminates the effect of the metrology target structural geometric asymmetry on the parameter of the patterning process determined from the measurements using the first and second metrology target measurement recipes.

Abstract: A method includes exposing number of fields on a substrate, obtaining data about a field and correcting exposure of the field in subsequent exposures. The method includes defining one or more sub-fields of the field based on the obtained data. Data relating to each sub-field is processed to produce sub-field correction information. A subsequent exposure of the one or more sub-fields is corrected using the sub-field correction information. By controlling a lithographic apparatus by reference to data of a particular sub-field within a field, overlay error can be reduced or minimized for a critical feature, rather than being averaged over the whole field. By controlling a lithographic apparatus with reference to a sub-field rather than only the whole field, a residual error can be reduced in each sub-field.

Abstract: A method of measuring a parameter of a patterning process, the method including obtaining a measurement of a substrate processed by a patterning process, with a first metrology target measurement recipe; obtaining a measurement of the substrate with a second, different metrology target measurement recipe, wherein measurements using the first and second metrology target measurement recipes have their own distinct sensitivity to a metrology target structural asymmetry of the patterning process; and determining a value of the parameter by a weighted combination of the measurements of the substrate using the first and second metrology target measurement recipes, wherein the weighting reduces or eliminates the effect of the metrology target structural geometric asymmetry on the parameter of the patterning process determined from the measurements using the first and second metrology target measurement recipes.

Abstract: The present disclosure provides a deep learning assignment processing method and apparatus, a device and a storage medium. It is feasible to obtain the deep learning assignment submitted by the user in a predetermined manner, the predetermined manner comprising the web UI manner, then submit the deep learning assignment to the deep learning system so that the deep learning system runs the submitted deep learning assignment. As compared with the prior art, processing such as programming is not needed upon submitting the deep learning assignment in the solutions of the present disclosure, thereby simplifying the user's operations, improving the processing efficiency of the deep learning assignment, and accelerating the user's speed of developing deep learning.