Abstract: A method of fabricating a semiconductor device includes forming a first shallow trench isolation structure in a first region of a substrate and second shallow trench isolation structures in a second region of the substrate. The method also includes forming a mask layer over the substrate, the first shallow trench isolation structure, and the second shallow trench isolation structures. The method further includes etching the mask layer and second shallow trench isolation structures in the second region sequentially to form a semiconductor protrusion between the second shallow trench isolation structures.

Abstract: Examples of the present application provide a semiconductor device, a fabrication method thereof, a 3D memory and a memory device, wherein the semiconductor device includes: a substrate including first fins and second fins; a first gate oxide layer disposed on the first fins; a second gate oxide layer disposed on the second fins, wherein the sum of the thicknesses of the first fin and the first gate oxide layer is less than or equal to the sum of the thicknesses of the second fin and the second gate oxide layer; and a gate layer disposed on the first gate oxide layer and the second gate oxide layer. In the way described above, difficulty of etching process is reduced and yield and performance of products are improved.

Abstract: The present disclosure discloses a semiconductor device and a fabrication method thereof. In the method, firstly etching a substrate in a first device region to form at least one first trench and then etching the substrate in both first device region and second device region to form at least one first isolation trench at the positions corresponding to the at least one first trench and form at least one second isolation trench in the second device region. Herein a depth of the first isolation trench is larger than that of the second isolation trench.

Abstract: The present disclosure discloses a three-dimensional (3D) memory, which includes a peripheral wafer and an array wafer. The peripheral wafer includes a first peripheral structure and a second peripheral structure. The array wafer includes a substrate, a structure to be tested and multiple interconnecting portions. The substrate includes a first well region and a second well region. The array wafer includes the structure to be tested which has a first connecting portion, a second connecting portion, and multiple interconnecting portions. The first peripheral structure is connected to the first well region and the first connecting portion of the structure to be tested by the first interconnecting portion and the second interconnecting portion respectively. The second peripheral structure is connected to the second well region and the second connecting portion of the structure to be tested by the third interconnecting portion and the fourth interconnecting portion respectively.

Abstract: A method of fabricating a semiconductor device includes forming a first shallow trench isolation structure in a first region of a substrate and second shallow trench isolation structures in a second region of the substrate. The method also includes forming a mask layer over the substrate, the first shallow trench isolation structure, and the second shallow trench isolation structures. The method further includes etching the mask layer and second shallow trench isolation structures in the second region sequentially to form a semiconductor protrusion between the second shallow trench isolation structures.

Abstract: A semiconductor device, a manufacturing method thereof and a NAND memory device are disclosed. The method comprises forming a substrate including an active region and an isolation region located around the active region. The active region includes a source region, a channel region, and a drain region. The method further comprises forming a groove between the isolation region and the channel region and partially above the isolation region, and forming a gate in the groove and on the channel region.

Abstract: The present disclosure discloses a three-dimensional (3D) memory, which includes a peripheral wafer and an array wafer. The peripheral wafer includes a first peripheral structure and a second peripheral structure. The array wafer includes a substrate, a structure to be tested and multiple interconnecting portions. The substrate includes a first well region and a second well region. The array wafer includes the structure to be tested which has a first connecting portion, a second connecting portion, and multiple interconnecting portions. The first peripheral structure is connected to the first well region and the first connecting portion of the structure to be tested by the first interconnecting portion and the second interconnecting portion respectively. The second peripheral structure is connected to the second well region and the second connecting portion of the structure to be tested by the third interconnecting portion and the fourth interconnecting portion respectively.

Abstract: A semiconductor device and a method for manufacturing the same, and a NAND memory device are disclosed. The method comprises: forming a substrate that comprises a first active region and an isolation region; forming a first groove between the isolation region and the first channel region, the first groove being partially located in the isolation region, and not penetrating through the isolation region; forming a first gate insulating layer covering the first groove and the first channel region; forming a first gate on the first gate insulating layer, the first gate covering the first channel region and filling the first groove.

Abstract: The present disclosure discloses a semiconductor device, a three-dimensional memory and a method for fabricating the semiconductor device. The method includes forming a shallow trench isolation trench in a substrate. The substrate comprises an active region including a source region, a channel region, and a drain region. The shallow trench isolation trench is located on a periphery of the active region of the substrate. The method further comprises forming a bottom isolating layer in a bottom portion of the shallow trench isolation trench, forming a gate structure on a channel region of the substrate, and forming a hard insulating layer in an upper portion of the shallow trench isolation trench and on sidewalls of the active region, such that the hard insulating layer covers a source region and a drain region of the substrate.

Abstract: The present disclosure provides a semiconductor device. The semiconductor device includes a transistor in active area. The active area is in a substrate and comprises a recess, a surface of the recess having an offset from a surface of the substrate. The transistor comprises a gate electrode, the gate electrode comprising a first portion in the recess and a second portion outside the recess.

Abstract: A semiconductor structure, fabrication method and three-dimensional memory are disclosed. A method of fabricating a semiconductor structure includes providing a substrate including a first device region and a second device region; forming a plurality of first recesses in the first device region and a second recess in the second device region, the first recesses and the second recess being formed simultaneously; forming a first isolation trench in the first device region; and forming a second isolation trench in the second device region at a position of the second recess.

Abstract: In accordance with an embodiment, a system includes a phase shifter having a substrate, a coupling structure, a main feeder, and at least one strip line. The coupling structure has an arc-shaped coupling surface. One end of the main feeder is electrically connected to the coupling surface, and another end of the main feeder is a signal input end. The signal input end is configured to receive a first electrical signal. The strip line has an arc-shaped segment and two signal output ends, and the signal output ends are configured to output second electrical signals.

Abstract: A semiconductor device and a method of fabricating the semiconductor device are provided. The method includes: forming a first bottom isolation layer and a second bottom isolation layer in a substrate, the thickness of the second bottom isolation layer being less than that of the first bottom isolation layer; and forming, on the a first active area in the substrate, a first gate structure extending to the first bottom isolation layer and forming, on a second active area in the substrate, a second gate structure extending to the second bottom isolation layer.

Abstract: A pre-prodrug, comprising a drug, e.g., doxorubicin, which has off-target toxicity (e.g., cardiotoxicity) with respect to its antineoplastic activity, and an amine functionality of the drug incorporated into a disubstituted maleimide (DMI). The pre-prodrug may be linked to a targeting or de-targeting agent or a polar modulator, e.g., charged ligand, amino acid, peptide, etc., to increase therapeutic index. The pre-prodrug is hydrolyzed to the prodrug, having a disubstituted maleamic acid (DMA). A polar modulator such as glutamic acid prevents cellular uptake of the prodrug, but not the doxorubicin drug released from the prodrug after dissociation. The prodrug is pH sensitive, and below pH 7.0, tends to cleave to form free drug and cyclized maleic anhydride. Tumor environments tend to be more acidic, e.g., pH 6.8, than cardiac tissue, e.g., pH 7.4, and therefore the heart is spared while the drug is selectively released within a tumor.

Abstract: A semiconductor device includes a first isolation structure corresponding to a first device region of a substrate and including a first insulating layer in a first isolation groove of the first isolation structure, and a second isolation structure corresponding to a second device region of the substrate and including a second insulating layer in a second isolation groove of the second isolation structure. The first insulating layer comprises ions.

Abstract: A semiconductor structure is disclosed. The semiconductor structure includes a staircase structure disposed over a substrate. The staircase structure includes a plurality of layer stacks, where each layer stack is made of a first material layer over a portion of a second material layer. The staircase structure further includes a plurality of landing pads, where each landing pad is disposed over another portion of the second material layer of a respective layer stack.

Abstract: A semiconductor device and a method for fabricating the same are disclosed. A substrate including a first device region and a second device region is provided. A first isolation structure is formed in the substrate of the first device region and a second isolation structure is formed in the substrate of the second device region. Ion implantation on the first isolation structure is performed. The first isolation structure and the second isolation structure are etched back to form a first recess in the first isolation structure and a second recess in the second isolation structure.

Abstract: Embodiments of a three-dimensional (3D) memory device and method for forming the 3D memory device are provided. In an example, the 3D memory device includes a plurality of conductor layers extending over a substrate, a channel structure vertically extending through the conductor layers to the substrate, and a source structure extending through the conductor layers to the substrate. The channel structure may include a blocking layer having a plurality of blocking portions disconnected from one another. Each of the blocking portions may include (i) a vertical blocking portion under a respective conductor layer, and (ii) at least one lateral blocking portion covering a respective lateral surface of the respective conductor layer. The channel structure may also include a memory layer having a plurality of memory portions disconnected from one another, each of the memory portions under and in contact with the respective vertical blocking portion.

Abstract: A method for producing sclareol by fermentation of cigar tobacco flower buds is provided, including: mixing cigar tobacco flower buds with deionized water, sterilizing and adding edible yeast, then fermenting at 25-30° C. and 100-300 rpm/min for 24-30 h. This method uses cigar tobacco flower buds as the sole raw material, without adding additional nutrients, and only ferments tobacco flower buds with edible yeast to synthesize sclareol. Meanwhile, this method has extremely high synthesis efficiency.

Abstract: A method for producing sclareol by fermentation of cigar tobacco flower buds is provided, including: mixing cigar tobacco flower buds with deionized water, sterilizing and adding edible yeast, then fermenting at 25-30° C. and 100-300 rpm/min for 24-30 h. This method uses cigar tobacco flower buds as the sole raw material, without adding additional nutrients, and only ferments tobacco flower buds with edible yeast to synthesize sclareol. Meanwhile, this method has extremely high synthesis efficiency.