Patents by Inventor Lantian Wang

Lantian Wang has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method and system for performing lithography verification for a double-patterning process
    Patent number: 8132128
    Abstract: One embodiment of the present invention provides a system that performs lithography verification for a double-patterning process on a mask layout without performing a full contour simulation of the mask layout. During operation, the system starts by receiving a first mask which is used in a first lithography step of the double-patterning process, and a second mask which is used in a second lithography step of the double-patterning process. Note that the first mask and the second mask are obtained by partitioning the mask layout. Next, the system receives an evaluation point on the mask layout. The system then determines whether the evaluation point is exclusively located on a polygon of the first mask, exclusively located on a polygon of the second mask, or located elsewhere. The system next computes a printing indicator at the evaluation point for the mask layout based on whether the evaluation point is exclusively located on a polygon of the first mask or exclusively located on a polygon of the second mask.
    Type: Grant
    Filed: October 31, 2008
    Date of Patent: March 6, 2012
    Assignee: Synopsys, Inc.
    Inventors: Hua Song, Lantian Wang, Gerard Terrence Luk-Pat, James P. Shiely
  • METHOD AND SYSTEM FOR PERFORMING LITHOGRAPHY VERIFICATION FOR A DOUBLE-PATTERNING PROCESS
    Publication number: 20100115489
    Abstract: One embodiment of the present invention provides a system that performs lithography verification for a double-patterning process on a mask layout without performing a full contour simulation of the mask layout. During operation, the system starts by receiving a first mask which is used in a first lithography step of the double-patterning process, and a second mask which is used in a second lithography step of the double-patterning process. Note that the first mask and the second mask are obtained by partitioning the mask layout. Next, the system receives an evaluation point on the mask layout. The system then determines whether the evaluation point is exclusively located on a polygon of the first mask, exclusively located on a polygon of the second mask, or located elsewhere. The system next computes a printing indicator at the evaluation point for the mask layout based on whether the evaluation point is exclusively located on a polygon of the first mask or exclusively located on a polygon of the second mask.
    Type: Application
    Filed: October 31, 2008
    Publication date: May 6, 2010
    Applicant: SYNOPSYS, INC.
    Inventors: Hua Song, Lantian Wang, Gerard Terrence Luk-Pat, James P. Shiely