Patents by Inventor Larken E. Euliss

Larken E. Euliss has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20110182805
    Abstract: Nano-particles are molded in nano-scale molds fabricated from non-wetting, low surface energy polymeric materials. The nano-particles can include pharmaceutical compositions, taggants, contrast agents, biologic drugs, drug compositions, organic materials, and the like. The molds can be virtually any shape and less than 10 micron in cross-sectional diameter.
    Type: Application
    Filed: June 19, 2006
    Publication date: July 28, 2011
    Inventors: Joseph M DeSimone, Jason P. Rolland, Ansley Exner Dennis, Edward T. Samulski, R. Jude Samulski, Benjamin W. Maynor, Larken E. Euliss, Ginger Denison Rothrock, Stephanie Barrett, Alexander Ermoshkin, Andrew James Murphy
  • Publication number: 20100320140
    Abstract: A method for fabricating a reverse osmosis membrane is described. The method includes aligning a plurality of carbon nanotubes at the interface of two liquids, the first liquid being an aqueous layer, and the second layer being an organic layer that is immiscible to the aqueous layer, forming a thin layer selective membrane around the aligned carbon nanotubes at the interface of the two liquids, and bonding the thin layer selective membrane/carbon nanotube composite onto a structural support layer.
    Type: Application
    Filed: June 18, 2009
    Publication date: December 23, 2010
    Inventors: Andrew P. Nowak, Larken E. Euliss
  • Publication number: 20090061152
    Abstract: The presently disclosed subject matter describes the use of fluorinated elastomer-based materials, in particular perfluoropolyether (PFPE)-based materials, in high-resolution soft or imprint lithographic applications, such as micro- and nanoscale replica molding, and the first nano-contact molding of organic materials to generate high fidelity features using an elastomeric mold. Accordingly, the presently disclosed subject matter describes a method for producing free-standing, isolated nanostructures of any shape using soft or imprint lithography technique.
    Type: Application
    Filed: July 6, 2007
    Publication date: March 5, 2009
    Inventors: Joseph M. DeSimone, Jason P. Rolland, Benjamin W. Maynor, Larken E. Euliss, Ginger Denison Rothrock, Ansleye Dennis, Edward T. Samulski, R. Jude Samulski
  • Publication number: 20090028910
    Abstract: The presently disclosed subject matter describes the use of fluorinated elastomer-based materials, in particular perfluoropolyether (PFPE)-based materials, in high-resolution soft or imprint lithographic applications, such as micro- and nanoscale replica molding, and the first nano-contact molding of organic materials to generate high fidelity features using an elastomeric mold. Accordingly, the presently disclosed subject matter describes a method for producing free-standing, isolated nanostructures of any shape using soft or imprint lithography techniques.
    Type: Application
    Filed: December 20, 2004
    Publication date: January 29, 2009
    Inventors: Joseph M DeSimone, Jason P. Rolland, Benjamin W. Maynor, Larken E. Euliss, Ginger Denison Rothrock, Ansley E. Dennis, Edward T. Samulski, R.Jude Samulski