Abstract: Stiction in a microstructure may be eliminated by directing a cryogenic aerosol at the portion of the microstructure subject to stiction with sufficient force so as to free the portion of the microstructure.

Abstract: A data communications system employing sliding window protocol where the size of the window of the sending or receiving station can be made selectable by the user according to the speed, length or error rate of the communication link or the frame size used to maximize the utilization of the communication link. The negative acknowledgements sent by the receiving station specifies the upper and lower limit of a range of identification numbers of frames unsuccessfully received to increase efficiency. Before data is transmitted, the sending and receiving stations exchange the preferred sets of link parameters and generate a modified set of link parameters to resolve potential conflicts. Either the sending or the receiving station stores a table defining the frame sizes for use with different bit error rates of the communication link. The station then evaluates the current bit error rate to select the optimum frame size from the table and adjust the frame size accordingly.

Abstract: A process for fabricating a negative pressure slider is disclosed which briefly comprises the steps of: (a) applying a dry negative photoresist layer to the surface of the slider; (b) positioning a mask having alignment marks which are too narrow to be resolved during exposure and development to pattern the photoresist layer to expose the portions of the flying surface of the slider to be milled by an ion milling process; (c) ion milling the slider wherein the patterned photoresist layer protects the flying surface of the slider while the negative pressure cavities of the slider are being milled; and (d) removing the remaining portions of the photoresist layer once the negative pressure cavities have been milled.

Abstract: A desired feature of deposition material is produced on a substrate by forming an adhesion inhibitor on the substrate in a pattern whose inner edges are adjacent the bounds of the feature being produced. A seedlayer is deposited over the adhesion inhibitor and exposed portions of the substrate, and a mask is formed over the seedlayer adjacent the edges of the adhesion inhibitor, the inner edges of the mask defining the feature being produced. A deposition material is deposited over the exposed seedlayer, and the mask is removed. Unwanted portions of the seedlayer and deposition layer are removed by mechanically lifting off. The adhesion inhibitor serves to inhibit the bonding of the seedlayer to the substrate sufficiently to enable the mechanical lift-off. The adhesion inhibitor is removed, either by lifting off with the seedlayer and deposition layer, or subsequently.