Abstract: A capacitor may be formed of carbon nanotubes. Carbon nanotubes, grown on substrates, may be formed in a desired pattern. The pattern may be defined by placing catalyst in appropriate locations for carbon nanotube growth from a substrate. Then, intermeshing arrays of carbon nanotubes may be formed by juxtaposing the carbon nanotubes formed on opposed substrates. In some embodiments, the carbon nanotubes may be covered by a dielectric which may be adhered by functionalizing the carbon nanotubes.

Abstract: An apparatus, and a method for forming, a split thin film capacitor for providing multiple power and reference supply voltage levels to electrical devices such as integrated circuits, may be useful in space restricted applications, and in applications that require very close electrical connections between the power consumer and the power supply. An example of both a space restricted application and a close coupling application may be an integrated circuit (IC) such as a microprocessor. The capacitor supplying and moderating power to the microprocessor needs to be closely coupled in order to respond to instantaneous power demands that may be found in high clock rate microprocessors, and the space inside a microprocessor package is very restricted.

Abstract: In one embodiment, a capacitor comprises a substrate defining a first electrical terminal; a catalyst layer disposed on the substrate; a plurality of carbon nanotubes disposed on the catalyst layer; a dielectric layer disposed over the plurality of carbon nanotubes; and a conductive layer disposed on the dielectric layer and defining a second electrical terminal.

Abstract: A parallel-plate capacitor structure includes a capacitor electrode including a first resistance and an electrode tab appended to the capacitor electrode and including a second resistance. The second equivalent series resistance is greater than the first equivalent series resistance. A process of assembling a parallel-plate capacitor package is also disclosed. A computing system is also disclosed that includes the parallel-plate capacitor package.

Abstract: An apparatus, and a method for forming, a split thin film capacitor for providing multiple power and reference supply voltage levels to electrical devices such as integrated circuits, may be useful in space restricted applications, and in applications that require very close electrical connections between the power consumer and the power supply. An example of both a space restricted application and a close coupling application may be an integrated circuit (IC) such as a microprocessor. The capacitor supplying and moderating power to the microprocessor needs to be closely coupled in order to respond to instantaneous power demands that may be found in high clock rate microprocessors, and the space inside a microprocessor package is very restricted.

Abstract: In one embodiment, a capacitor comprises a substrate defining a first electrical terminal; a catalyst layer disposed on the substrate; a plurality of carbon nanotubes disposed on the catalyst layer; a dielectric layer disposed over the plurality of carbon nanotubes; and a conductive layer disposed on the dielectric layer and defining a second electrical terminal.

Abstract: Some embodiments of the present invention include capacitors with controlled resistance.

Abstract: A structure and method including an anodic metal oxide substrate used to form a capacitor are described herein.

Abstract: An apparatus, and a method for forming, a split thin film capacitor for providing multiple power and reference supply voltage levels to electrical devices such as integrated circuits, may be useful in space restricted applications, and in applications that require very close electrical connections between the power consumer and the power supply. An example of both a space restricted application and a close coupling application may be an integrated circuit (IC) such as a microprocessor. The capacitor supplying and moderating power to the microprocessor needs to be closely coupled in order to respond to instantaneous power demands that may be found in high clock rate microprocessors, and the space inside a microprocessor package is very restricted.

Abstract: An apparatus comprises a first plurality of contacts on a first side of the apparatus adapted to interface with a corresponding plurality of contacts on an integrated circuit package. The apparatus further comprises a second plurality of contacts on a second side of the apparatus adapted to interface with a corresponding plurality of grid array leads and a plurality of capacitive storage structures coupled to the first and second plurality of contacts.

Abstract: In an embodiment, an electrolytic polymer capacitor includes a metal first electrode and a polymer-containing second electrode.

Abstract: An electronic device includes a material having a first dielectric constant (K) value, and a material having a second dielectric constant (K) value. The first dielectric constant (K) value is lower than the second dielectric constant (K) value. The electronic device also includes input/output connection conductors for transmitting signals to and from a die. The input/output connection conductors are routed through the material of the interposer having the first dielectric constant. The electronic device also includes power connection conductors for delivering power to the die, and ground connection conductors. The power and ground connection conductors are routed through the material having the second dielectric constant.

Abstract: The present disclosure describes an embodiment of an apparatus comprising a first dielectric layer having a first variation of capacitance with temperature, a second dielectric layer having a second variation of capacitance with temperature, the second variation of capacitance with temperature being different than the first variation of capacitance with temperature, and a conductive layer sandwiched between the first and second dielectric layers. Also described is an embodiment of a process comprising forming a first dielectric layer comprising a dielectric having a first composition, stacking a conductive layer on the first dielectric layer, and stacking a second dielectric layer on the conductive layer, the second dielectric layer having a second composition different than the first composition. Other embodiments are also described and claimed.

Abstract: A capacitor with reduced equivalent series resistance and reduces equivalent series inductance is provided. Capacitors are provided with multiple plate assemblies that couple to a common single first polarity terminal. Capacitors are also provided with multiple plate assemblies that each couple to a respective second polarity terminal. Fan-like plate assemblies are arranged to provide increased capacitance with reduced equivalent series resistance and reduces equivalent series inductance. Capacitors are provided that mount using surface mounting technology. Capacitors are provided that conform to existing capacitor form factors.

Abstract: In one embodiment, a structure and method including an anodic metal oxide substrate used to form a capacitor are described herein.

Abstract: A base structure is formed from a green material having first and second opposing sides and having a plurality of via openings therein. The green material is then sintered so that the green material becomes a sintered ceramic material and the base structure becomes a sintered ceramic base structure having the via openings. A conductive via is formed in each via opening of the sintered ceramic base structure. First and second capacitor structures are formed on the sintered ceramic base structure, each on a respective side of the sintered ceramic base structure. The power and ground planes of the capacitor structure are connected to the vias. As such, a capacitor structure can be formed and connected to the vias without the need to drill via openings in brittle substrates such as silicon substrates. Capacitor structures on opposing sides provide more capacitance without manufacturing complexities associated with the manufacture of one capacitor structure having a large number of power and ground planes.

Abstract: A structure and method including an anodic metal oxide substrate used to form a capacitor are described herein.

Abstract: A capacitor includes a controlled collapse chip connection system coupled by vias to a plurality of conductive layers embedded in a dielectric. The capacitor and a die can each be mounted on opposite surfaces of a substrate using a controlled collapse chip connection. The controlled collapse chip connection provides a large number of leads for coupling to the conductive layers of the capacitor. The large number of leads reduce the inductance in the connection. For a thin substrate, the length of the conductive material connecting the capacitor to the die is short, and the inductance and resistance of the conductive material is low. A system comprising two dies can be fabricated in a small volume using a plurality of substrates and a single controlled collapse chip connection compatible capacitor for decoupling the two dies.

Abstract: A semiconductor device having a multilayer laminate that includes a thermally stable, flexible polymer film, a semiconductor die, a molding compound, and a heat dissipation member. The die has an active surface and an inactive surface, in which the active surface includes a plurality of contacts. The molding compound contacts both the laminate and the die, but does not contact the die's active or inactive surfaces. The heat dissipation member contacts the die's inactive surface.

Abstract: A semiconductor device having a multilayer laminate that includes a thermally stable, flexible polymer film, a semiconductor die, a molding compound, and a heat dissipation member. The die has an active surface and an inactive surface, in which the active surface includes a plurality of contacts. The molding compound contacts both the laminate and the die, but does not contact the die's active or inactive surfaces. The heat dissipation member contacts the die's inactive surface.