Abstract: The present invention describes systems and methods for exposure and removal of material on the periphery of a substrate. The system includes an emitting radiation or exposure source, preferably a guide such as an optical assembly and an emitter, an edge detector, a transport, which comprise rotating and radial mechanisms, and a substrate support. The optical assembly directs radiation from the exposure source to the wafer or emitter. The transport supports the emitter and the edge detector about the substrate, and a tracking exposure head preferably supports the emitter and edge detector. As the emitter moves along the periphery of the substrate, the edge detector sends signals to control systems, which process signals, and command the transport to adjust the position of the emitter when necessary to expose the periphery of the substrate. In another embodiment, the system provides an exposure source chamber, a process chamber, and optionally a control chamber to isolate particle and thermal problems.

Abstract: The present invention provides an auger boot for use with a grain auger particularly of the type for use when manually delivering grain to the inlet of a grain auger. The auger boot delivers grain to the inlet of a grain auger, can be easily placed in position and be removed when not needed. Use of the auger boot does not require modification of the grain auger. The auger boot is well suited for use when manually loading grain into the auger, and is well suited for use inside of grain bins. The auger boot comprises a grain accumulator and a grain hopper. The grain accumulator is adapted to slide over and to surround the inlet end of the grain auger and a grain hopper is attached to the grain accumulator for delivering grain to the grain accumulator.