Abstract: Disclosed are systems and methods for modifying a reticle. In general, inspection results from a plurality of wafers or prediction results from a lithographic model are used to individually decrease the dose or any other optical property at specific locations of the reticle. In one embodiment, any suitable optical property of the reticle is modified by an optical beam, such as a femto-second laser, at specific locations on the reticle so as to widen the process window for such optical property. Examples of optical properties include dose, phase, illumination angle, and birefringence. Techniques for adjusting optical properties at specific locations on a reticle using an optical beam may be practiced for other purposes besides widening the process window.

Abstract: Various computer-implemented methods are provided. One computer-implemented method for generating input for a simulation program includes combining information about a defect detected on a partially fabricated reticle with information about phase assigned to an area of the reticle proximate to the defect. The phase is to be added to the reticle on a level other than a level on which the defect is formed. The defect is detected on the reticle prior to addition of the phase to the reticle. Another computer-implemented method includes generating a simulated image of a defect on a reticle using information about the defect generated by inspection of one level of the reticle in combination with information about a different level on the reticle.

Abstract: An inspection system to inspect structures on a substrate. A generator directs a primary beam at the substrate along a selectable angle, thereby producing a secondary beam having properties that are characteristic of the structures on the substrate. At least one of the substrate and the primary beam are scanned relative to the other at a selectable speed. A sensor receives the secondary beam and provides analog signals having properties that are characteristic of the secondary beam. An analog to digital converter receives the analog signals and provides digital signals having properties that are characteristic of the analog signals. A controller receives the digital signals and determines the properties of the structures on the substrate based at least in part on the properties of the digital signals.