Abstract: A production method for nanoparticles is disclosed which allows excellent control of the production parameters and elevated production rates. It comprises a plurality of sputter targets arranged in a coplanar manner, a first gas supply located between the plurality of sputter targets, for emitting a stream of gas; and a plurality of magnetrons, one located behind each of the sputter targets. Each magnetron can have an independently controlled power supply, allowing close control. For example, the targets could be of different materials allowing variation of the alloying compositions. A plurality of further gas supplies can be provided, each further gas supply providing a supply of gas over a sputter target. The sputter targets can be arranged in a rotationally symmetric manner, ideally symmetrically around the first gas supply.

Abstract: An apparatus for the production of nanoparticles comprises a chamber, a magnetron located within the chamber and comprising a cylindrical target having at least an outer face of the material to be deposited and a hollow interior, a source of magnetic flux within the hollow interior arranged to present magnetic poles in a direction that is radially outward with respect to the cylindrical target, and a drive arrangement for imparting a relative motion in an axial direction to the target and the source of magnetic flux, the chamber having at least one aperture and being located within a volume of relatively lower gas pressure compared to the interior of the chamber. The chamber is preferably substantially cylindrical, and is ideally substantially co-axial with the target so as to offer a symmetrical arrangement.

Abstract: A sample holder comprises a first thermal mass, a second thermal mass, and a sample vessel, the first and second thermal masses being movable relative to each other thereby to selectively place one or other in thermal contact with the sample vessel, at least one of the thermal masses being held at an elevated temperature. By moving the thermal masses appropriately, the sample holder can be brought into contact with each selectively, adjusting its temperature toward that of the thermal mass with which it is in contact relatively rapidly to allow close and rapid control of the sample temperature. The sample vessel is preferably biased toward the second thermal mass and can be slidably supported on at least one pin extending from the second thermal mass. The first thermal mass and/or the second thermal mass can comprise at least one block of copper. The second thermal mass can comprise, a pair of copper blocks/located either side of the first thermal mass.

Abstract: Composite nanoparticles can be produced by a processing apparatus comprising a source of charged, moving nanoparticles or a first material and a first size, apparatus for imposing a like potential in a region lying in the path of the nanoparticles, and a physical vapour deposition source of a second material directed toward the region, thereby to produce nanoparticles of a second and greater size being a composite of the first and second materials. The apparatus for imposing a like potential can comprise one or more conductive rings surrounding the path of the nanoparticles, each at a successively lower potential. The physical vapour deposition source can be one or more of a sputter target, or an evaporative source, or another PVD source. There can be a plurality of physical vapour deposition sources, thereby allowing a larger region in which the shell is deposited. All of the physical vapour deposition sources can deposit the same material, for a uniform shell.