Abstract: A cleaning system for cleaning a lamella plate settler includes at least one mechanical cleaning device; a suspension device adapted to suspend the mechanical cleaning device; wherein the suspension device includes a displacement device for lowering and raising the at least one mechanical cleaning device for mechanical cleaning of a lamella plate positioned below the cleaning system. By providing a frame supporting the at least one cleaning device; wheels attached to the frame and adapted to move on rails, the wheels including driving wheels and non-driving wheel, and a sensor, preferably an inductive sensor, adapted to sense the rotational position of the driving wheels, the lamella plate settler can be automatically be cleaned without emptying the basin of water, thus allowing cleaning during operation. A lamella plate settler and a method of cleaning a lamella plate are also provided.

Abstract: A cleaning system for cleaning a lamella plate settler includes at least one mechanical cleaning device; a suspension device adapted to suspend the mechanical cleaning device; wherein the suspension device includes a displacement device for lowering and raising the at least one mechanical cleaning device for mechanical cleaning of a lamella plate positioned below the cleaning system. By providing a frame supporting the at least one cleaning device; wheels attached to the frame and adapted to move on rails, the wheels including driving wheels and non-driving wheel, and a sensor, preferably an inductive sensor, adapted to sense the rotational position of the driving wheels, the lamella plate settler can be automatically be cleaned without emptying the basin of water, thus allowing cleaning during operation. A lamella plate settler and a method of cleaning a lamella plate are also provided.