Abstract: In the case of CVD methods, comprising PECVD and PICVD methods, the aim of the invention is to improve the impurity-free and, as far as possible, temporally and quantitatively precise feeding of process gases for the targeted layer systems. To this end, the invention provides a coating system and a method for coating articles with alternating layers, in the case of which process gases are introduced in an alternating fashion into a gas mixing point and mixed with a further gas and led to the reaction chamber, in which the deposition is carried out by producing a plasma.

Abstract: A method and apparatus for coating substrates by means of plasma enhanced vapor deposition are provided, in which at least part of the surroundings of the substrate surface of a substrate to be coated is evacuated and a process gas with a starting substance for the coating is admitted, wherein the coating is deposited by a plasma being ignited by radiating in electromagnetic energy in the surroundings of the substrate surface filled with the process gas. The electromagnetic energy is radiated in by a multiplicity of pulse sequences, preferably microwave or radiofrequency pulses, with a multiplicity of pulses spaced apart temporally by first intermissions, wherein the electromagnetic energy radiated in is turned off in the intermissions, and wherein the intermissions between the pulse sequences are at least a factor of 3, preferably at least a factor of 5, longer than the first intermissions between the pulses within a pulse sequence.

Abstract: The invention relates to layer systems having at least one layer comprising titanium aluminum oxide. The layer comprising titanium aluminum oxide may be either a functional layer—with or without interruption by an intermediate layer which is optically inactive—or a functional layer formed from a metal oxide which is interrupted by an intermediate layer comprising titanium aluminum oxide. The layer systems are structurally and thermally stable at operating temperatures of over 600° C. The layer systems may either comprise only one functional layer or may be a multilayer system, preferably an alternating layer system composed of functional layers with high and low refractive indices.

Abstract: A method of producing substrates with functional layers which have high optical properties and/or a high surface smoothness, in particular a low turbidity and significantly lower roughness, is provided. The method includes a sputtering process for coating a substrate with at least one functional layer, the sputtering process being interrupted at least once by the application of an intermediate layer with a thickness of less than 20 nm.

Abstract: A reactor for simultaneous coating of eyeglasses on both sides thereof. Two partial devices are provided, each with a microwave energy waveguide, a gas supply and an apparatus for evacuating the coating chamber where the first and second devices can be moved relative to each other to open and close the coating chamber. The coating chamber itself is removable from the device and includes two gas supply connections and two connections for evacuating the coating chamber as well as microwave windows for coupling in microwave energy.

Abstract: An apparatus for coating objects having a single microwave source, two or more coating chambers, and an impedance structure or a waveguide structure. The coating chambers are connected to the single microwave source. The impedance structure or waveguide structure divides the microwave energy in order to generate plasmas in the coating chambers.

Abstract: A method for producing optical functional coatings comprising niobium, tantalum, titanium or aluminum by supplying a precursor gas of low vapor pressure in a CVD coating system. A precursor selected from the group consisting of Nb, Ta, Ti, and Al compounds having a vapor pressure is maintained within a first supply container at a first temperature T1 and a first pressure p1. Precursor vapor of the precursor is supplied from the first supply container to an intermediate storage device through a first gas line which fluidly communicates the first supply container and the intermediate storage device. A carrier gas or reaction gas is supplied to the first gas line such that a mixture of the precursor with the carrier gas or the reaction gas is provided.

Abstract: The invention relates to a coated object in which coatings remain of a constant and unchanged high quality despite operating temperatures of more than 350° C. This is achieved with interlayers which deliberately interrupt and thereby stabilize the morphology of the coating.

Abstract: The invention is based on the object of reducing the heating of substrates during plasma enhanced chemical vapor deposition. For this purpose, a method and an apparatus for coating substrates by means of plasma enhanced vapor deposition are provided, in which at least part of the surroundings of the substrate surface of a substrate to be coated is evacuated and a process gas with a starting substance for the coating is admitted, wherein the coating is deposited by a plasma being ignited by radiating in electromagnetic energy in the surroundings of the substrate surface filled with the process gas.

Abstract: In the case of CVD methods, comprising PECVD and PICVD methods, the aim of the invention is to improve the impurity-free and, as far as possible, temporally and quantitatively precise feeding of process gases for the targeted layer systems. To this end, the invention provides a coating system and a method for coating articles with alternating layers, in the case of which process gases are introduced in an alternating fashion into a gas mixing point and mixed with a further gas and led to the reaction chamber, in which the deposition is carried out by producing a plasma.

Abstract: In order to improve the energy balance of an HID lamp, the quartz burner, preferably the inside thereof, is coated with a UV reflecting layer system by alternatingly applying amorphous thin layers made at least of titanium oxide and silicon oxide having the respective general stoichiometry TiOy and SiOx by means of a plasma impulse chemical vapor deposition (PICVD) method at a high power density and increased substrate temperatures ranging from 100° to 400° C., using small growth rates ranging from 1 nm/sec to 100 nm/sec so as to form an interference layer system having a thickness of less than 1200 nm and a minimized UV-active defective spot rate ranging from 0.1 to 1 percent.

Abstract: The invention envisages a light-generating apparatus that provides effective cooling of the reflector, the apparatus comprising a reflector and a device for improving the dissipation of heat from the reflector.

Abstract: The invention relates to layer systems having at least one layer comprising titanium aluminum oxide. The layer comprising titanium aluminum oxide may be either a functional layer—with or without interruption by an intermediate layer which is optically inactive—or a functional layer formed from a metal oxide which is interrupted by an intermediate layer comprising titanium aluminum oxide. The layer systems are structurally and thermally stable at operating temperatures of over 600° C. The layer systems may either comprise only one functional layer or may be a multilayer system, preferably an alternating layer system composed of functional layers with high and low refractive indices.

Abstract: A scratchproof, temperature-stable protective layer, in particular a scratch-resistant protective layer for cooking hobs is provided. In addition, processes and an apparatus for producing these protective layers are provided. The protective layer includes at least one hard-material layer having a functional layer interrupted by very thin interlayers so that the functional layer has a morphologically dense columnar structure that grows substantially perpendicular to the body surface. The production of layers of this type is achieved by a magnetron sputtering process and a corresponding arrangement, with the tendency of the columnar structures to widen out being reduced by targeted interruption of the growth of the functional layers.

Abstract: A method of producing substrates with functional layers which have high optical properties and/or a high surface smoothness, in particular a low turbidity and significantly lower roughness, is provided. The method includes a sputtering process for coating a substrate with at least one functional layer, the sputtering process being interrupted at least once by the application of an intermediate layer with a thickness of less than 20 nm.

Abstract: A container having an at least partly transparent hollow body and a decoration is provided. The decoration includes at least one interior lining of the hollow body so that reactions between ingredients of a product situated in the container and constituents of the decoration are prevented.

Abstract: In order to improve the energy balance of an HID lamp, the quartz burner, preferably the inside thereof, is coated with a UV reflecting layer system by alternatingly applying amorphous thin layers made at least of titanium oxide and silicon oxide having the respective general stoichiometry TiOy and SiOx by means of a plasma impulse chemical vapor deposition (PICVD) method at a high power density and increased substrate temperatures ranging from 100° to 400° C., using small growth rates ranging from 1 nm/sec to 100 nm/sec so as to form an interference layer system having a thickness of less than 1200 nm and a minimized UV-active defective spot rate ranging from 0.1 to 1 percent.

Abstract: The invention relates to a process for producing an object which has optical layers. According to the invention such a process comprises the following process steps: To a substrate of plastic material several optical layers are applied; the optical layers are applied by means of a chemical plasma-impulse vaporization (PICVC).

Abstract: A gas supply device for delivering precursors with a low vapor pressure to CVD coating systems. The gas supply device has a supply container for the precursor which is at a first temperature T1, an intermediate storage device for intermediately storing the vaporous precursor at a second temperature T2 and at a constant pressure p2, a first gas line between the supply container and the intermediate storage device and a second gas line for removing gas from the intermediate storage device. The gas supply device is developed in such a way that the first temperature T1 is higher than the second temperature T2. The lower temperature T2 of the intermediate storage device facilitates maintenance work on the same, while the precursor evaporates at a greater rate at the higher temperature T1 in the supply container. A first precursor vapor may be mixed with a gas and/or a second precursor vapor in the intermediate storage device.

Abstract: An apparatus for coating objects having a single microwave source, two or more coating chambers, and an impedance structure or a waveguide structure. The coating chambers are connected to the single microwave source. The impedance structure or waveguide structure divides the microwave energy in order to generate plasmas in the coating chambers.