Abstract: In an example implementation, a method includes illuminating a wafer with excitation light having a wavelength and intensity sufficient to induce photoluminescence in the wafer. The method also includes detecting photoluminescence emitted from a portion of the wafer in response to the illumination, and detecting excitation light reflected from the portion of the wafer. The method also includes comparing the photoluminescence emitted from the portion of the wafer and the excitation light reflected from the portion of the wafer, and identifying one or more defects in the wafer based on the comparison.

Abstract: In an example implementation, a method includes illuminating a wafer with excitation light having a wavelength and intensity sufficient to induce photoluminescence in the wafer. The method also includes detecting photoluminescence emitted from a portion of the wafer in response to the illumination, and detecting excitation light reflected from the portion of the wafer. The method also includes comparing the photoluminescence emitted from the portion of the wafer and the excitation light reflected from the portion of the wafer, and identifying one or more defects in the wafer based on the comparison.

Abstract: In an example implementation, a method includes illuminating a wafer with excitation light having a wavelength and intensity sufficient to induce photoluminescence in the wafer. The method also includes detecting photoluminescence emitted from a portion of the wafer in response to the illumination, and detecting excitation light reflected from the portion of the wafer. The method also includes comparing the photoluminescence emitted from the portion of the wafer and the excitation light reflected from the portion of the wafer, and identifying one or more defects in the wafer based on the comparison.

Abstract: A method that includes: illuminating a wafer with excitation light having a wavelength and intensity sufficient to induce photoluminescence in the wafer; filtering photoluminescence emitted from a portion of the wafer in response to the illumination; directing the filtered photoluminescence onto a detector to image the portion of the wafer on the detector with a spatial resolution of 1 ?m×1 ?m or smaller; and identifying one or more crystallographic defects in the wafer based on the detected filtered photoluminescence.

Abstract: A method that includes: illuminating a wafer with excitation light having a wavelength and intensity sufficient to induce photoluminescence in the wafer; filtering photoluminescence emitted from a portion of the wafer in response to the illumination; directing the filtered photoluminescence onto a detector to image the portion of the wafer on the detector with a spatial resolution of 1 ?m×1 ?m or smaller; and identifying one or more crystallographic defects in the wafer based on the detected filtered photoluminescence.

Abstract: A method that includes: illuminating a wafer with excitation light having a wavelength and intensity sufficient to induce photoluminescence in the wafer; filtering photoluminescence emitted from a portion of the wafer in response to the illumination; directing the filtered photoluminescence onto a detector to image the portion of the wafer on the detector with a spatial resolution of 1 ?m×1 ?m or smaller; and identifying one or more crystallographic defects in the wafer based on the detected filtered photoluminescence.

Abstract: In an example implementation, a method includes illuminating a wafer with excitation light having a wavelength and intensity sufficient to induce photoluminescence in the wafer. The method also includes detecting photoluminescence emitted from a portion of the wafer in response to the illumination, and detecting excitation light reflected from the portion of the wafer. The method also includes comparing the photoluminescence emitted from the portion of the wafer and the excitation light reflected from the portion of the wafer, and identifying one or more defects in the wafer based on the comparison.

Abstract: A method that includes: illuminating a wafer with excitation light having a wavelength and intensity sufficient to induce photoluminescence in the wafer; filtering photoluminescence emitted from a portion of the wafer in response to the illumination; directing the filtered photoluminescence onto a detector to image the portion of the wafer on the detector with a spatial resolution of 1 ?m×1 ?m or smaller; and identifying one or more crystallographic defects in the wafer based on the detected filtered photoluminescence.

Abstract: In an example implementation, a method includes illuminating a wafer with excitation light having a wavelength and intensity sufficient to induce photoluminescence in the wafer. The method also includes detecting photoluminescence emitted from a portion of the wafer in response to the illumination, and detecting excitation light reflected from the portion of the wafer. The method also includes comparing the photoluminescence emitted from the portion of the wafer and the excitation light reflected from the portion of the wafer, and identifying one or more defects in the wafer based on the comparison.

Abstract: An optical microscope system for reconstructing an image of an object includes a means for creating a light beam profile, an optics for directing the light beam profile to the object, a moving means for implementing a scanning of the object with the light beam profile, a rotating means for enabling rotating the light beam profile and the object, and for changing the direction of scanning, and a detector for measuring the intensity of light passing through or reflected by the object. The image may be tomographically reconstructed using this intensity data associated with various directions as a plurality of projections.

Abstract: The invention is an optical microscope system (1) for reconstructing an image of an object (14), comprising: a means (8) for creating a light beam profile (7), an optics for directing the light beam profile (7) to the object (14), a moving means for implementing a scanning of the object (14) with the light beam profile (7), a rotating means for enabling rotating vis-a-vis each other the light beam profile (7) and the object (14), and for changing the direction of scanning, and a detector (5) for measuring the intensity of light passing through or reflected by the object (14). Further, the invention is a method for reconstructing the image of an object (14) by means of an optical microscope system (1).