Patents by Inventor Laura E. Faulk

Laura E. Faulk has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Residue removal by CO2 water rinse in conjunction with post metal etch plasma strip
    Patent number: 6328905
    Abstract: Methods of removing resist residues from semiconductor workpiece surfaces are provided. In one aspect, a method of removing resist from a surface of a workpiece is provided that includes the steps of exposing the workpiece to a plasma and rinsing the workpiece with CO2 and water in a processing chamber to dissolve the resist. Reliance on post plasma strip solvent rinses for resist removal is eliminated. The combination of CO2 with post-plasma strip water rinse increases the solubility and thus the removal rate of resist residues.
    Type: Grant
    Filed: August 12, 1999
    Date of Patent: December 11, 2001
    Assignee: Advanced Micro Devices, Inc.
    Inventors: Joseph Lebowitz, Laura E. Faulk