Abstract: A method of forming an alkali metal oxide-doped optical fiber by diffusing an alkali metal into a surface of a glass article is disclosed. The silica glass article may be in the form of a tube or a rod, or a collection of tubes or rods. The silica glass article containing the alkali metal, and impurities that may have been unintentionally diffused into the glass article, is etched to a depth sufficient to remove the impurities. The silica glass article may be further processed to form a complete optical fiber preform. The preform, when drawn into an optical fiber, exhibits a low attenuation.

Abstract: A method of forming an alkali metal oxide-doped optical fiber by diffusing an alkali metal into a surface of a glass article is disclosed. The silica glass article may be in the form of a tube or a rod, or a collection of tubes or rods. The silica glass article containing the alkali metal, and impurities that may have been unintentionally diffused into the glass article, is etched to a depth sufficient to remove the impurities. The silica glass article may be further processed to form a complete optical fiber preform. The preform, when drawn into an optical fiber, exhibits a low attenuation.

Abstract: Burners (14) are used to make glass bodies (19) from OMCTS. The burners have six concentric regions. Putting certain gases through the regions results in thicker bodies than can be achieved with existing techniques and with improved efficiency.

Abstract: A method of forming an alkali metal oxide-doped optical fiber by diffusing an alkali metal into a surface of a glass article is disclosed. The silica glass article may be in the form of a tube or a rod, or a collection of tubes or rods. The silica glass article containing the alkali metal, and impurities that may have been unintentionally diffused into the glass article, is etched to a depth sufficient to remove the impurities. The silica glass article may be further processed to form a complete optical fiber preform. The preform, when drawn into an optical fiber, exhibits a low attenuation.

Abstract: A method for manufacturing a photomask material includes delivering a powder containing silicon dioxide into a plasma to produce silica particles and depositing the silica particles on a deposition surface to form glass.

Abstract: A method for making extreme ultraviolet lithography tool glass substrates includes generating a plasma, delivering reactants comprising a silica precursor and a titania precursor into the plasma to produce titania and silica particles, and depositing the titania and silica particles on a deposition surface to form a homogeneous titania-doped silica. The invention provides for homogeneous glass substrates that are free of striae variations and provides for beneficial extreme ultraviolet lithography reflective optics.

Abstract: A method for manufacturing a photomask material includes delivering a powder containing silicon dioxide into a plasma to produce silica particles and depositing the silica particles on a deposition surface to form glass.

Abstract: A method of making fused silica includes generating a plasma, delivering reactants comprising a silica precursor into the plasma to produce silica particles, and depositing the silica particles on a deposition surface to form glass.