Patents by Inventor Lauren A. Hall

Lauren A. Hall has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240071593
    Abstract: Systems and methods are disclosed that provide smart alerts to users, e.g., alerts to users about diabetic states that are only provided when it makes sense to do so, e.g., when the system can predict or estimate that the user is not already cognitively aware of their current condition, e.g., particularly where the current condition is a diabetic state warranting attention. In this way, the alert or alarm is personalized and made particularly effective for that user. Such systems and methods still alert the user when action is necessary, e.g., a bolus or temporary basal rate change, or provide a response to a missed bolus or a need for correction, but do not alert when action is unnecessary, e.g., if the user is already estimated or predicted to be cognitively aware of the diabetic state warranting attention, or if corrective action was already taken.
    Type: Application
    Filed: October 24, 2023
    Publication date: February 29, 2024
    Inventors: Anna Leigh DAVIS, Scott M. BELLIVEAU, Naresh C. BHAVARAJU, Leif N. BOWMAN, Rita M. CASTILLO, Alexandra Elena CONSTANTIN, Rian W. DRAEGER, Laura J. DUNN, Gary Brian GABLE, Arturo GARCIA, Thomas HALL, Hari HAMPAPURAM, Christopher Robert HANNEMANN, Anna Claire HARLEY-TROCHIMCZYK, Nathaniel David HEINTZMAN, Andrea Jean JACKSON, Lauren Hruby JEPSON, Apurv Ullas KAMATH, Katherine Yerre KOEHLER, Aditya Sagar MANDAPAKA, Samuel Jere MARSH, Gary A. MORRIS, Subrai Girish PAI, Andrew Attila PAL, Nicholas POLYTARIDIS, Philip Thomas PUPA, Eli REIHMAN, Ashley Anne RINDFLEISCH, Sofie Wells SCHUNK, Peter C. SIMPSON, Daniel S. SMITH, Stephen J. VANSLYKE, Matthew T. VOGEL, Tomas C. WALKER, Benjamin Elrod WEST, Atiim Joseph WILEY
  • Patent number: 7001854
    Abstract: Chemical vapor deposition processes are employed to fill high aspect ratio (typically at least 3:1), narrow width (typically 1.5 microns or less and even sub 0.13 micron) gaps with significantly reduced incidence of voids or weak spots. This deposition process involves the use of hydrogen and a phosphorus dopant precursor as process gasses in the reactive mixture of a plasma containing CVD reactor. The process gas also includes dielectric forming precursor molecules such as silicon and oxygen containing molecules.
    Type: Grant
    Filed: October 11, 2002
    Date of Patent: February 21, 2006
    Assignee: Novellus Systems, Inc.
    Inventors: George D. Papasouliotis, Md Sazzadur Rahman, Pin Sheng Sun, Karen Prichard, Lauren Hall, Vikram Singh
  • Patent number: 5876808
    Abstract: A plasma enhanced chemical vapor deposition process for depositing a titanium nitride film on a polymeric substrate is provided, the process including placing the polymeric substrate within a chemical vapor deposition chamber evacuated to a pressure within a range of from about 0.1 Torr to about 10 Torr, heating the polymeric substrate to a temperature within a range of from about 150.degree. C. to about 250.degree. C., introducing a vaporized organometallic compound and ammonia gas into the chamber, generating a plasma within the chamber, and, maintaining the polymeric substrate within the chamber for a time sufficient for a layer of titanium nitride to deposit upon the polymeric substrate.
    Type: Grant
    Filed: March 13, 1997
    Date of Patent: March 2, 1999
    Assignee: The Regents of the University of California
    Inventors: Lauren A. Hall, David J. Devlin, David C. Smith