Patents by Inventor Laurens Anthony Sanderse

Laurens Anthony Sanderse has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Lithographic apparatus and device manufacturing method
    Patent number: 8913225
    Abstract: In an immersion lithographic apparatus, a final element is disclosed having, on a surface nearest the substrate, a layer bonded to the surface and having an edge barrier, of the same material as the layer, extending from the layer away from the substrate to shield the final element from a liquid. In an embodiment, the final element is attached to the apparatus via the layer and/or edge barrier, which may be made of a material with a coefficient of thermal expansion lower than the coefficient of thermal expansion of the final element.
    Type: Grant
    Filed: July 22, 2011
    Date of Patent: December 16, 2014
    Assignee: ASML Netherlands B.V.
    Inventors: Tammo Uitterdijk, Erik Roelof Loopstra, Laurens Anthony Sanderse
  • LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
    Publication number: 20110279796
    Abstract: In an immersion lithographic apparatus, a final element is disclosed having, on a surface nearest the substrate, a layer bonded to the surface and having an edge barrier, of the same material as the layer, extending from the layer away from the substrate to shield the final element from a liquid. In an embodiment, the final element is attached to the apparatus via the layer and/or edge barrier, which may be made of a material with a coefficient of thermal expansion lower than the coefficient of thermal expansion of the final element.
    Type: Application
    Filed: July 22, 2011
    Publication date: November 17, 2011
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Tammo Uitterdijk, Erik Roelof Loopstra, Laurens Anthony Sanderse
  • Lithographic apparatus and device manufacturing method
    Patent number: 8013978
    Abstract: In an immersion lithographic apparatus, a final element is disclosed having, on a surface nearest the substrate, a layer bonded to the surface and having an edge barrier, of the same material as the layer, extending from the layer away from the substrate to shield the final element from a liquid. In an embodiment, the final element is attached to the apparatus via the layer and/or edge barrier, which may be made of a material with a coefficient of thermal expansion lower than the coefficient of thermal expansion of the final element.
    Type: Grant
    Filed: June 20, 2008
    Date of Patent: September 6, 2011
    Assignee: ASML Netherlands B.V.
    Inventors: Tammo Uitterdijk, Erik Roelof Loopstra, Laurens Anthony Sanderse
  • LITHOGRAPHIC APPARATUS AND A METHOD OF OPERATING THE APPARATUS
    Publication number: 20100271606
    Abstract: An immersion lithographic apparatus is disclosed. The apparatus has a projection system configured to project a patterned radiation beam onto a target portion of the substrate, the projection system having a lower surface. The apparatus also has a liquid confinement structure defining, in use, in part with the lower surface and the substrate and/or substrate table, an immersion space, the immersion space comprising, in use, a liquid meniscus between a part of the lower surface facing a surface of the liquid confinement structure and a facing surface of the liquid confinement structure facing the part of the lower surface. The apparatus also has a pinning surface comprising a plurality of meniscus pinning features, the pinning surface being part of or on the part of the lower surface, or part of or on the facing surface of the liquid confinement structure, or part of or on both.
    Type: Application
    Filed: April 20, 2010
    Publication date: October 28, 2010
    Applicant: ASML Netherlands B.V.
    Inventors: Laurens Anthony SANDERSE, Josephus Cornelius Johannes Antonius Vugts, Ivo Adam Johannes Thomas
  • Lithographic apparatus and device manufacturing method
    Publication number: 20080259296
    Abstract: In an immersion lithographic apparatus, a final element is disclosed having, on a surface nearest the substrate, a layer bonded to the surface and having an edge barrier, of the same material as the layer, extending from the layer away from the substrate to shield the final element from a liquid. In an embodiment, the final element is attached to the apparatus via the layer and/or edge barrier, which may be made of a material with a coefficient of thermal expansion lower than the coefficient of thermal expansion of the final element.
    Type: Application
    Filed: June 20, 2008
    Publication date: October 23, 2008
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Tammo Uitterdijk, Erik Roelof Loopstra, Laurens Anthony Sanderse
  • Lithographic apparatus and device manufacturing method
    Patent number: 7405805
    Abstract: In an immersion lithographic apparatus, a final element is disclosed having, on a surface nearest the substrate, a layer bonded to the surface and having an edge barrier, of the same material as the layer, extending from the layer away from the substrate to shield the final element from a liquid. In an embodiment, the final element is attached to the apparatus via the layer and/or edge barrier, which may be made of a material with a coefficient of thermal expansion lower than the coefficient of thermal expansion of the final element.
    Type: Grant
    Filed: December 28, 2004
    Date of Patent: July 29, 2008
    Assignee: ASML Netherlands B.V.
    Inventors: Tammo Uitterdijk, Erik Roelof Loopstra, Laurens Anthony Sanderse