Patents by Inventor Laurens Plandsoen

Laurens Plandsoen has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Lithography system for processing a target, such as a wafer, and a method for operating a lithography system for processing a target, such as a wafer
    Patent number: 9395636
    Abstract: The invention relates to a lithography system for processing a target, such as a wafer. The lithography system comprises a beam source arranged for providing a patterning beam, a final projection system arranged for projecting a pattern on the target surface, a chuck arranged for supporting the target and a mark position system connected to the final projection system and arranged for detecting a position mark on a surface.
    Type: Grant
    Filed: April 23, 2012
    Date of Patent: July 19, 2016
    Assignee: MAPPER LITHOGRAPHY IP B.V.
    Inventors: Guido De Boer, Niels Vergeer, Godefridus Cornelius Antonius Couweleers, Laurens Plandsoen, Cor Verburg
  • Lithography system for processing at least a part of a target
    Patent number: 9383662
    Abstract: The invention relates to a lithography system for processing a target, wherein the lithography system comprises a final projection system arranged for projecting a pattern on the target surface. The lithography system comprises a mark position detection system arranged for detecting a position of a position mark on the target surface. The mark position detection system comprises an optical element arranged for projecting a light beam on the target surface and a light detector arranged for detecting a reflected light beam. The optical element may be positioned adjacent to the final projection system and the light detector may be positioned inside a frame.
    Type: Grant
    Filed: May 11, 2012
    Date of Patent: July 5, 2016
    Assignee: MAPPER LITHOGRAPHY IP B.V.
    Inventors: Niels Vergeer, Guido de Boer, Godefridus Cornelius Antonius Couweleers, Laurens Plandsoen, Cor Verburg
  • Lithography system for processing a target, such as a wafer, a method for operating a lithography system for processing a target, such as a wafer and a substrate for use in such a lithography system
    Patent number: 9201315
    Abstract: The invention relates to a lithography system for processing a target, such as a wafer and a substrate for use in such a lithography system. The lithography system comprises a beam source arranged for providing a patterning beam, a final projection system arranged for projecting a pattern on the target surface, a chuck arranged for supporting the target and a mark position system arranged for detecting a position mark on a surface.
    Type: Grant
    Filed: April 23, 2012
    Date of Patent: December 1, 2015
    Assignee: MAPPER LITHOGRAPHY IP B.V.
    Inventors: Guido De Boer, Niels Vergeer, Godefridus Cornelius Antonius Couweleers, Laurens Plandsoen, Cor Verburg
  • LITHOGRAPHY SYSTEM FOR PROCESSING AT LEAST A PART OF A TARGET
    Publication number: 20120287411
    Abstract: The invention relates to a lithography system for processing a target, wherein the lithography system comprises a final projection system arranged for projecting a pattern on the target surface. The lithography system comprises a mark position detection system arranged for detecting a position of a position mark on the target surface. The mark position detection system comprises an optical element arranged for projecting a light beam on the target surface and a light detector arranged for detecting a reflected light beam. The optical element may be positioned adjacent to the final projection system and the light detector may be positioned inside a frame.
    Type: Application
    Filed: May 11, 2012
    Publication date: November 15, 2012
    Inventors: Niels Vergeer, Guido de Boer, Godefridus Cornelius Antonius Couweleers, Laurens Plandsoen, Cor Verburg
  • LITHOGRAPHY SYSTEM FOR PROCESSING A TARGET, SUCH AS A WAFER, AND A METHOD FOR OPERATING A LITHOGRAPHY SYSTEM FOR PROCESSING A TARGET, SUCH AS A WAFER
    Publication number: 20120268725
    Abstract: The invention relates to a lithography system for processing a target, such as a wafer. The lithography system comprises a beam source arranged for providing a patterning beam, a final projection system arranged for projecting a pattern on the target surface, a chuck arranged for supporting the target and a mark position system connected to the final projection system and arranged for detecting a position mark on a surface.
    Type: Application
    Filed: April 23, 2012
    Publication date: October 25, 2012
    Inventors: Guido De Boer, Niels Vergeer, Godelridus Cornelius Antonius Couweleers, Laurens Plandsoen, Cor Verburg
  • LITHOGRAPHY SYSTEM FOR PROCESSING A TARGET, SUCH AS A WAFER, A METHOD FOR OPERATING A LITHOGRAPHY SYSTEM FOR PROCESSING A TARGET, SUCH AS A WAFER AND A SUBSTRATE FOR USE IN SUCH A LITHOGRAPHY SYSTEM
    Publication number: 20120268724
    Abstract: The invention relates to a lithography system for processing a target, such as a wafer and a substrate for use in such a lithography system. The lithography system comprises a beam source arranged for providing a patterning beam, a final projection system arranged for projecting a pattern on the target surface, a chuck arranged for supporting the target and a mark position system arranged for detecting a position mark on a surface.
    Type: Application
    Filed: April 23, 2012
    Publication date: October 25, 2012
    Inventors: Guido De Boer, Niels Vergeer, Godefridus Cornelius Antonius Couweleers, Laurens Plandsoen, Cor Verburg