Abstract: An epitaxial deposition apparatus comprises a deposition chamber with at least one gas injector having a gas injection surface and a substrate support having a deposition surface; and at least one vacuum pump having a gas aperture in fluid communication with the deposition chamber and facing the gas injection surface of the at least one gas injector, the substrate support being inter-posed between the at least one gas injector and the gas aperture of the at least one vacuum pump. The invention also relates to an epitaxial deposition gas injector and a nozzle for an epitaxial deposition gas injector. Furthermore, the invention relates to a gas supply and handling system for an epitaxial deposition apparatus.

Abstract: Process for the manufacture of dental or maxillo-facial prostheses, particularly endo-osseous prostheses or pivots, in which a layer of pure aluminum is deposited on a conductive substrate, preferably a metal, which forms the core of the prosthesis. The aluminum layer is obtained by electrochemical deposition of pure aluminum with non-aqueous electrolyte base of the type which has an aluminumorganic complex bath. The layer is then oxidized by anodization such that an alumina layer which is sealed and electrically insulated, is obtained, separating the core and the biological tissues surrounding the prosthesis.