Abstract: This invention relates to a process for surface treatment of a substrate carried by an electrode and immersed in a sealed engraving or deposition chamber equipped with plasma generating means, of the type involving the application to the electrodes, of a variable voltage, produced by a generator that is independent of the plasma generating means, wherein said process comprises the steps of:maintaining within said chamber a continuous plasma that is free of electromagnetic fields;supplying said electrode via a low impedance capacitor using a signal comprised of rectangular voltage pulses having:a variable pulse repetition rate to control the energy distribution function of the positive ionic charges bombarding the substrate,a variable mark-to-space ratio for each pulse to control the time distribution of the negative electron charges and the positive ionic charges bombarding the substrate, anda variable pulse amplitude to control the energy of the positive ionic charges bombarding the substrate.