Patents by Inventor Laurentinus Catrinus Jorritsma

Laurentinus Catrinus Jorritsma has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • LITHOGRAPHIC APPARATUS AND A METHOD OF OPERATING THE APPARATUS
    Publication number: 20190086814
    Abstract: A lithographic apparatus is disclosed that includes a projection system, and a liquid confinement structure configured to at least partly confine immersion liquid to an immersion space defined by the projection system, the liquid confinement structure and a substrate and/or substrate table. Measures are taken in the lithographic apparatus, for example, to reduce the effect of droplets on the final element of the projection system or to substantially avoid such droplet formation.
    Type: Application
    Filed: November 19, 2018
    Publication date: March 21, 2019
    Applicant: ASML Netherlands B.V.
    Inventors: Jeroen Peter Johannes Bruijstens, Richard Joseph Bruls, Hans Jansen, Siebe Landheer, Laurentinus Catrinus Jorritsma, Arnout Johannes Meester, Bauke Jansen, Ivo Adam Johannes Thomas, Marcio Alexandre Cano Miranda, Maurice Martinus Johannes Van Der Lee, Gheorghe Tanasa, Lambertus Dominicus Noordam