Patents by Inventor Laurentius Johannes Adrianus Van Bokhoven
Laurentius Johannes Adrianus Van Bokhoven has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20240077803Abstract: Systems, apparatuses, and methods are provided for heating a plurality of optical components. An example method can include receiving an input radiation beam from a radiation source. The example method can further include generating a plurality of output radiation beams based on the input radiation beam. The example method can further include transmitting the plurality of output radiation beams towards a plurality of heater head optics configured to heat the plurality of optical components. Optionally, the example method can further include controlling a respective power value, and realizing a flat-top far-field profile, of each of the plurality of output radiation beams.Type: ApplicationFiled: December 30, 2021Publication date: March 7, 2024Applicants: ASML NETHERLANDS B.V., ASML Holding N.V.Inventors: Laurentius Johannes Adrianus VAN BOKHOVEN, Mahesh Upendra AJGAONKAR
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Publication number: 20230400785Abstract: There is provided a conditioning system for a lithographic apparatus, said conditioning system being configured to condition one or more optical elements of the lithographic apparatus, wherein the conditioning system is configured to have a sub-atmospheric pressure at the one or more optical elements.Type: ApplicationFiled: October 14, 2021Publication date: December 14, 2023Applicant: ASML Netherlands B.V.Inventors: Antonius Johannus VAN DER NET, Martinus Cornelis Maria VERHAGEN, Johannes Henricus Wilhelmus JACOBS, Laurentius Johannes Adrianus VAN BOKHOVEN, Jeroen Peterus Johannes VAN LIPZIG
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Publication number: 20230176492Abstract: Disclosed are an optical system, in particular for microlithography, and a method for operating an optical system. According to one disclosed aspect, the optical system includes at least one mirror (100, 500, 600) having an optical effective surface (101, 501, 601) and a mirror substrate (110, 510, 610), wherein at least one cooling channel (115, 515, 615) in which a cooling fluid is configured to flow is arranged in the mirror substrate, for dissipating heat that is generated in the mirror substrate due to absorption of electromagnetic radiation incident from a light source on the optical effective surface, and a unit (135, 535, 635) to adjust the temperature and/or the flow rate of the cooling fluid either dependent on a measured quantity that characterizes the thermal load in the mirror substrate or dependent on an estimated/expected thermal load in the mirror substrate for a given power of the light source.Type: ApplicationFiled: January 30, 2023Publication date: June 8, 2023Inventors: Toralf GRUNER, Norman BAER, Koos VAN BERKEL, Laurentius Johannes Adrianus VAN BOKHOVEN, Maike LORENZ, Thomas MONZ, Eva SCHNEIDER, Hans-Michael STIEPAN, Bob STREEFKERK, André DIRAUF
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Patent number: 11644755Abstract: A method of predicting deflection of a pellicle which will occur during movement of the pellicle in a lithographic apparatus, the method including receiving parameters regarding properties of the pellicle and receiving parameters regarding the expected movement of the pellicle. The parameters are applied to a model which predicts deflection of the pellicle as a function of those parameters. The model includes a plurality of sub-models which relate to different components of deflection of the pellicle. An output of the model may be used to predict.Type: GrantFiled: September 11, 2019Date of Patent: May 9, 2023Assignee: ASML NETHERLAND B.V.Inventors: Bearrach Moest, Rowin Meijerink, Thijs Schenkelaars, Norbertus Josephus Martinus Van Den Nieuwelaar, Laurentius Johannes Adrianus Van Bokhoven
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Publication number: 20220187715Abstract: A method of predicting thermally induced aberrations of a projection system for projecting a radiation beam, the method comprising: calculating a change in temperature of the projection system from a power of the radiation beam output from the projection system using a dynamic linear function; and calculating the thermally induced aberrations from the calculated change in temperature using a static non-linear function.Type: ApplicationFiled: February 10, 2020Publication date: June 16, 2022Applicant: ASML Netherlands B.V.Inventors: Mhamed AKHSSAY, Laurentius Johannes Adrianus VAN BOKHOVEN
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Publication number: 20210389676Abstract: A method of predicting deflection of a pellicle which will occur during movement of the pellicle in a lithographic apparatus, the method including receiving parameters regarding properties of the pellicle and receiving parameters regarding the expected movement of the pellicle. The parameters are applied to a model which predicts deflection of the pellicle as a function of those parameters. The model includes a plurality of sub-models which relate to different components of deflection of the pellicle. An output of the model may be used to predict.Type: ApplicationFiled: September 11, 2019Publication date: December 16, 2021Applicant: ASML NETHERLANDS B.V.Inventors: Bearrach MOEST, Rowin MEIJERINK, Thijs SCHENKELAARS, Norbertus Josephus Martinus VAN DEN NIEUWELAAR, Laurentius Johannes Adrianus VAN BOKHOVEN
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Patent number: 11048178Abstract: A plate to be positioned between a movable stage and a projection system of a lithographic apparatus, the plate having a surface to face the movable stage; an opening through the plate for passage of patterned radiation beam; one or more gas outlets in a side of the opening and in the surface of the plate, wherein the one or more gas outlets are configured to supply gas to a region between the movable stage and the projection system, wherein all of the one or more gas outlets in the surface of the plate are positioned such that, for each of such one or more gas outlets, a line that is both orthogonal to the surface and intersects the gas outlet does not intersect the patterning device at any point during the entire range of movement of the patterning device.Type: GrantFiled: November 22, 2018Date of Patent: June 29, 2021Assignee: ASML Netherlands B.V.Inventors: Federico La Torre, Laurentius Johannes Adrianus Van Bokhoven, José Nilton Fonseca, Jr., Gerben Pieterse, Erik Henricus Egidius Catharina Eummelen, Frank Johannes Jacobus Van Boxtel
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Patent number: 10990025Abstract: An apparatus and method for controlling temperature of a patterning device in a lithographic apparatus, by flowing gas across the patterning device. A patterning apparatus includes: a patterning device support structure configured to support a patterning device; a patterning device conditioning system including a first gas outlet configured to provide a gas flow over a surface of the patterning device and a second gas outlet configured to provide a gas flow over a part of a surface of the patterning device support structure not supporting the patterning device; and a control system configured to separately control the temperature of the gas exiting the first and second gas outlets such that the gas exiting the second gas outlet is at a higher temperature than the gas exiting the first gas outlet and/or to separately control the temperature and gas flow rate of the gas exiting the first and second gas outlets.Type: GrantFiled: March 1, 2019Date of Patent: April 27, 2021Assignee: ASML NETHERLANDS B.V.Inventors: Laurentius Johannes Adrianus Van Bokhoven, Ruud Hendrikus Martinus Johannes Bloks, Günes Nakiboglu, Marinus Jan Remie, Johan Gertrudis Cornelis Kunnen
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Patent number: 10908517Abstract: The invention relates to a setpoint generator for moving a patterning device of a lithographic apparatus, the patterning device being capable of imparting a radiation beam with a pattern in its cross-section to form a patterned radiation beam, wherein the setpoint generator comprises a finite number of movement profiles for the patterning device, and wherein the setpoint generator is configured to select one of the finite number of movement profiles based on a desired movement profile and to output the selected movement profile as a setpoint for the patterning device.Type: GrantFiled: April 18, 2018Date of Patent: February 2, 2021Assignee: ASML Netherlands B.V.Inventors: Jean-Philippe Xavier Van Damme, Laurentius Johannes Adrianus Van Bokhoven, Petrus Franciscus Van Gils, Gerben Pieterse
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Publication number: 20200393769Abstract: A plate to be positioned between a movable stage and a projection system of a lithographic apparatus, the plate having a surface to face the movable stage; an opening through the plate for passage of patterned radiation beam; one or more gas outlets in a side of the opening and in the surface of the plate, wherein the one or more gas outlets are configured to supply gas to a region between the movable stage and the projection system, wherein all of the one or more gas outlets in the surface of the plate are positioned such that, for each of such one or more gas outlets, a line that is both orthogonal to the surface and intersects the gas outlet does not intersect the patterning device at any point during the entire range of movement of the patterning device.Type: ApplicationFiled: November 22, 2018Publication date: December 17, 2020Applicant: ASML NETHERLANDS B.V.Inventors: Federico LA TORRE, Laurentius Johannes Adrianus VAN BOKHOVEN, José Nilton FONSECA Junior, Gerben PIETERSE, Erik Henricus Egidius Catharina EUMMELEN, Frank Johannes Jacobus VAN BOXTEL
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Patent number: 10705438Abstract: A lithographic apparatus comprising a support structure constructed to support a patterning device and associated pellicle, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam, and a projection system configured to project the patterned radiation beam onto a target portion of a substrate, wherein the support structure is located in a housing and wherein pressure sensors are located in the housing.Type: GrantFiled: December 17, 2019Date of Patent: July 7, 2020Assignee: ASML Netherlands B.V.Inventors: Andre Bernardus Jeunink, Laurentius Johannes Adrianus Van Bokhoven, Stan Henricus Van Der Meulen, Yang-Shan Huang, Federico La Torre, Bearrach Moest, Stefan Carolus Jacobus Antonius Keij, Enno Van Den Brink, Christine Henriette Schouten, Hoite Pieter Theodoor Tolsma
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Publication number: 20200174381Abstract: The invention relates to a setpoint generator for moving a patterning device of a lithographic apparatus, the patterning device being capable of imparting a radiation beam with a pattern in its cross-section to form a patterned radiation beam, wherein the setpoint generator comprises a finite number of movement profiles for the patterning device, and wherein the setpoint generator is configured to select one of the finite number of movement profiles based on a desired movement profile and to output the selected movement profile as a setpoint for the patterning device.Type: ApplicationFiled: April 18, 2018Publication date: June 4, 2020Applicant: ASML Netherlands B.V.Inventors: Jean-Philippe Xavier VAN DAMME, Laurentius Johannes Adrianus VAN BOKHOVEN, Petrus Franciscus VAN GILS, Gerben PIETERSE
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Patent number: 10642166Abstract: A patterning apparatus for a lithographic apparatus, the patterning apparatus including a patterning device support structure configured to support a patterning device having a planar surface; a patterning device conditioning system including a first gas outlet configured to provide a first gas flow over the planar surface in use and a second gas outlet configured to provide a second gas flow over the planar surface in use, wherein the first gas outlet and the second gas outlet are arranged at different distances perpendicular to the planar surface; and a control system configured to independently control a first momentum of gas exiting the first gas outlet and a second momentum of gas exiting the second gas outlet or to independently vary the first gas flow and/or the second gas flow over the planar surface of the patterning device.Type: GrantFiled: July 22, 2019Date of Patent: May 5, 2020Assignees: ASML Holding N.V., ASML Netherlands B.V.Inventors: Güneş Nakíbo{hacek over (g)}lu, Lowell Lane Baker, Ruud Hendrikus Martinus Johannes Bloks, Hakki Ergün Cekli, Geoffrey Alan Schultz, Laurentius Johannes Adrianus Van Bokhoven, Frank Johannes Jacobus Van Boxtel, Jean-Philippe Xavier Van Damme, Christopher Charles Ward
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Publication number: 20200117097Abstract: A lithographic apparatus comprising a support structure constructed to support a patterning device and associated pellicle, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam, and a projection system configured to project the patterned radiation beam onto a target portion of a substrate, wherein the support structure is located in a housing and wherein pressure sensors are located in the housing.Type: ApplicationFiled: December 17, 2019Publication date: April 16, 2020Applicant: ASML NETHERLANDS B.V.Inventors: Andre Bernardus JEUNINK, Laurentius Johannes Adrianus Van Bokhoven, Stan Henricus Van Der Meulen, Yang-Shan Huang, Federico La Torre, Bearrach Moest, Stefan Carolus Jacobus Antonius Keij, Enno Van Den Brink, Christine Henriette Schouten, Hoite Pieter Theodoor Tolsma
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Patent number: 10571814Abstract: A lithographic apparatus has a support structure constructed to support a patterning device and associated pellicle, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam, and a projection system configured to project the patterned radiation beam onto a target portion of a substrate, wherein the support structure is located in a housing and wherein pressure sensors are located in the housing.Type: GrantFiled: June 29, 2017Date of Patent: February 25, 2020Assignee: ASML Netherlands B.V.Inventors: Andre Bernardus Jeunink, Laurentius Johannes Adrianus Van Bokhoven, Stan Henricus Van Der Meulen, Yang-Shan Huang, Federico La Torre, Bearrach Moest, Stefan Carolus Jacobus Antonius Keij, Enno Van Den Brink, Christine Henriette Schouten, Hoite Pieter Theodoor Tolsma
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Publication number: 20190346777Abstract: A patterning apparatus for a lithographic apparatus, the patterning apparatus including a patterning device support structure configured to support a patterning device having a planar surface; a patterning device conditioning system including a first gas outlet configured to provide a first gas flow over the planar surface in use and a second gas outlet configured to provide a second gas flow over the planar surface in use, wherein the first gas outlet and the second gas outlet are arranged at different distances perpendicular to the planar surface; and a control system configured to independently control a first momentum of gas exiting the first gas outlet and a second momentum of gas exiting the second gas outlet or to independently vary the first gas flow and/or the second gas flow over the planar surface of the patterning device.Type: ApplicationFiled: July 22, 2019Publication date: November 14, 2019Applicants: ASML NETHERLANDS B. V., ASML HOLDING N. V.Inventors: Günes NAKÍBOGLU, Lowell Lane Baker, Ruud Hendrikus Martinus Johannes BLOKS, Hakki Ergun CEKLI, Geoffrey Alan SCHULTZ, Laurentius Johannes Adrianus VAN BOKHOVEN, Frank Johannes Jacobus VAN BOXTEL, Jean-Philippe Xavier VAN DAMME, Christopher Charles WARD
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Patent number: 10423081Abstract: An apparatus, system, and method cool a patterning device by supplying a non-uniform gas flow. The apparatus and system include a gas supply structure that supplies a gas flow across the first surface of the patterning device. The gas supply structure includes a gas supply nozzle specially configured to create a non-uniform gas flow distribution. A greater volume or velocity of the gas flow is directed to desired portion of the patterning device.Type: GrantFiled: December 2, 2015Date of Patent: September 24, 2019Assignees: ASML Holding N.V., ASML Netherlands B.V.Inventors: Thomas Venturino, Geoffrey Alan Schultz, Daniel Nicholas Galburt, Daniel Nathan Burbank, Santiago E. Delpuerto, Herman Vogel, Johannes Onvlee, Laurentius Johannes Adrianus Van Bokhoven, Christopher Charles Ward
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Patent number: 10394139Abstract: A patterning apparatus for a lithographic apparatus, the patterning apparatus including a patterning device support structure configured to support a patterning device having a planar surface; a patterning device conditioning system including a first gas outlet configured to provide a first gas flow over the planar surface in use and a second gas outlet configured to provide a second gas flow over the planar surface in use, wherein the first gas outlet and the second gas outlet are arranged at different distances perpendicular to the planar surface; and a control system configured to independently control a first momentum of gas exiting the first gas outlet and a second momentum of gas exiting the second gas outlet or to independently vary the first gas flow and/or the second gas flow over the planar surface of the patterning device.Type: GrantFiled: March 8, 2017Date of Patent: August 27, 2019Assignees: ASML Holding N.V., ASML Netherlands B.V.Inventors: Güneş Nak{dot over (i)}bo{hacek over (g)}lu, Lowell Lane Baker, Ruud Hendrikus Martinus Johannes Bloks, Hakki Ergün Cekli, Geoffrey Alan Schultz, Laurentius Johannes Adrianus Van Bokhoven, Frank Johannes Jacobus Van Boxtel, Jean-Philippe Xavier Van Damme, Christopher Charles Ward
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Publication number: 20190235392Abstract: A lithographic apparatus has a support structure constructed to support a patterning device and associated pellicle, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam, and a projection system configured to project the patterned radiation beam onto a target portion of a substrate, wherein the support structure is located in a housing and wherein pressure sensors are located in the housing.Type: ApplicationFiled: June 29, 2017Publication date: August 1, 2019Applicant: ASML NETHERLANDS B.V.Inventors: Andre Bernardus JEUNINK, Laurentius Johannes Adrianus VAN BOKHOVEN, Stan Henricus VAN DER MEULEN, Yang-Shan HUANG, Federico LA TORRE, Barry MOEST, Stefan Carolus Jacobus Antonius KEIJ, Enno VAN DEN BRINK, Christine Henriette SCHOUTEN, Hoite Pieter Theodoor TOLSMA
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Publication number: 20190196345Abstract: An apparatus and method for controlling temperature of a patterning device in a lithographic apparatus, by flowing gas across the patterning device. A patterning apparatus includes: a patterning device support structure configured to support a patterning device; a patterning device conditioning system including a first gas outlet configured to provide a gas flow over a surface of the patterning device and a second gas outlet configured to provide a gas flow over a part of a surface of the patterning device support structure not supporting the patterning device; and a control system configured to separately control the temperature of the gas exiting the first and second gas outlets such that the gas exiting the second gas outlet is at a higher temperature than the gas exiting the first gas outlet and/or to separately control the temperature and gas flow rate of the gas exiting the first and second gas outlets.Type: ApplicationFiled: March 1, 2019Publication date: June 27, 2019Applicant: ASML NETHERLANDS B.V.Inventors: Laurentius Johannes Adrianus VAN BOKHOVEN, Ruud Hendrikus Martinus Johannes BLOKS, Günes NAKIBOGLU, Marinus Jan REMIE, Johan Gertrudis Cornelis KUNNEN