Patents by Inventor Lauri Johnson

Lauri Johnson has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Dynamic multi-purpose composition for the removal of photoresists and method for its use
    Patent number: 9329486
    Abstract: The disclosure is directed solutions and processes to remove substances from substrates. The substances can include photoresist. The solutions can include dimethylsulfoxide, a quaternary ammonium hydroxide, an alkanolamine, and less than 3% by weight water of a total weight of the solution. The quaternary ammonium hydroxide can include tetramethylammonium hydroxide, dimethyldipropylammonium hydroxide, or methyltriethylammonium hydroxide. Additionally, the solutions can include a secondary solvent. For example, the secondary solvent can include an alcohol. In another example, the secondary solvent can include ethylene glycol. Methods for the preparation and use of the solution to remove substances from substrates are also described.
    Type: Grant
    Filed: February 6, 2014
    Date of Patent: May 3, 2016
    Assignee: Dynaloy, LLC
    Inventors: Michael Tod Phenis, Lauri Johnson, Raymond Chan, Diane Marie Scheele, Kimberly Dona Pollard
  • DYNAMIC MULTI-PURPOSE COMPOSITION FOR THE REMOVAL OF PHOTORESISTS AND METHOD FOR ITS USE
    Publication number: 20140155310
    Abstract: The disclosure is directed solutions and processes to remove substances from substrates. The substances can include photoresist. The solutions can include dimethylsulfoxide, a quaternary ammonium hydroxide, an alkanolamine, and less than 3% by weight water of a total weight of the solution. The quaternary ammonium hydroxide can include tetramethylammonium hydroxide, dimethyldipropylammonium hydroxide, or methyltriethylammonium hydroxide. Additionally, the solutions can include a secondary solvent. For example, the secondary solvent can include an alcohol. In another example, the secondary solvent can include ethylene glycol. Methods for the preparation and use of the solution to remove substances from substrates are also described.
    Type: Application
    Filed: February 6, 2014
    Publication date: June 5, 2014
    Applicant: Dynaloy, LLC
    Inventors: Michael Tod Phenis, Lauri Johnson, Raymond Chan, Diane Marie Scheele, Kimberly Dona Pollard
  • DYNAMIC MULTI-PURPOSE COMPOSITIONS FOR THE REMOVAL OF PHOTORESISTS AND METHOD FOR ITS USE
    Publication number: 20130172225
    Abstract: Improved dry stripper solutions for removing one, two or more photoresist layers from substrates are provided. The stripper solutions comprise dimethyl sulfoxide, a quaternary ammonium hydroxide, and an alkanolamine, a secondary solvent, and less than about 3 wt. % water. Methods for the preparation and use of the improved dry stripping solutions are additionally provided.
    Type: Application
    Filed: February 5, 2013
    Publication date: July 4, 2013
    Applicant: DYNALOY, LLC
    Inventors: Michael Phenis, Lauri Johnson, Raymond Chan, Diane Scheele, Kimberly Pollard